A palladium hydride nanomaterial includes nanostructures having a chemical composition represented by the formula: M.sub.y—Pd.sub.xH.sub.z, where M is at least one metal different from palladium; x has a non-zero value in the range of 0 to 5; y has a value in the range of 0 to 5; and z has a non-zero value in the range of 0 to 5.

The present disclosure relates to improved processes for the preparation of metal hydrides. The present disclosure also relates to metal hydrides, e.g., metal hydrides prepared by the processes described herein, that exhibit enhanced hydrogen storage capacity when used as hydrogen storage systems.

The present disclosure relates to improved processes for the preparation of metal hydrides. The present disclosure also relates to metal hydrides, e.g., metal hydrides prepared by the processes described herein, that exhibit enhanced hydrogen storage capacity when used as hydrogen storage systems.

A method for producing a thin film according to the present disclosure comprises a step of forming the thin film on a substrate using a target. The target is formed of a mixture containing a first material and a second material. The first material has a composition represented by ATiO.sub.3 (where A is at least one selected from the group consisting of Ba and Sr). The second material has a composition represented by EH.sub.2 (where E is at least one selected from the group consisting of Ti and Zr). The thin film is formed of a first oxide containing A, Ti, and O. Some of oxide ions contained in the first oxide have been replaced by hydride ions.

A method for producing a thin film according to the present disclosure comprises a step of forming the thin film on a substrate using a target. The target is formed of a mixture containing a first material and a second material. The first material has a composition represented by ATiO.sub.3 (where A is at least one selected from the group consisting of Ba and Sr). The second material has a composition represented by EH.sub.2 (where E is at least one selected from the group consisting of Ti and Zr). The thin film is formed of a first oxide containing A, Ti, and O. Some of oxide ions contained in the first oxide have been replaced by hydride ions.

To provide a metal-based structure or nanoparticles whose homogeneity is not deteriorated and whose sticking formation is easy, and a production method thereof with a high safety. A metal-based structure comprises a hydrogen compound, cluster, or an aggregate thereof, represented by the general formula: M.sub.mH. The M is a metal-based atom. The m is an integer of 3 or more and 300 or less. H is a hydrogen atom.

To provide a metal-based structure or nanoparticles whose homogeneity is not deteriorated and whose sticking formation is easy, and a production method thereof with a high safety. A metal-based structure comprises a hydrogen compound, cluster, or an aggregate thereof, represented by the general formula: M.sub.mH. The M is a metal-based atom. The m is an integer of 3 or more and 300 or less. H is a hydrogen atom.

To provide a metal-based structure or nanoparticles whose homogeneity is not deteriorated and whose sticking formation is easy, and a production method thereof with a high safety. A metal-based structure comprises a hydrogen compound, cluster, or an aggregate thereof, represented by the general formula: M.sub.mH. The M is a metal-based atom. The m is an integer of 3 or more and 300 or less. H is a hydrogen atom.

To provide a metal-based structure or nanoparticles whose homogeneity is not deteriorated and whose sticking formation is easy, and a production method thereof with a high safety. A metal-based structure comprises a hydrogen compound, cluster, or an aggregate thereof, represented by the general formula: M.sub.mH. The M is a metal-based atom. The m is an integer of 3 or more and 300 or less. H is a hydrogen atom.

This disclosure relates to novel metal hydrides, processes for their preparation, and their use in hydrogen storage applications.