According to a fabrication method for fabricating a porous glass base material for optical fiber, the orientation of a clad forming burner used to form the outermost layer of a clad-corresponding portion is changed further upward while glass fine particles are deposited during the period between a first timing and a second timing. At the first timing, the outer diameter of the porous glass base material for optical fiber has not reached a target outer diameter. The second timing is later than the first timing, and either a timing at which the outer diameter of the porous glass base material for optical fiber reaches the target outer diameter for the first time, or a timing prior to this timing.

According to a fabrication method for fabricating a porous glass base material for optical fiber, the orientation of a clad forming burner used to form the outermost layer of a clad-corresponding portion is changed further upward while glass fine particles are deposited during the period between a first timing and a second timing. At the first timing, the outer diameter of the porous glass base material for optical fiber has not reached a target outer diameter. The second timing is later than the first timing, and either a timing at which the outer diameter of the porous glass base material for optical fiber reaches the target outer diameter for the first time, or a timing prior to this timing.

A fabrication apparatus for fabricating a porous glass base material for optical fiber includes a core forming burner configured to form a core-corresponding portion corresponding to a core of optical fiber by depositing glass fine particles onto a hanging seed rod, a first clad forming burner configured to form a portion of a clad-corresponding portion corresponding to a clad of the optical fiber by depositing glass fine particles onto the core-corresponding portion, and a second clad forming burner configured to form a different portion of the clad-corresponding portion by depositing glass fine particles to form an outermost surface of the clad-corresponding portion. Here, a central axis of a flame ejected from the second clad forming burner has such a gradient that the central axis of the flame ejected from the second clad forming burner faces upward relative to a horizontal plane.

On an EUV light-reflecting surface of titania-doped quartz glass, an angle () included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

A method of manufacturing an optical fiber glass preform, the method comprising depositing glass particles on a base material, the glass particles being generated by glass making feedstock gas being supplied while a burner and the base material that is rotating are reciprocated relatively to each other, wherein when a portion corresponding to an outer diameter equal to or more than 0.80 L and equal to or less than L is deposited, wherein L represents a final outer diameter of a part of the optical fiber glass preform manufactured, the part being formed by the deposition of the glass particles, the deposition is performed under a first condition where an angle formed by a first line extending from a center O of a cross section of the base material to a rotational position r0 at which one round trip of the relative reciprocation starts and a second line extending from the center O to a rotational position r1 at which the one round trip of the relative reciprocation ends is an angle excluding 0, 120, 240, 72, 144, 216, and 288; or the deposition is performed under a second condition where the angle is 120 or 240, thereby to deposit the glass particles to a thickness corresponding to a thickness equal to or less than 0.03 L; or the deposition is performed under a third condition where the angle is 72, 144, 216, or 288, thereby to deposit the glass particles to a thickness corresponding to a thickness equal to or less than 0.02 L; or the deposition is performed under a fourth condition where the angle is 0, thereby to deposit the glass particles to a thickness corresponding to a thickness equal to or less than 0.01 L.

Provided is a manufacturing apparatus for manufacturing a soot deposition body, including a main burner that deposits glass microparticles on a target rod while moving parallel to a longitudinal direction of the target rod; and a side burner that is positioned outside of a movement range of the main burner in a movement direction of the main burner, and fires an end portion of the soot deposition body formed on the target rod. The side burner includes a plurality of heating burners arranged distanced from each other in a circumferential direction of the target rod. In the manufacturing apparatus described above, the main burner may include a plurality of deposition burners that are arranged distanced from each other in the circumferential direction of the target rod.

On an EUV light-reflecting surface of titania-doped quartz glass, an angle () included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.