Patent classifications
B65G49/04
Coating apparatus and method
A component such as a door is coated by immersion in a fluidized bed. The component is supported by a hook assembly that moves the component within the fluidized bed during coating. The movement is cyclical and inhibits bridging of the coating material when applied to intricate articles.
Method and apparatus for treating components
A dip tank is fillable with a liquid. An accommodation device accommodates components and is rotatingly drivable around an axis of rotation. The accommodation device and the dip tank are movable relative to each other to dip the components in the dip tank or to lift the components out of the dip tank. A splash guard is provided. A lifting device is arranged to move the splash guard relative to the dip tank.
Method and apparatus for treating components
A dip tank is fillable with a liquid. An accommodation device accommodates components and is rotatingly drivable around an axis of rotation. The accommodation device and the dip tank are movable relative to each other to dip the components in the dip tank or to lift the components out of the dip tank. A splash guard is provided. A lifting device is arranged to move the splash guard relative to the dip tank.
Nanoparticles and systems and methods for synthesizing nanoparticles through thermal shock
Systems and methods of synthesizing nanoparticles on substrates using rapid, high temperature thermal shock. A method involves depositing micro-sized particles or salt precursors on a substrate, and applying a rapid, high temperature thermal shock to the micro-sized particles or the salt precursors to become nanoparticles on the substrate. A system may include a rotatable member that receives a roll of a substrate sheet having micro-sized particles or salt precursors; a motor that rotates the rotatable member so as to unroll the substrate; and a thermal energy source that applies a short, high temperature thermal shock to the substrate. The nanoparticles may be metallic, ceramic, inorganic, semiconductor, or compound nanoparticles. The substrate may be a carbon-based substrate, a conducting substrate, or a non-conducting substrate. The high temperature thermal shock process may be enabled by electrical Joule heating, microwave heating, thermal radiative heating, plasma heating, or laser heating.
FABRICATION PLATFORM
A fabrication platform used for production lines of a display panel is provided. The fabrication platform includes: a jig, wherein the jig is configured to carry a glass substrate, and a plurality of via holes are defined on the jig; and an adsorption device, wherein the adsorption device includes a plurality of suction pads, the suction pads are disposed on a side of the jig away from the glass substrate and are disposed corresponding to the via holes, and the suction pads adsorb the glass substrate on the jig through the via holes. The provided fabrication platform effectively improves yield rate of the glass substrate in welding processes.
SUBSTRATE PROCESSING MODULE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE MANUFACTURING METHOD
A substrate processing module includes a first tank and a second tank that are arranged in a first direction and in which a substrate can be arranged, a first conveyance unit that moves the substrate in the first direction, and a second conveyance unit that moves the substrate in a second direction intersecting the first direction.
SUBSTRATE PROCESSING MODULE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE MANUFACTURING METHOD
A substrate processing module includes a first tank and a second tank that are arranged in a first direction and in which a substrate can be arranged, a first conveyance unit that moves the substrate in the first direction, and a second conveyance unit that moves the substrate in a second direction intersecting the first direction.
FINISHING SYSTEM
A finishing system includes a frame that includes a bath station configured to communicate with an electrode. A hoist supported by the frame is movable into register with the bath station to establish electrical communication between the hoist and a current generated by a power source. The current drives deposition of a coating onto a load carried by the hoist. A drive assembly of the system is supported by the hoist and is operable to rotate a sprocket. The drive assembly includes a rotary conductor electrically coupled to the sprocket and configured to come into electrical communication with the frame. An electrically conductive lifting chain is operable through rotation of the sprocket to lower the load into the bath station. The frame communicates current from the power source to the rotary conductor, and the lifting chain communicates current from the rotary conductor to the load.
SUBSTRATE PROCESSING MODULE AND SUBSTRATE PROCESSING APPARATUS
A substrate processing module includes a first tank and a second tank that are arranged in a first direction and in which a substrate can be arranged, a first conveyor that moves the substrate in the first direction, and a second conveyor that moves the substrate in a second direction intersecting the first direction; and a vertical conveyor that is connected to the first conveyor and vertically moves the substrate, wherein a first actuator of the first conveyor and a second actuator of the second conveyor are respectively arranged in drive spaces separated from a processing space accessible to the first tank and the second tank.
SUBSTRATE PROCESSING MODULE AND SUBSTRATE PROCESSING APPARATUS
A substrate processing module includes a first tank and a second tank that are arranged in a first direction and in which a substrate can be arranged, a first conveyor that moves the substrate in the first direction, and a second conveyor that moves the substrate in a second direction intersecting the first direction; and a vertical conveyor that is connected to the first conveyor and vertically moves the substrate, wherein a first actuator of the first conveyor and a second actuator of the second conveyor are respectively arranged in drive spaces separated from a processing space accessible to the first tank and the second tank.