A chemical vapor deposition process for depositing a coating comprising silicon oxide and titanium oxide is provided. A coating formed by the chemical vapor deposition process is also provided.

Embodiments of articles including a low-contrast anti-reflection coating are disclosed. The coated surface of such articles exhibits a reduced difference in reflectance between a pristine state and when a surface defect is present. In one or more embodiments, the coated surface of such articles exhibits a first average reflectance in the range from about 0.6% to about 6.0% in a pristine condition and a second average reflectance of about 8% or less after removal of a surface thickness of the anti-reflection coating. In other embodiments, the coated substrate exhibits a second average reflectance of about 10% or less, when the coated surface comprises a contaminant. In some embodiments, the coated substrate exhibits a first color coordinate (a*.sub.1, b*.sub.1) in a pristine condition and a second color coordinate (a*.sub.2, b*.sub.2) after the presence of a surface defect such that Δa*b* is about 6 or less.

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition. In certain embodiments, the device includes a counter electrode having an anodically coloring electrochromic material in combination with an additive.

A glass plate structure includes: a glass plate having first and second major surfaces; an antireflection film; and a print portion. The first major surface includes: a curved surface region that is a region of an end portion of the glass plate, is curved convexly, and has a radius of curvature r that is 50% or more of a thickness t of the glass plate; and a flat surface region that is connected to the curved surface region. The antireflection film is a laminate in which a high refractive index layer and a low refractive index layer are laminated alternately. The number of layers of the antireflection film is 12 or smaller. A total thickness of the antireflection film in the flat surface region is 400 nm or smaller. A thickness of an outermost layer of the antireflection film in the flat surface region is 90 nm or larger.

A spandrel including a first substrate, an intermediate film made of polymer material, and a second, opaque substrate, such that the first substrate is coated with at most two layers which are deposited on the surface located on the side facing the intermediate film made of polymer material and which include at least one upper dielectric layer.

One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. The bridging of a crack from one of the film or the glass substrate into the other of the film or the glass substrate can be suppressed by inserting a nanoporous crack mitigating layer between the glass substrate and the film.

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

A coated glazing includes a transparent glass substrate, and a coating located on the glass substrate. The coating is provided with at least the following layers in sequence starting from the glass substrate: a first layer having a refractive index of more than 1.6, an optional second layer having a refractive index that is less than the refractive index of the first layer, a third layer based on tin dioxide doped with antimony, niobium and/or neodymium, and a fourth layer based on titanium dioxide, wherein the fourth layer is photocatalytic.

A material platform with controllable emissivity and fabrication methods are provided that permit the manipulation of thermal radiation detection and IR signal modulation and can be adapted to a variety of uses including infrared camouflage, thermal IR decoys, thermo-reflectance imaging and IR signal modulation. The platform is a multilayer W.sub.xV.sub.1-xO.sub.2 film with different W doping levels (x values) and layer thicknesses, forming a graded W-doped construct. In WVO.sub.2 films with a total thickness <100 nm, the graded doping of W spreads the originally sharp metal-insulator phase transition (MIT) to a broad temperature range, greatly expanding the temperature window for emissivity modulation.

A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.