A container-treatment machine includes a frame, transport devices for conveying containers, and intermediate conveyors. Treatment stations, some of which are treatment modules, are arranged between the first and second transport-devices. The intermediate conveyors convey containers to corresponding ones of the treatment stations. The intermediate conveyors extend transversely between the transport devices. Some of the treatment modules are held on the frame so as to be removable from operating positions thereof.

A system which can be manually/automatically activated to ensure instant cleaning of decontamination liquid and gas placed into cylindrical pressure tubes against CBRN threats, wherein the system includes: a decontamination liquid/gas used for cleaning chemical, biologic, radiological and nuclear threats and minimizing effects thereof, a decontamination tube used for discharging decontamination liquid/gas placed therein, a decontamination pyrotechnic igniter-based on pyrotechnic used for ignition of the decontamination tube, a control unit providing manual or automatic operation of the system, and at the same time communication thereof with the hardware units in the system, and a control card located on the control unit, having printed circuit boards with embedded software developed for enabling the control.

A hose conducts high-temperature steam combined with cleaning solution in a cleaning operation. The hose comprises an external liner, an intermediate conduit, and an internal liner. The external liner comprises first braiding and is disposed along a longitudinal length of the hose. The intermediate conduit is disposed in the external liner along the longitudinal length of the hose. The intermediate conduit has a plurality of corrugations disposed laterally in the tubular wall of the intermediate conduit. The internal liner comprises second braiding and is disposed in the intermediate conduit along the longitudinal length of the hose. The internal liner provided a full bore for the hose configured to conduct the high temperature steam combined with the cleaning solution in a volatilized mixture.

A hose conducts high-temperature steam combined with cleaning solution in a cleaning operation. The hose comprises an external liner, an intermediate conduit, and an internal liner. The external liner comprises first braiding and is disposed along a longitudinal length of the hose. The intermediate conduit is disposed in the external liner along the longitudinal length of the hose. The intermediate conduit has a plurality of corrugations disposed laterally in the tubular wall of the intermediate conduit. The internal liner comprises second braiding and is disposed in the intermediate conduit along the longitudinal length of the hose. The internal liner provided a full bore for the hose configured to conduct the high temperature steam combined with the cleaning solution in a volatilized mixture.

The present invention refers to the heterologous production in microorganisms of modified versions of a predicted isoform of the surfactant protein Lv-ranaspumin-1 (Lv-Rsn-1), whose sequence was inferred from analyzes of the protein extract of the nest foam from the Northeastern Pepper Frog (Leptodactylus vastus). More specifically, it refers to two surfactant proteins that consist of modified versions of the predicted isoform of Lv-Rsn-1; to two synthetic genes each encoding one of these modified versions of the predicted isoform of Lv-Rsn-1; to two expression cassettes each containing one of the synthetic genes encoding one of the modified versions of the predicted isoform of Lv-Rsn-1; to two expression vectors each containing one of the synthetic genes encoding modified versions of the predicted isoform of Lv-Rsn-1; and to two transgenic microorganisms, a bacterium and a yeast, each transformed with one of these synthetic genes and heterologously producing one of the modified versions of the predicted isoform of Lv-Rsn-1. Lv-Rsn-1 has surfactancy, emulsification and dispersancy properties, among others, and its heterologous production allows it to be used in various applications and industrial products, without the need to extract it from the frog nest foam.

The present invention refers to the heterologous production in microorganisms of modified versions of a predicted isoform of the surfactant protein Lv-ranaspumin-1 (Lv-Rsn-1), whose sequence was inferred from analyzes of the protein extract of the nest foam from the Northeastern Pepper Frog (Leptodactylus vastus). More specifically, it refers to two surfactant proteins that consist of modified versions of the predicted isoform of Lv-Rsn-1; to two synthetic genes each encoding one of these modified versions of the predicted isoform of Lv-Rsn-1; to two expression cassettes each containing one of the synthetic genes encoding one of the modified versions of the predicted isoform of Lv-Rsn-1; to two expression vectors each containing one of the synthetic genes encoding modified versions of the predicted isoform of Lv-Rsn-1; and to two transgenic microorganisms, a bacterium and a yeast, each transformed with one of these synthetic genes and heterologously producing one of the modified versions of the predicted isoform of Lv-Rsn-1. Lv-Rsn-1 has surfactancy, emulsification and dispersancy properties, among others, and its heterologous production allows it to be used in various applications and industrial products, without the need to extract it from the frog nest foam.

A method of cleaning a complex powder transfer system including providing a powder transfer system having a washing fluid source, a spray device valve in fluid communication with the washing fluid source, a backflush valve in fluid communication with the washing fluid source, a receiving device having an upper chamber, a lower chamber, and a membrane filter disposed between the upper and lower chambers. The method includes opening the backflush valve to initiate a backflush cycle, running the backflush cycle to wash the upper chamber with a fluid, and closing the backflush valve after the backflush cycle completes. The method includes opening the spray device valve to initiate a spray device cycle, running the spray device cycle to wash the lower chamber with fluid, and closing the spray device valve after the spray device cycle completes. The method includes opening a pressure valve to provide PCA to the receiving container.

A method of cleaning a complex powder transfer system including providing a powder transfer system having a washing fluid source, a spray device valve in fluid communication with the washing fluid source, a backflush valve in fluid communication with the washing fluid source, a receiving device having an upper chamber, a lower chamber, and a membrane filter disposed between the upper and lower chambers. The method includes opening the backflush valve to initiate a backflush cycle, running the backflush cycle to wash the upper chamber with a fluid, and closing the backflush valve after the backflush cycle completes. The method includes opening the spray device valve to initiate a spray device cycle, running the spray device cycle to wash the lower chamber with fluid, and closing the spray device valve after the spray device cycle completes. The method includes opening a pressure valve to provide PCA to the receiving container.

The present disclosure provides a method and system for controlling a deposition device, relating to the field of semiconductor technology. The method for controlling a deposition device is applied to the deposition device, the deposition device includes a reaction chamber and an electrostatic chuck arranged in the reaction chamber, the electrostatic chuck carries a wafer, and the controlling method includes: obtaining a pressure value between the wafer and the electrostatic chuck; and when the pressure value exceeds a preset range, the deposition device sending out an alarm signal, and executing a cleaning operation according to a use state of the electrostatic chuck.

The present disclosure provides a method and system for controlling a deposition device, relating to the field of semiconductor technology. The method for controlling a deposition device is applied to the deposition device, the deposition device includes a reaction chamber and an electrostatic chuck arranged in the reaction chamber, the electrostatic chuck carries a wafer, and the controlling method includes: obtaining a pressure value between the wafer and the electrostatic chuck; and when the pressure value exceeds a preset range, the deposition device sending out an alarm signal, and executing a cleaning operation according to a use state of the electrostatic chuck.