Patent classifications
C08F12/02
Thermoplastic Resin Composition and Article Produced Therefrom
A thermoplastic resin composition and a molded article produced therefrom. The thermoplastic resin composition includes about 100 parts by weight of a thermoplastic resin and about 0.5 to about 30 parts by weight of zinc oxide. The zinc oxide has a peak intensity ratio (B/A) of about 0.1 to about 1.0, wherein A indicates a peak in the wavelength range of 370 nm to 390 nm and B indicates a peak in the wavelength range of 450 nm to 600 nm in photoluminescence measurement. The thermoplastic resin composition can exhibit good properties in terms of weather resistance, antibacterial properties, and the like.
Thermoplastic Resin Composition and Article Produced Therefrom
A thermoplastic resin composition and a molded article produced therefrom. The thermoplastic resin composition includes about 100 parts by weight of a thermoplastic resin and about 0.5 to about 30 parts by weight of zinc oxide. The zinc oxide has a peak intensity ratio (B/A) of about 0.1 to about 1.0, wherein A indicates a peak in the wavelength range of 370 nm to 390 nm and B indicates a peak in the wavelength range of 450 nm to 600 nm in photoluminescence measurement. The thermoplastic resin composition can exhibit good properties in terms of weather resistance, antibacterial properties, and the like.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN
According to an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) including a repeating unit (a1) having a partial structure in which a phenolic hydroxy group is protected with a structure represented by a formula (1) below, a pattern in which generation of defects is suppressed can be formed:
##STR00001##
wherein X represents a halogen atom or an electron-withdrawing group, R.sub.1 represents a hydroxy group or an organic group, k represents an integer of 0 to 3, n represents an integer of 0 to (4+2k), m represents an integer of 1 to (5+2k), satisfying a relationship of 1(n+m)(5+2k), and a plurality of R.sub.1's and X's may be the same or different according to an integer of n and m respectively, and * represents a bonding site to an oxygen atom of the phenolic hydroxy group.
Reactive mesogen based polymer particles
This invention relates to a process for the preparation of monodisperse optical and shape anisotropic polymer particles comprising monomer units of at least one reactive mesogen, such particles per se, the use of these particles for the preparation of optical, electrooptical, electronic electrochemical, electrophotographic, electrowetting and electrophoretic displays and/or devices and security, cosmetic, decorative, and diagnostic applications, and electrophoretic fluids and displays.
Method for monitoring a control parameter of a polymerization reaction and relative apparatus for implementing said method
The present invention relates to a method for monitoring a control parameter of a polymerization reaction mixture in heterogeneous phase comprising the following steps: (a) acquiring at least one NIR reflectance spectrum of said mixture; (b) calculating a value of said control parameter by means of a calibration curve which correlates the NIR reflectance spectrum with the values of said control parameter measured with a reference measurement method. The present invention also relates to an apparatus for implementing said method.
Functionalized polymer, rubber composition and pneumatic tire
The present invention is directed to a functionalized elastomer comprising the reaction product of a living anionic elastomeric polymer and a polymerization terminator of formula I ##STR00001##
wherein R.sup.1 is C1 to C4 linear alkyl, or C1 to C4 branched alkanediyl; X.sup.1, X.sup.2, X.sup.3 are independently O, S, or a group of formula (II) or (III) ##STR00002##
where R.sup.2 is C1 to C18 linear or branched alkyl; Z is R.sup.3, OR.sup.4, or R.sup.5X.sup.4; R.sup.3, R.sup.4 are independently C1 to C18 linear or branched alkyl; R.sup.5 is C1 to C18 alkanediyl or dialkyl ether diyl; X.sup.4 is halogen or a group of structure IV, V, VI, VII or VIII ##STR00003##
wherein R.sup.6, R.sup.7, R.sup.8, R.sup.9, and R.sup.10 are independently H or C1 to C8 alkyl; R.sup.11 is C2 to C8 alkanediyl; R.sup.12 and R.sup.13 are independently H, aryl or C1 to C8 alkyl; Q is N or a group of structure IX ##STR00004##
wherein R.sup.14 is C1 to C8 alkyl.
Functionalized elastomer via allylboration
The present invention is directed to a functionalized elastomer comprising the reaction product of Y and Z, wherein Y is a copolymer of a first monomer and a second monomer, wherein the first monomer is selected from the group consisting of 1,3-butadiene, isoprene, and styrene; and the second monomer is selected from the group consisting of formula 1 and 2 ##STR00001##
wherein B is boron; O is oxygen; R.sup.1 and R.sup.2 are independently linear or branched alkyl groups containing 1 to 10 carbon atoms; R.sup.3 is hydrogen or a linear or branched alkyl group containing 1 to 10 carbon atoms; and R.sup.4 is a linear or branched alkane diyl group containing 1 to 20 carbon atoms, or a bridging aromatic group; and Z is a compound of formula 3 ##STR00002##
where R.sup.5 is phenylene, a linear or branched alkane diyl group containing from 1 to 10 carbon atoms, or a combination of one or more phenylene groups and one or more linear or branched alkane diyl groups containing from 1 to 10 carbon atoms; and Q is hydrogen, bromine, or a functional group comprising at least one heteroatom selected from the group consisting of nitrogen, oxygen, phosphorus, silicon, and sulfur.
Method of making a functionalized elastomer via allylboration
The present invention is directed to a method of making a functionalized elastomer, comprising the steps of: forming a copolymer Y by copolymerizing a first monomer and a second monomer, wherein the first monomer is selected from the group consisting of 1,3-butadiene, isoprene, and styrene; the second monomer is selected from the group consisting of formula 1 or 2 ##STR00001##
wherein B is boron; O is oxygen; R.sup.1 and R.sup.2 are independently linear or branched alkyl groups containing 1 to 10 carbon atoms; R.sup.3 is hydrogen or a linear or branched alkyl group containing 1 to 10 carbon atoms; and R.sup.4 is a linear or branched alkane diyl group containing 1 to 20 carbon atoms, or a bridging aromatic group; and reacting the copolymer Y with a compound Z to form the functionalized elastomer, wherein Z is a compound of formula 3 ##STR00002##
where R.sup.5 is phenylene, a linear or branched alkane diyl group containing from 1 to 10 carbon atoms, or a combination of one or more phenylene groups and one or more linear or branched alkane diyl groups containing from 1 to 10 carbon atoms; and Q is hydrogen, bromine, or a functional group comprising at least one heteroatom selected from the group consisting of nitrogen, oxygen, phosphorus, silicon, and sulfur.
COMPOSITION FOR TREATING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING MODIFIED SUBSTRATE
The present invention provides a composition for treating a semiconductor device, which can preferentially form a coating film on a first surface in a case of being brought into contact with a substrate having a first surface containing a metal atom and a second surface not containing a metal atom, and can selectively form a coating film on the first surface even after storage; and a method for manufacturing a modified substrate using the composition for treating a semiconductor device. The composition for treating a semiconductor device of the present invention contains a polymer having a functional group which interacts with a surface containing a metal atom in a substrate and an ethylenically unsaturated group, a polymerization inhibitor, and a solvent.