The present invention pertains to a composition comprising: (I) at least one ionic liquid of formula (1-a) or of formula (1-b): [RF-CFR′.sub.F-SO.sub.3].sup.− A.sup.+ (1-a) [(RF-CFR′F—SO.sub.2).sub.2N].sup.− (1-b) wherein: -R.sub.F is a C.sub.1-C.sub.25 fluoroalkyi group, optionally comprising one or more than one catenary ethereal oxygen atoms, -R′.sub.F is —F or a —CF.sub.3 group, and -A+ is an organic cation selected from the group consisting of tetraalkylammonium, pyridinium, imidazolium, piperidinium, pyrrolidinium, amidinium and guanidinium groups, and (II) at least one metal salt of formula (II): MeB, (H) wherein: -Me.sup.m+ is a metal cation deriving from a metal (Me) selected from the group consisting of groups IB, MB, IVB, VB, VIB, MIA, IVA and VIII (8, 9, 10) of the Periodic Table, preferably from the group consisting of groups IVB, VB, VIB and IMA of the Periodic Table, wherein m is the valence of said metal cation, and —B.sup.n− is an inorganic anion, wherein n is the valence of said inorganic anion. The present invention also pertains to the use of said composition in an electrodeposition process and to the metal-coated assembly thereby provided.

The present invention pertains to a composition comprising: (I) at least one ionic liquid of formula (1-a) or of formula (1-b): [RF-CFR′.sub.F-SO.sub.3].sup.− A.sup.+ (1-a) [(RF-CFR′F—SO.sub.2).sub.2N].sup.− (1-b) wherein: -R.sub.F is a C.sub.1-C.sub.25 fluoroalkyi group, optionally comprising one or more than one catenary ethereal oxygen atoms, -R′.sub.F is —F or a —CF.sub.3 group, and -A+ is an organic cation selected from the group consisting of tetraalkylammonium, pyridinium, imidazolium, piperidinium, pyrrolidinium, amidinium and guanidinium groups, and (II) at least one metal salt of formula (II): MeB, (H) wherein: -Me.sup.m+ is a metal cation deriving from a metal (Me) selected from the group consisting of groups IB, MB, IVB, VB, VIB, MIA, IVA and VIII (8, 9, 10) of the Periodic Table, preferably from the group consisting of groups IVB, VB, VIB and IMA of the Periodic Table, wherein m is the valence of said metal cation, and —B.sup.n− is an inorganic anion, wherein n is the valence of said inorganic anion. The present invention also pertains to the use of said composition in an electrodeposition process and to the metal-coated assembly thereby provided.

A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R.sub.1 and R.sub.2 is independently H or CH.sub.3, n is 1-3, and x is 1-3.

##STR00001##

A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R.sub.1 and R.sub.2 is independently H or CH.sub.3, n is 1-3, and x is 1-3.

##STR00001##

A multi-acid polymer disclosed herein has the formula

##STR00001##

wherein R is one or more units of a non-SOF.sub.2 or non-SO.sub.2Cl portion of a polymer precursor in sulfonyl fluoride or sulfonyl chloride form, X is a non-sulfonyl halide group of a multi-sulfonyl halide compound having a minimum of two acid giving groups, and Y is remaining sulfonyl halide groups of the multi-sulfonyl halide compound.

A multi-acid polymer disclosed herein has the formula

##STR00001##

wherein R is one or more units of a non-SOF.sub.2 or non-SO.sub.2Cl portion of a polymer precursor in sulfonyl fluoride or sulfonyl chloride form, X is a non-sulfonyl halide group of a multi-sulfonyl halide compound having a minimum of two acid giving groups, and Y is remaining sulfonyl halide groups of the multi-sulfonyl halide compound.

A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

The present invention relates to a new compound of formula (I) wherein the variables have the meaning as indicated in the claims; or an enantiomer or salt thereof. The compounds of formula (I) are useful in the control of parasites, in particular endoparasites, in and on vertebrates.

##STR00001##

The present disclosure provides an ionic liquid and a preparation method thereof, in particular, the present disclosure provides an ionic liquid whose halogen anions content and moisture content are low, and a method for preparing the same. The total content of halogen anions in the ionic liquid is less than 10 ppm, and moisture content in the ionic liquid is less than 50 ppm. The ionic liquid prepared by the method of the present disclosure is suitable for electrochemical systems which have high requirements for moisture content, such as lithium ion secondary batteries and electrochemical supercapacitors.