Inhibited tin or titanate catalysts are used in condensation cures of silicone materials. Such catalysts are command cure systems with long open pot life, yet have relatively fast cure when the cure mechanism is triggered. This combines the advantages of the inhibited addition cure systems (command cure) with the advantages of the condensation cure systems (lower cost).

Patterning with UV and EUV light is described with organo tin sulfide (and selenide) clusters. The clusters are solids at room temperature and are soluble in organic solvents that are not too polar. Irradiation can either fragment a carbon metal bond or crosslink unsaturated organic moieties to stabilize the irradiated material. The irradiated material then resists dissolving in organic solvents so that the un-irradiated material can be contacted with an organic solvent to develop the latent image formed with the radiation. Radiation patternable layers can be formed through coating a solution or through vapor deposition. Corresponding precursor solutions, structures and methods are described.

The present invention relates to silane sulfide modifier compounds and methods of making them. The invention also relates to a silane sulfide modified macromolecular compound obtainable by reacting a living anionic elastomeric polymer and a silane sulfide modifier. The silane sulfide modified macromolecular compound may be provided in the form of a polymer composition, and the polymer composition may be vulcanized (cross-linked) by making use of and reaction with at least one vulcanization agent, resulting in a vulcanized polymer composition.

A stabilizer composition having low volatility and high efficiency comprising: (i.) 25.000% to 99.997% by weight of at least one dimethyltin compound of formula (CH.sub.3).sub.2Sn(S(CH.sub.2).sub.mCOOR.sub.1).sub.2 wherein R.sub.1 is a linear, branched or cyclic C.sub.10-C.sub.20 alkyl group and m is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (ii.) 0.001% to 50.000% by weight of at least one mono-methyltin compound of formula CH.sub.3Sn(S(CH.sub.2).sub.nCOOR.sub.2).sub.3 wherein R.sub.2 is a linear, branched or cyclic C.sub.10-C.sub.20 alkyl group and n is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; (iii.) 0.001% to 10.000% by weight of at least one tri-methyltin compound of formula (CH.sub.3).sub.3Sn(S(CH.sub.2).sub.pCOOR.sub.3) wherein R.sub.3 is a linear, branched or cyclic C.sub.10-C.sub.20 alkyl group and p is 1 or 2, optionally containing unsaturations in the form of double or triple bonds; and (iv.) 0.001% to 15.000% by weight of at least one thioester of formula HS(CH.sub.2).sub.qCOOR.sub.4 wherein R.sub.4 is a linear, branched or cyclic C.sub.10-C.sub.20 alkyl group and q is 1 or 2, optionally containing unsaturations in the form of double or triple bonds.

Organotin compounds bearing cyclopentadienyl, sulfur, selenium, or tellurium as photoresists, and/or precursors for photolithography patterning, or thermoelectric materials, are described, particularly for extreme ultraviolet radiation (EUV), wherein cyclopentadienyl comprises cyclopentadienyl C.sub.5H.sub.5 group, or substituted cyclopentadienyl C.sub.5H.sub.3R, CH.sub.2R.sub.2, C.sub.5HR.sub.3, C.sub.5R.sub.4, or C.sub.5R.sub.5 group with hapticity of .sup.1, .sup.2, .sup.3, .sup.4, or .sup.5 of isomers.

The invention provides a two-dimensional chalcogenide, which is a crystalline material, and has a chemical formula of (NH.sub.4).sub.2[Sn.sub.3S.sub.7].Math.(C.sub.4H.sub.13N.sub.3).sub.1.41, cell parameters of a=b=13.2307(10) , c=19.335(2) , ==90, and =120, and space group of P6.sub.3/mmc. The invention further provides a method for preparing the two-dimensional chalcogenide and use thereof in the adsorption of iodine vapor. The two-dimensional chalcogenide of the present invention is capable of removing iodine vapor of various concentrations (as low as 400 ppm) over a wide range of temperatures (25 C.-75 C.), without desorption of iodine after standing for a long time.