B08B3/08

TREATMENT LIQUID SUPPLY DEVICE USING SYRINGE, AND WET TREATMENT DEVICE

A treatment liquid supply device and a wet treatment device with which an extremely small quantity of the treatment liquid can be accurately supplied, as a method for supplying a treatment liquid to an extremely small wafer of half inch size, including: a syringe that sucks and discharges the treatment liquid; a treatment liquid bottle that is filled with the treatment liquid; a suction hose that has one end connected to the treatment liquid bottle and the other end connected to the syringe, and sucks the treatment liquid inside the treatment liquid bottle to the syringe; a supply hose that has one end connected to an intermediate section of the suction hose and serves to supply, to the surface of the wafer, the treatment liquid discharged by the syringe; and a three-way solenoid valve that controls opening/closing of each of the suction and supply hoses.

TREATMENT LIQUID SUPPLY DEVICE USING SYRINGE, AND WET TREATMENT DEVICE

A treatment liquid supply device and a wet treatment device with which an extremely small quantity of the treatment liquid can be accurately supplied, as a method for supplying a treatment liquid to an extremely small wafer of half inch size, including: a syringe that sucks and discharges the treatment liquid; a treatment liquid bottle that is filled with the treatment liquid; a suction hose that has one end connected to the treatment liquid bottle and the other end connected to the syringe, and sucks the treatment liquid inside the treatment liquid bottle to the syringe; a supply hose that has one end connected to an intermediate section of the suction hose and serves to supply, to the surface of the wafer, the treatment liquid discharged by the syringe; and a three-way solenoid valve that controls opening/closing of each of the suction and supply hoses.

CLEANING DEVICE
20180001355 · 2018-01-04 · ·

A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.

CLEANING DEVICE
20180001355 · 2018-01-04 · ·

A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.

System for handling used packaging film in a food processing facility
11707867 · 2023-07-25 · ·

A system for handling used packaging film in a food processing facility is provided. The system stores the used film in a refrigerated truck trailer at the food processing facility to prevent rotting, prior to transporting the film to a treatment facility where the film may be recycled.

System for handling used packaging film in a food processing facility
11707867 · 2023-07-25 · ·

A system for handling used packaging film in a food processing facility is provided. The system stores the used film in a refrigerated truck trailer at the food processing facility to prevent rotting, prior to transporting the film to a treatment facility where the film may be recycled.

APPARATUS, METHOD, SYSTEM AND SOFTWARE PRODUCT FOR HAND SANITISATION

An apparatus and method for hand sanitisation by application of ozone. The apparatus includes a disinfecting chamber having at least one port for receiving a hand therein and a sensor for detecting entry or exit of the hand into the chamber. The apparatus delivers ozone water to the hand while a controller provides start and stop times for the delivery of the ozone water. This results in improved sanitisation of the hand or hands.

APPARATUS, METHOD, SYSTEM AND SOFTWARE PRODUCT FOR HAND SANITISATION

An apparatus and method for hand sanitisation by application of ozone. The apparatus includes a disinfecting chamber having at least one port for receiving a hand therein and a sensor for detecting entry or exit of the hand into the chamber. The apparatus delivers ozone water to the hand while a controller provides start and stop times for the delivery of the ozone water. This results in improved sanitisation of the hand or hands.

SUBSTRATE PROCESSING APPARATUS
20180012778 · 2018-01-11 ·

In a substrate processing apparatus, a cup part is moved in an up-down direction to cause a cup exhaust port to selectively overlap a first chamber exhaust port or a second chamber exhaust port. In the state in which the cup exhaust port overlaps the first chamber exhaust port, gas in the cup part is discharged through the cup exhaust port and the first chamber exhaust port by a first exhaust mechanism. In the state in which the cup exhaust port overlaps the second chamber exhaust port, the gas in the cup part is discharged through the cup exhaust port and the second chamber exhaust port by a second exhaust mechanism. In this way, an exhaust mechanism for exhausting gas from the cup part can be easily switched between the first exhaust mechanism and the second exhaust mechanism.

SUBSTRATE PROCESSING APPARATUS
20180012778 · 2018-01-11 ·

In a substrate processing apparatus, a cup part is moved in an up-down direction to cause a cup exhaust port to selectively overlap a first chamber exhaust port or a second chamber exhaust port. In the state in which the cup exhaust port overlaps the first chamber exhaust port, gas in the cup part is discharged through the cup exhaust port and the first chamber exhaust port by a first exhaust mechanism. In the state in which the cup exhaust port overlaps the second chamber exhaust port, the gas in the cup part is discharged through the cup exhaust port and the second chamber exhaust port by a second exhaust mechanism. In this way, an exhaust mechanism for exhausting gas from the cup part can be easily switched between the first exhaust mechanism and the second exhaust mechanism.