B08B3/044

MEMBRANE WASHING APPARATUS
20170292931 · 2017-10-12 ·

The present disclosure describes an apparatus including a waste compartment, a membrane compartment on the waste compartment, and a wash buffer reservoir on the membrane compartment. The membrane compartment includes a membrane compartment outlet aperture and is configured to hold at least one membrane, and the membrane compartment outlet aperture fluidly connects the membrane compartment and the waste compartment. The wash buffer reservoir comprises a wash buffer reservoir outlet aperture, and the wash buffer reservoir outlet aperture fluidly connects the wash buffer reservoir and the membrane compartment. The apparatus may be used to wash membranes used in analytic techniques, such as membranes for gel electrophoresis.

Two Stage Stainless Steel Media Sifter
20170282324 · 2017-10-05 ·

The present technology provides a product and process for efficiently separating ammunition casings from polishing media, preferably stainless steel pins, used in a cleaning process. A two stage sifting apparatus has first and second containers capable of nesting together. The upper first container has a bottom surface and sidewalls extending upwardly therefrom to an upper opening. The bottom surface has a plurality of openings smaller than the ammunition casings but larger than the polishing media. Through manipulation of the sifting apparatus, the polishing media escapes through the openings in the bottom surface of the first container and is retained in the second container. The containers are then separable, with the first container holding the casings and the second container holding the polishing media. Thereby, both the casings and the polishing media can be efficiently separated for re-use in the future, saving time and money.

DEVICE PORT CLEANER
20170232121 · 2017-08-17 ·

The present invention includes a device cleaner, and method of use, for cleaning a device port, particularly a medical device port, that may be inserted into the device port cleaner for cleaning and/or disinfecting.

Effervescent cleaning composition comprising diamond powder having Dv50 of less than 40micrometer
09816060 · 2017-11-14 · ·

A composition which effervesces when added to water, comprises diamond particles with a median equivalent volumetric diameter (Dv50) of less than 40 μm. The compositions are useful as cleaning compositions, particularly for cleaning diamonds.

SURFACE TREATMENT METHOD FOR METAL PARTS
20170259393 · 2017-09-14 · ·

A surface treatment method for metal parts includes a polishing step of supplying and discharging a cleaning liquid into and from a barrel tub while mass including a metal part and a medium is caused to flow in the barrel tub, so that a surface of the metal part is polished. The polishing step is carried out at least once. The polishing step includes a final finish polishing process in which a final finish medium which is free from abrasive grain or which consists of a synthetic resin base material and is free from abrasive grain or which is made by binding abrasive grain of not more than 10 wt % and a synthetic resin binding material together and is free from alumina is used as the medium.

PORTABLE MACHINE AND METHOD FOR WASHING AND DRYING CARTRIDGE CASES FOR GUN OR RIFLE
20210379631 · 2021-12-09 ·

A portable machine for washing and drying cartridge cases for a gun or rifle includes a washing chamber having a cartridge case introduction opening, an inlet port, a discharging port, and a door configured to hermetically close the cartridge case introduction opening. The portable machine also includes a hydraulic circuit configured to allow washing liquid to enter the washing chamber via the inlet port to be discharged via the discharging port. The portable machine also includes a rotating body arranged in the washing chamber to rotate about an axis, the rotating body including a movement element. The movement element protrudes into the washing chamber and is configured to repeatedly lift and release the cartridge cases in the washing chamber during rotation of the rotating body. The portable machine also includes an operating motor, and a drying device arranged to dry the cartridge cases in the washing chamber.

Machine for removing substrate material from parts produced by a 3-D printer

A machine for washing and removing substrate material for parts produced by a 3D printer. The machine includes a housing having a working chamber and a disposal chamber. The machine has at least one inlet in fluid communication with the working chamber. The disposal chamber is disposed adjacent to the working chamber. A dividing wall is disposed between the working chamber and the disposal chamber. A pump conveys a working fluid to the at least one inlet in the working chamber. The disposal chamber and the working chamber are disposed in fluid communication via a passageway such that working fluid passes from the working chamber to the disposal chamber. The machine may also include an ultrasonic generator for generating ultrasonic vibrations within the working chamber and a heater for warming the working fluid.

Washing apparatus and washing method

A washing apparatus includes a stage, a suction nozzle, and a control unit. On the stage, an analytical unit is mounted. In the analytical unit, a well having a hole shape including a bottom surface and an inner peripheral surface is formed. The suction nozzle sucks a solution in the well. The control unit, after controlling the suction nozzle to sucks the solution in the well, controls the stage to rotate the stage on which the analytical unit is mounted at a predetermined speed of rotation, and controls the suction nozzle to suck a residue of the solution existing in the well.

DISPOSABLE CLEANING SYSTEM & METHOD FOR REUSABLE ENDOSCOPIC SYSTEMS
20220015862 · 2022-01-20 · ·

Systems and methods for cleaning a medical device include a disposable pouch having an interior surface defining a cavity and an agitator disposed within the cavity of the pouch.

Sonic cleaning of brush

A method includes cleaning a wafer with a brush element where the brush element collects particles from the wafer during the cleaning process. The brush element is immersed in a first cleaning liquid. An ultrasonic or megasonic vibration is applied to the first cleaning liquid. The ultrasonic or megasonic vibration causes the particles to dislodge from the brush element into the first cleaning liquid. The particles contaminate the first cleaning liquid.