Patent classifications
C08F220/1811
Curable compositions for pressure-sensitive adhesives
Curable compositions, cured compositions, articles containing the curable or cured compositions, and methods of making the articles are provided. More particularly, the curable compositions contain a (meth)acrylate-based polymer having pendant (meth)acryloyl groups, at least one monomer having a single ethylenically unsaturated group, a photoinitiator that includes an acyl phosphine oxide, and a thixotropic agent. The curable compositions can be printed or dispensed, if desired, and the cured compositions are pressure-sensitive adhesives.
Curable compositions for pressure-sensitive adhesives
Curable compositions, cured compositions, articles containing the curable or cured compositions, and methods of making the articles are provided. More particularly, the curable compositions contain a (meth)acrylate-based polymer having pendant (meth)acryloyl groups, at least one monomer having a single ethylenically unsaturated group, a photoinitiator that includes an acyl phosphine oxide, and a thixotropic agent. The curable compositions can be printed or dispensed, if desired, and the cured compositions are pressure-sensitive adhesives.
Eyelash Extension Adhesive
Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.
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Eyelash Extension Adhesive
Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.
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METHOD FOR PRODUCING A REMOVABLE PRESSURE-SENSITIVE ADHESIVE (PSA) AND PRESSURE-SENSITIVE ADHESIVE THUS PRODUCED
The present invention refers to a method for producing polymeric compositions, preferably dispersions (i.e. emulsions or latices), which are particularly useful as or in adhesives, especially pressure-sensitive adhesives, particularly pressure-sensitive adhesives removable under neutral or basic (alkaline) conditions, as well as to the polymeric compositions thus produced and to their various applications.
METHOD FOR PRODUCING A REMOVABLE PRESSURE-SENSITIVE ADHESIVE (PSA) AND PRESSURE-SENSITIVE ADHESIVE THUS PRODUCED
The present invention refers to a method for producing polymeric compositions, preferably dispersions (i.e. emulsions or latices), which are particularly useful as or in adhesives, especially pressure-sensitive adhesives, particularly pressure-sensitive adhesives removable under neutral or basic (alkaline) conditions, as well as to the polymeric compositions thus produced and to their various applications.
PHOTOPOLYMERIZATION INITIATOR
The present application provides a photopolymerization initiator having one or more ethylenic unsaturated bonds and one or more photopolymerization initiating functional groups in the molecule has been found. One or more kinds selected from an acrylamide group, an acrylate group, a vinyl group, an allyl group, a maleimide group, and the like can be suitably used as the ethylenic unsaturated bond, and a benzophenone compound having a specific structure can be suitably used as the photopolymerization initiating functional group.
PHOTOPOLYMERIZATION INITIATOR
The present application provides a photopolymerization initiator having one or more ethylenic unsaturated bonds and one or more photopolymerization initiating functional groups in the molecule has been found. One or more kinds selected from an acrylamide group, an acrylate group, a vinyl group, an allyl group, a maleimide group, and the like can be suitably used as the ethylenic unsaturated bond, and a benzophenone compound having a specific structure can be suitably used as the photopolymerization initiating functional group.
PHOTOCURABLE COMPOSITION, CURED BODY, GASKET IN WHICH CURED BODY IS USED, WATERTIGHT STRUCTURE, AND METHOD FOR MANUFACTURING GASKET
A photocurable composition is provided. A cured product formed by curing the photocurable composition has reworkability and excellent heat resistance while having flexibility. The photocurable composition includes a telechelic acrylic polymer having an acryloyl group at both ends; a polyfunctional acrylic polymer having acryloyl groups; a monofunctional acrylic monomer; and a fumed silica including at least one of a hydrophilic fumed silica or a fumed silica having a polar group. The photocurable composition has a Martens hardness of 0.07 to 0.75 N/mm.sup.2, where the Martens hardness is a hardness after the photocurable composition is cured.
PHOTOCURABLE COMPOSITION, CURED BODY, GASKET IN WHICH CURED BODY IS USED, WATERTIGHT STRUCTURE, AND METHOD FOR MANUFACTURING GASKET
A photocurable composition is provided. A cured product formed by curing the photocurable composition has reworkability and excellent heat resistance while having flexibility. The photocurable composition includes a telechelic acrylic polymer having an acryloyl group at both ends; a polyfunctional acrylic polymer having acryloyl groups; a monofunctional acrylic monomer; and a fumed silica including at least one of a hydrophilic fumed silica or a fumed silica having a polar group. The photocurable composition has a Martens hardness of 0.07 to 0.75 N/mm.sup.2, where the Martens hardness is a hardness after the photocurable composition is cured.