To provide an ultraviolet ray irradiation device by preventing leakage of ultraviolet rays from an insertion opening through which a hand on which a glove is mounted is inserted into a sterilization chamber. The device includes: an ultraviolet ray blocking balloon disposed in an insertion opening; a pressurized gas supplying and discharging device which supplies a gas under pressure to the balloon and discharges from it; an insertion depth detection unit which outputs an insertion hand depth detection signal; a controller of an ultraviolet ray irradiation and a pressurized gas supplying and discharging, wherein the balloon forms an opening which allows an insertion and a removal of the hand before the gas is supplied, and it is inflated with the supply of the gas so as to be brought into close contact with a wrist portion of the glove, and it is deflated with a discharge of the gas.

A cleaning method applied in semiconductor manufacturing is provided. The method includes: receiving a substrate having a surface; identifying a location of a particle on the surface of the substrate; moving a cleaning apparatus toward the location of the particle; performing a cleaning operation, thereby removing the particle by spraying a cleaning liquid from the cleaning apparatus flowing against gravity and toward the surface of the substrate; detecting the surface of the substrate; and performing a second cleaning operation when a cleaning result of the detection is not acceptable. A semiconductor manufacturing method and a system for cleaning a substrate are also provided.

A method of cleaning a substrate for a blank mask including: a first cleaning including irradiating a cleaning target substrate with a pre-treatment light to prepare a substrate cleaned with light, and a second cleaning including applying a first cleaning solution and a post-treatment light to the substrate cleaned with light to prepare the substrate for the blank mask, is disclosed.

An adjustable power supply circuit for a treatment and/or disinfection system using high intensity broad-spectrum pulsed light that includes a capacitor power supply, a capacitor bank connected to the capacitor power supply and a high intensity light source, a trigger circuit including a trigger coil connected to the high intensity light source, and a controller. The capacitor bank includes a plurality of capacitors connected in series and/or in parallel, where the capacitor bank is adjustable to adjust an amount of energy supplied to the high intensity light source. The controller receives input data and controls charging of the capacitor bank by the at least one capacitor power supply to power the high intensity light source at a desired voltage and triggers the trigger circuit to turn on the light source at the desired voltage to strobe pulsed light with an amount of fluence to treat contaminants.

A sterilizer for an autonomous robotic cleaner is revealed. An ultraviolet (UV) sterilizer is disposed on a top surface of an autonomous robotic cleaner. When the autonomous robotic cleaner is moved for cleaning the floor, consumers can activate the UV sterilizer by remote control to perform sterilization of indoor environments according to their needs. Thus a clean and hygienic environment is achieved. A person or pet in area to be cleaned is detected in a real time manner by a thermal sensor module so that the UV sterilizer is turned off immediately to protect the person or pet from injuries caused by exposure to UV light.

The present invention has as an object the provision of a light irradiation device capable of performing optical cleaning with high stability regardless of the transport speed of a workpiece. The light irradiation device of the present invention emits ultraviolet light to one surface of a band-shaped workpiece transported along a transport path, and includes a lamp house having an opening along a passing plane on a side of the one surface of the workpiece in the transport path, an ultraviolet lamp provided in the lamp house so as to extend in a width direction of the workpiece, gas supplier configured to supply a treatment-space gas into the lamp house, and an exhaust space forming member having an opening along a passing plane on a side of the other surface of the workpiece in the transport path. The treatment-space gas is produced by mixing a gas containing oxygen and/or water with an inert gas serving as a principal component, and a shielding body for forming a gas circulation resistance bottleneck between the shielding body and each edge part of the workpiece is provided in the opening of the lamp house.

A substrate processing apparatus 1 includes a rotating/holding unit 30 configured to hold and rotate a wafer W having an organic film on a front surface Wa thereof; a light irradiating unit 40 configured to irradiate light for aching of the organic film to the front surface; a gas flow forming unit 50 configured to form a gas flow of an oxygen-containing gas which passes between the wafer W and the light irradiating unit 40; an irradiation control unit 114 configured to irradiate the light to the front surface in a state that the gas flow is formed between the wafer W and the light irradiating unit 40; and a rotation control unit 115 configured to rotate the wafer W in a state that the gas flow is formed between the wafer W and the light irradiating unit 40 and the light is irradiated to the front surface.

A cleaning method is provided. In the cleaning method, residues of elements of a group for a common semiconductor material in a chamber are removed with plasma of a halogen-containing gas. Residues of metal elements of groups 12 and 13 and groups 14 and 15 in the chamber are removed with plasma of a hydrocarbon-containing gas. A C-containing material in the chamber is removed with plasma of an O-containing gas. Further, the removing with the plasma of the halogen-containing gas, the removing with the plasma of the hydrocarbon-containing gas, and the removing with the plasma of the O-containing gas are performed in that order or the removing with the plasma of the hydrocarbon-containing gas, the removing with the plasma of the O-containing gas, and the removing with the plasma of the halogen-containing gas are performed in that order X times where X≥1.

In some implementations, a self-cleaning seat includes a cover layer with a photocatalyst; a light-emitting fiber layer including one or more light sources; a light-diffusing spacer configured to diffuse light emitted from the light-emitting fiber layer and positioned between the cover layer and the light-emitting fiber layer; and a triggering mechanism that activates a cleaning cycle by activating the one or more light sources.

An ultraviolet emitting device comprising a plurality of light sources; and a plurality of arms on which the plurality of light sources are mounted, wherein: each arm is expandable between a first position and a second position, each arm is fully collapsed in the first position and fully expanded in the second position, and when each arm is transitioning between the first position and the second position, a length of the arm maintains a fixed proportionality with respect to a spacing of the plurality of light sources on the arm.