B01L3/12

DEVICE AND PROCESS FOR ANALYSING GAS EFFECTS IN SAMPLES
20230408474 · 2023-12-21 ·

The invention provides a device and a process for analysing the effect of a concentration of a gas on a sample, especially measurement of the gas concentration within a sample, and/or measurement of the effect of the absorption and/or desorption of a gas by the sample, using spectrophotometric detection of a gas-sensitive and optically detectable analyte of the sample while measuring the concentration of the gas in a gas composition that is continuously delivered to each sample well in order to contact the samples with a gas having a predetermined and/or measured concentration, respectively a pre-determined and/or measured partial pressure.

METHOD AND TEST KIT FOR RECREATION OF AN ODOR
20200157464 · 2020-05-21 ·

Suggested is a method for the extraction of fragrances from natural starting material consisting of the following steps: (a) providing a sample of the natural starting material in a pressure proof sample container; (b) bringing in the sample in contact with liquefied petroleum gas of propane and/or butane gas, preferably; (c) extracting the fragrances from the natural starting material provided in step (b); (d) venting of the pressure proof sample container, while the liquefied petroleum gas is evaporated and the fragrances is maintained as residue in the container; and optionally (e) dissolving the fragrances in a suitable solvent.

Gas inlet structure for reagent kit

The present application provides a gas inlet structure for a reagent kit, which includes a gas inlet connecting pipe and a plugging pipe arranged at one end of the gas inlet connecting pipe. The plugging pipe is provided with a gas nozzle plug, and the plugging pipe is in interference fit with the gas nozzle plug. The gas nozzle plug is provided with a gas inlet blind hole that is arranged along an axis direction of the gas nozzle plug, and an opening end of the gas inlet blind hole faces the gas inlet connecting pipe.

Gas inlet structure for reagent kit

The present application provides a gas inlet structure for a reagent kit, which includes a gas inlet connecting pipe and a plugging pipe arranged at one end of the gas inlet connecting pipe. The plugging pipe is provided with a gas nozzle plug, and the plugging pipe is in interference fit with the gas nozzle plug. The gas nozzle plug is provided with a gas inlet blind hole that is arranged along an axis direction of the gas nozzle plug, and an opening end of the gas inlet blind hole faces the gas inlet connecting pipe.

Monitoring apparatus, wireless communication system and communication quality monitoring method

A radio wave monitoring apparatus includes a communication quality evaluation unit which notifies degradation of communication quality of wireless communication when a non-transmission probability exceeds a threshold, the non-transmission probability having been calculated based on measurement results of communication quality of wireless communication between an on-board station mounted on a train traveling on a track and ground stations installed along the track, and a condition by which it is determined that transmission information is unreachable in the wireless communication.

Monitoring apparatus, wireless communication system and communication quality monitoring method

A radio wave monitoring apparatus includes a communication quality evaluation unit which notifies degradation of communication quality of wireless communication when a non-transmission probability exceeds a threshold, the non-transmission probability having been calculated based on measurement results of communication quality of wireless communication between an on-board station mounted on a train traveling on a track and ground stations installed along the track, and a condition by which it is determined that transmission information is unreachable in the wireless communication.

AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR

Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and a flow ingress openings of the ampoule adjacent bottom edges of the tubular walls, through which a carrier gas flows in contact with the precursor.

AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR

Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and a flow ingress openings of the ampoule adjacent bottom edges of the tubular walls, through which a carrier gas flows in contact with the precursor.

MONITORING APPARATUS, WIRELESS COMMUNICATION SYSTEM AND COMMUNICATION QUALITY MONITORING METHOD

A radio wave monitoring apparatus includes a communication quality evaluation unit which notifies degradation of communication quality of wireless communication when a non-transmission probability exceeds a threshold, the non-transmission probability having been calculated based on measurement results of communication quality of wireless communication between an on-board station mounted on a train traveling on a track and ground stations installed along the track, and a condition by which it is determined that transmission information is unreachable in the wireless communication.

Methods and apparatus to mitigate bubble formation in a liquid

Methods and apparatus to mitigate bubble formation in a liquid are disclosed. An example apparatus disclosed herein includes a bottom wall, a first baffle cantilevered from the bottom wall, and a second baffle cantilevered from the bottom wall. The first baffle is spaced apart from the second baffle, and the first baffle and the second baffle are positioned radially relative to an axis of rotation of the apparatus.