Patent classifications
C07C63/68
NOVEL HETEROARYL-TRIAZOLE COMPOUNDS AS PESTICIDES
The present invention relates to novel heteroaryl-triazole compounds of the general formula (I), in which the structural elements X, Y, R.sup.1, R.sup.2, R.sup.3a, R.sup.3b, R.sup.4 and R.sup.5 have the meaning given in the description, to formulations and compositions comprising such compounds and for their use in the control of animal pests including arthropods and insects in plant protection and to their use for control of ectoparasites on animals.
##STR00001##
Method for Producing an Organic Electronic Component, and Organic Electronic Component
A metal complex is disclosed. In an embodiment a metal complex includes at least one metal atom M and at least one ligand L attached to the metal atom M, wherein the ligand L has the following structure:
##STR00001## wherein E.sup.1 and E.sup.2 are oxygen, wherein the substituent R.sup.1 is selected from the group consisting of branched or unbranched, fluorinated aliphatic hydrocarbons with 1 to 10 C atoms, wherein n=1 to 5, wherein the substituent R.sup.2 is selected from the group consisting of branched or unbranched aliphatic hydrocarbons with 1 to 10 C atoms, aryl and heteroaryl, wherein m>0 to at most 5−n, and wherein the metal M is a main group metal of groups 13 to 15 of the periodic table of elements.
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator:
##STR00001##
wherein, in formula (I), R.sup.1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other.
Porous cross-linked partially aliphatic polyimide networks
Porous cross-linked partially aliphatic polyimide networks are provided. The polyimide networks comprise a polyamic acid oligomer that (i) comprises a repeating unit of a dianhydride and a diamine and terminal functional groups, (ii) has an average degree of polymerization of 10 to 70, (iii) has been cross-linked via a cross-linking agent, comprising three or more cross-linking groups, at a balanced stoichiometry of the cross-linking groups to the terminal functional groups, and (iv) has been chemically imidized to yield the porous cross-linked polyimide network. The polyimide networks are partially aliphatic based on (a) the diamine comprising a first diamine and a second diamine, wherein the first diamine comprises a linear aliphatic backbone chain, and the second diamine does not, and/or (b) the dianhydride comprising a first dianhydride and a second dianhydride, wherein the first dianhydride comprises a linear aliphatic backbone chain, and the second dianhydride does not.
Porous cross-linked partially aliphatic polyimide networks
Porous cross-linked partially aliphatic polyimide networks are provided. The polyimide networks comprise a polyamic acid oligomer that (i) comprises a repeating unit of a dianhydride and a diamine and terminal functional groups, (ii) has an average degree of polymerization of 10 to 70, (iii) has been cross-linked via a cross-linking agent, comprising three or more cross-linking groups, at a balanced stoichiometry of the cross-linking groups to the terminal functional groups, and (iv) has been chemically imidized to yield the porous cross-linked polyimide network. The polyimide networks are partially aliphatic based on (a) the diamine comprising a first diamine and a second diamine, wherein the first diamine comprises a linear aliphatic backbone chain, and the second diamine does not, and/or (b) the dianhydride comprising a first dianhydride and a second dianhydride, wherein the first dianhydride comprises a linear aliphatic backbone chain, and the second dianhydride does not.
POROUS CROSS-LINKED PARTIALLY ALIPHATIC POLYIMIDE NETWORKS
Porous cross-linked partially aliphatic polyimide networks are provided. The polyimide networks comprise a polyamic acid oligomer that (i) comprises a repeating unit of a dianhydride and a diamine and terminal functional groups, (ii) has an average degree of polymerization of 10 to 70, (iii) has been cross-linked via a cross-linking agent, comprising three or more cross-linking groups, at a balanced stoichiometry of the cross-linking groups to the terminal functional groups, and (iv) has been chemically imidized to yield the porous cross-linked polyimide network. The polyimide networks are partially aliphatic based on (a) the diamine comprising a first diamine and a second diamine, wherein the first diamine comprises a linear aliphatic backbone chain, and the second diamine does not, and/or (b) the dianhydride comprising a first dianhydride and a second dianhydride, wherein the first dianhydride comprises a linear aliphatic backbone chain, and the second dianhydride does not.
Method for Producing an Organic Electronic Component, and Organic Electronic Component
A metal complex is disclosed. In an embodiment the metal complex includes at least one metal atom M and at least one ligand L attached to the metal atom M, wherein the ligand L has the following structure:
##STR00001##
wherein E.sup.1 and E.sup.2 are oxygen, wherein the substituent R.sup.1 is selected from the group consisting of branched or unbranched, fluorinated aliphatic hydrocarbons with 1 to 10 C atoms, wherein n=1 to 5, wherein the substituent R.sup.2 is selected from the group consisting of CN, branched or unbranched aliphatic hydrocarbons with 1 to 10 C atoms, aryl and heteroaryl, and wherein m=0 to at most 5n.
FLUOROISOQUINOLINE COMPOUND AND PRODUCTION METHOD THEREOF
The present invention provides a compound represented by formula (I), a production method thereof, a production intermediate of the same and a method for producing compound B using the compound (I). Compound B is useful as an intermediate for producing compound A that is a BTK inhibitor.
##STR00001##
FLUOROISOQUINOLINE COMPOUND AND PRODUCTION METHOD THEREOF
The present invention provides a compound represented by formula (I), a production method thereof, a production intermediate of the same and a method for producing compound B using the compound (I). Compound B is useful as an intermediate for producing compound A that is a BTK inhibitor.
##STR00001##
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition including a resin component whose solubility in a developing solution is changed by the action of the acid, and a compound represented by General Formula (d0). In the formula, Ar represents an aromatic ring; I represents an iodine atom; Rd.sup.1 represents a substituent; nd1 represents an integer of 0 or greater as long as a valence permits; nd2 represents an integer of 1 or greater as long as a valence permits; and Z.sup.+ represents an organic cation
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