A system includes a recirculation line, a mainline flow meter operable to measure a flowrate of fluid flowing through the recirculation line, a mixing chamber, an inlet line coupled between the recirculation line and the mixing chamber, at least one chemical injection port coupled to the inlet line, a dedicated feed pump operably associated with each chemical injection port, and an outlet line coupled between the mixing chamber and the recirculation line. The mixing chamber includes a plurality of mixing zones, a mixing blade assembly that includes at least one blade within each mixing zone, and a motor coupled to the mixing blade assembly and operable to rotate the mixing blade assembly. Each of the dedicated feed pumps is coupled to a separate chemical supply and is operable to pump a chemical to the corresponding chemical injection port for injection into the inlet line.

An apparatus for filling a vessel with a multicomponent filling product includes a filler having at least one filling unit set up to introduce the filling product into the vessel, and a filler tank set up for intermediate buffering of the filling product and in fluid connection with the filling unit via a product conduit to supply the filling unit with the filling product; and a mixer set up to blend the filling product from at least two filling product components, wherein the mixer has a circulation conduit; and the mixer has at least one dosage branch set up to introduce one filling product component into the circulation conduit, wherein the mixer has a heat exchanger set up to adjust the temperature of the filling product in the circulation conduit.

The system for making suspensions includes a housing, with a platform mounted therein and a translating table slidably mounted on the platform for removably supporting a receptacle. A base fluid tank stores a base fluid, and a solid particle container stores solid particles. A rotating dispenser system is mounted within the housing, above the platform and the receptacle. The rotating dispenser includes a base fluid dispenser for dispensing a controlled mass of the base fluid into the receptacle, and a solid particle dispenser for dispensing a controlled mass of the solid particles into the receptacle. The base fluid dispenser is in communication with the base fluid tank, and the solid particle dispenser is in communication with the solid particle container. A mixer selectively and controllably mixes the controlled mass of the base fluid and the controlled mass of the solid particles in the receptacle to form the suspension.

Disclosed is a method for the batch-based manufacture of a flowable coating material, in particular water-based or solvent-containing paint, from a plurality of components. The method includes feeding batch components into a process mixing container, mixing the components in the process mixing container to form a mixture having a preliminary composition, transferring at least part of the mixture having the preliminary composition from the process mixing container into a reception container, ascertaining an actual state of the mixture having the preliminary composition during transfer into the reception container, determining a deviation of the actual state of the mixture having the preliminary composition from a predefined setpoint state, ascertaining an adjustment quantity for the components required to reach the setpoint state, and topping up the adjustment quantity of the components into the preliminary mixture, while the preliminary mixture is being transferred from the process mixing container into the reception container.

Systems and methods are described for supplying a rinsing liquid including ultrapure water and an ammonia gas. The system includes an ultrapure water source and a gas mixture source in fluid communication with a contactor. The gas mixture includes ammonia gas and a carrier gas. The system includes a control unit configured to adjust a flow rate of the ultrapure water source such that an operational pressure of the contactor remains below a pressure threshold. The system includes a compressor configured to remove a residual transfer gas out of the contactor. The contactor generates a rinsing liquid having ultrapure water and a concentration of the ammonia gas dissolved therein. The system includes a pump in fluid communication between the contactor and an outlet. The pump is configured to deliver the rinsing liquid having a gaseous partial pressure below the pressure threshold at the outlet.

A slurry mixing device includes an installation frame, a slurry mixing tank, a slurry feeding tank, a cooling mechanism and a slurry discharging mechanism. The slurry feeding tank is movably arranged under the slurry mixing tank, the cooling mechanism and the slurry discharging mechanism. A mass scale is arranged under the slurry feeding tank. A stirring cavity is formed in the slurry mixing tank, and a stirring paddle is arranged in the stirring cavity. A stirring motor is arranged on the slurry mixing tank. An outlet is arranged on the bottom of the stirring cavity. An oil bath cavity is formed between the slurry mixing tank and the stirring cavity. The cooling mechanism includes a lifting cylinder and a lifting base. The lifting base is provided with a rotating paddle and a rotating motor. The lifting cylinder is arranged on the installation frame.

System and method for dispensing a flowable product are provided. The system includes a mixing chamber having a first inlet, a second inlet and an outlet. The mixing chamber of the system contains a mixing element capable of motion. The system also includes a paste located in an enclosure configured to flow into the mixing chamber via a first channel connected to the first inlet, and a flowable medium configured to flow into the mixing chamber via a second channel connected to the second inlet. The mixing chamber is configured to mix the paste and the flowable medium using the mixing element, thus, producing the flowable product that may be output via the outlet.

A homogenous mixing apparatus comprises: a circulation unit, a dynamic mixing unit, wherein a feeding port of the first-stage dynamic mixing device communicates with the discharging end of the circulation unit, a discharging port of the third-stage dynamic mixing device communicates with the feeding end of the circulation unit, and each of the dynamic mixing devices comprises a dynamic mixer; and a control unit, configured to be capable of controlling the dynamic mixing unit, so that the dynamic mixers of the first-stage, the second-stage dynamic mixing device, and the third-stage dynamic mixing device are capable of being independently started and shut down and operated at independent rotating speeds, wherein the dynamic mixers each comprise a stator and a rotor, rotating speed ranges of the dynamic mixers of the first-stage, second-stage, and third-stage dynamic mixing device increase in sequence, and distances between the rotors and the stators decrease in sequence.

A coating composition system for weighing and formulating coating compositions comprises a physical enclosure enclosing an electronic coating composition networking device. The electronic coating composition networking device comprises a local communication interface configured to receive a physical connector from an electronic scale and a network communication interface configured to communicate with an internet gateway. Additionally, at least one sensor may be integrated within the electronic coating composition networking device. The electronic coating composition networking device also receives, through the local communication interface, a mass variable from the electronic scale and a sensor variable from the at least one sensor. The electronic coating composition networking device then generates a network data structure comprising the sensor variable and the mass variable. The electronic coating composition networking device communicates, through the internet gateway, the network data structure to a remote server.

The dilute chemical solution supply device 1 comprises: a dilute chemical solution preparation unit 2 that prepares a dilute chemical solution W1; a reservoir 3 for the prepared dilute chemical solution; a dilute chemical solution adjustment/supply mechanism 4 that supplies, as washing water W2, the dilute chemical solution W1 stored in the reservoir 3 to a plurality of single-wafer type washers 5A, 5B, and 5C; and a return mechanism that is connected to each of the single-wafer type washers 5A, 5B, and 5C and refluxes excess water from the single-wafer type washers to the reservoir 3. According to such a dilute chemical solution supply device, it is possible to accurately adjust the concentration of the solute of the dilute chemical solution and suppress the discharge of excess water, and the dilute chemical solution supply device is thus suitable for washing of wafers, etc.