A coating fabrication method includes providing engineered granules and thermally consolidating the engineered granules on a substrate to form a silicate-resistant barrier coating. Each of the engineered granules is an aggregate of at least one refractory matrix region and at least one calcium aluminosilicate additive region (CAS additive region) attached with the at least one refractory matrix region. In the thermal consolidation, the refractory matrix region from the engineered granules form grains of a refractory matrix of the silicate-resistant barrier coating and the CAS additive region from the engineered granules form CAS additives that are dispersed in grain boundaries between the grains.

A coating fabrication method includes providing engineered granules and thermally consolidating the engineered granules on a substrate to form a silicate-resistant barrier coating. Each of the engineered granules is an aggregate of at least one refractory matrix region and at least one calcium aluminosilicate additive region (CAS additive region) attached with the at least one refractory matrix region. In the thermal consolidation, the refractory matrix region from the engineered granules form grains of a refractory matrix of the silicate-resistant barrier coating and the CAS additive region from the engineered granules form CAS additives that are dispersed in grain boundaries between the grains.

In some examples, article used as a component for a turbine engine that operates in a high temperature environment. The article may include: a ceramic or ceramic matrix composite (CMC) substrate; and a coating on the ceramic or the CMC substrate, wherein the coating defines an outer surface of the article. The coating includes a plurality of surface features defining channels on the outer surface of the article. The channels are configured to modify a flow of molten Calcia-Magnesia-Alumina Silicate (CMAS) over the outer surface of the coating in a gas flow over the outer surface of the article to reduce accumulation of the molten CMAS on the outer surface of the article.

In some examples, article used as a component for a turbine engine that operates in a high temperature environment. The article may include: a ceramic or ceramic matrix composite (CMC) substrate; and a coating on the ceramic or the CMC substrate, wherein the coating defines an outer surface of the article. The coating includes a plurality of surface features defining channels on the outer surface of the article. The channels are configured to modify a flow of molten Calcia-Magnesia-Alumina Silicate (CMAS) over the outer surface of the coating in a gas flow over the outer surface of the article to reduce accumulation of the molten CMAS on the outer surface of the article.

A heat dissipation member includes a thermal radiation ceramic material, and the thermal radiation ceramic material contains silicon nitride and boron nitride as main components. The ratio of the mass of boron nitride to the mass of silicon nitride and boron nitride is 10 mass % to 40 mass %.

A heat dissipation member includes a thermal radiation ceramic material, and the thermal radiation ceramic material contains silicon nitride and boron nitride as main components. The ratio of the mass of boron nitride to the mass of silicon nitride and boron nitride is 10 mass % to 40 mass %.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to said substrate; said environmental barrier layer comprising a rare earth composition.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to said substrate; said environmental barrier layer comprising a rare earth composition.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.