Patent classifications
C07C25/02
Arylquinazolines
The invention relates to novel compounds of the formula (I) which can be used for the inhibition of serine-threonine protein kinases and for the sensitization of cancer cells to anticancer agents and/or ionizing radiation.
Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion
The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##
Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion
The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##
PROCESS FOR THE PREPARATION OF 5-BROMO-1,2,3-TRICHLOROBENZENE
The present invention relates to a process for the preparation of a compound of formula I (I), comprising reacting a compound of formula II (II), with a brominating agent in the presence of an acidic catalyst to a compound of formula III (III), and reacting the compound of formula III in tetrahydrofuran or 2-methyl-tetrahydrofuran with potassium tert-butoxide to a compound of formula I.
##STR00001##
PROCESS FOR THE PREPARATION OF 5-BROMO-1,2,3-TRICHLOROBENZENE
The present invention relates to a process for the preparation of a compound of formula I (I), comprising reacting a compound of formula II (II), with a brominating agent in the presence of an acidic catalyst to a compound of formula III (III), and reacting the compound of formula III in tetrahydrofuran or 2-methyl-tetrahydrofuran with potassium tert-butoxide to a compound of formula I.
##STR00001##
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M.sup.+ represents a sulfonium ion or an iodonium ion.
##STR00001##
Organic metal complex, and organic light emitting device and display apparatus using the same
Provided is an organic metal complex having a structure represented by the following general formula (1):
ML.sub.mL′.sub.n (1)
where: M represents a metal atom selected from Ir, Pt, Rh, Os, and Zn; L and L′, which are different from each other, each represent a bidentate ligand; m represents an integer of 1 to 3 and n represents an integer of 0 to 2, provided that m+n is 3; a partial structure ML.sub.m represents a structure represented by the following general formula (2): ##STR00001##
and a partial structure ML′.sub.n represents a structure including a monovalent bidentate ligand.
Organic metal complex, and organic light emitting device and display apparatus using the same
Provided is an organic metal complex having a structure represented by the following general formula (1):
ML.sub.mL′.sub.n (1)
where: M represents a metal atom selected from Ir, Pt, Rh, Os, and Zn; L and L′, which are different from each other, each represent a bidentate ligand; m represents an integer of 1 to 3 and n represents an integer of 0 to 2, provided that m+n is 3; a partial structure ML.sub.m represents a structure represented by the following general formula (2): ##STR00001##
and a partial structure ML′.sub.n represents a structure including a monovalent bidentate ligand.
Coating composition and organic light-emitting device
The present disclosure relates to a coating composition and an organic light emitting device.
Coating composition and organic light-emitting device
The present disclosure relates to a coating composition and an organic light emitting device.