An apparatus includes a dispenser with a dispenser nozzle for dispensing a wash liquid to a sample liquid; a dispenser actuator coupled with the dispenser nozzle; one or more processors; and memory storing instructions for sending one or more signals to the dispenser actuator for placing a tip of the dispenser nozzle in contact with the sample liquid at a location adjacent to a top liquid surface of the sample liquid for dispensing the wash liquid through the dispenser nozzle. Methods and devices for washing samples are also described.

Provided is a substrate cleaning method capable of maintaining a substrate and a cleaning tank in a clean condition after cleaning. In this method, a substrate holder holding the substrate is immersed in a rinsing liquid in the cleaning tank. While a flow of a cleaning liquid is formed on the substrate, the substrate holder and an inner surface of the cleaning tank, the rinsing liquid is discharged from the cleaning tank. While the flow of the cleaning liquid is formed on the substrate, the substrate holder and the inner surface of the cleaning tank, the rinsing liquid is supplied into the cleaning tank, and the substrate holder is immersed in the rinsing liquid. The substrate holder is pulled up from the rinsing liquid.

Methods and devices for washing and disinfecting objects in a washer-disinfector having at least one chamber. Steps include circulating water and detergent in the chamber, rinsing the objects in the chamber by spraying non-circulating pressurized water in the chamber, draining the chamber, and disinfecting the objects. The steps of rinsing the objects and draining the chamber can be performed at least partially simultaneously. The present invention allows for reduced water and energy consumption compared to prior art, while at the same time decreasing the risk for transfer of process residuals compared to when no rinsing is performed.

An endoscope reprocessor includes: a treatment tank configured to allow an endoscope to be disposed inside; a connector including an opening inside the treatment tank; a first conduit extending from the connector; an on-off valve disposed in the first conduit; a leak tester; and a second conduit including a conduit body having a conduit resistance that is higher than a conduit resistance of the first conduit.

The invention relates to a method and a cleaning system for machine-cleaning workpieces and/or machine components received in at least one partly open cleaning chamber. A first aspect of the invention relates to a method for machine-cleaning workpieces or machine components received in at least one partly open cleaning chamber, wherein the workpieces or machine components to be cleaned are introduced into the cleaning chamber on a workpiece support and/or a rotary arrangement; at least one cleaning flow is generated by at least one lance device. The cleaning flow being supplied to at least some sections of the outer contour of the workpieces or machine components to be cleaned; and where the lance device can be moved along the outer contour of the workpiece or machine component to be cleaned in a controlled manner by a guiding and moving device dependent on a control routine which is executed in a control unit. Multiple cleaning sections are defined on the three-dimensional outer contour in an individual manner for the workpiece or machine component to be cleaned on the basis of test specifications for the residual dirt analysis of workpieces or machine components, and the control routine is generated based thereon. The lance device is guided at least to the ascertained cleaning sections in a controlled manner by means of the guiding and moving device, and each cleaning section is supplied with the cleaning flow in a controlled manner.

The invention relates to a treatment device for workpieces, having the following: a treatment chamber (1); a shaft (2) which extends through a wall of the treatment chamber (1) into the treatment chamber and which is mounted in a rotatable manner; an electric treatment unit (3) which is secured to the shaft (2); and a power supply arrangement (6) with a first supply line (61), an electric coupling (63, 64), a second supply line (62), and an actuating unit (7). The electric coupling (63, 64) has a first coupling element (63), which is secured to the shaft (2) outside of the treatment chamber (1), and a second coupling element (64). The first supply line (61) connects the electric treatment unit (3) to the first coupling element (63), and the second supply line (62) is connected to the second coupling element (64). The actuating unit (7) is designed to actuate the coupling (63, 64) in order to bring the second coupling element (64) into contact with the first coupling element (63) or release the second coupling element (64) from the first coupling element (63).

An endoscope reprocessor includes: a treatment tank configured to allow an endoscope to be disposed inside; a connector including an opening inside the treatment tank; a first conduit extending from the connector; an on-off valve disposed in the first conduit; a leak tester; and a second conduit including a conduit body having a conduit resistance that is higher than a conduit resistance of the first conduit.

In order to provide a treatment station for treating workpiecesin particular, for cleaning and/or coating vehicle bodieswhich allows efficient workpiece treatment, it is proposed that the treatment station comprise a treatment container which surrounds a treatment chamber for receiving the workpieces, wherein the treatment chamber can be flooded with a fluid, wherein the treatment container comprises at least one access opening for introducing the workpieces into the treatment chamber and/or for removing the workpieces from the treatment chamber, wherein the treatment container comprises a closing device which comprises a closing element for selectively closing and opening the at least one access opening.

A substrate processing method includes causing a first outer nozzle to discharge a processing liquid while causing a second outer nozzle to stop discharging a processing liquid, the first outer nozzle and the second outer nozzle arranged at positions higher than a position of the inner bath so as to be positioned opposite to each other with respect to a vertical line passing through a center of the substrate when viewed in a direction perpendicular to the substrate held on the lifter, and discharging the processing liquid toward the substrate held on the lifter, and causing the second outer nozzle to discharge the processing liquid while causing the first outer nozzle to stop discharging the processing liquid.