Patent classifications
C08F220/38
Biofouling resistant coatings and methods of making and using the same
Disclosed herein are compositions to use in biofouling-resistant coatings, biofouling-resistant coatings, methods of making biofouling-resistant coatings, biofouling-resistant devices, and methods of making biofouling-resistant devices.
PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT
A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and a high transparency, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure are used as the photopolymerizable compound, and a phosphine oxide compound and an oxime ester compound are used as the photopolymerization initiator.
MIXED-CHARGE COPOLYMER ANTIBIOFILM COATINGS
Disclosed herein is a composite material suitable for inhibiting biofilm growth, the composite material comprising a substrate material and a random copolymeric material covalently bonded to a surface of the substrate material. The random copolymer contains repeating units having at least one functional group bearing a cationic charge and repeating units having at least one functional group bearing an anionic charge, where the repeating units are derived from compatible monomers that belong to different monomer classes having differing polymerisation kinetics. Specifically, the random copolymeric material is poly(AMPTMA-ran-SPM), wherein AMPTMA is (3-acrylamidopropyl) trimethylammonium chloride and SPM is 3-sulfopropyl methacrylate potassium. Also disclosed are methods of manufacturing said material and applications thereof.
MIXED-CHARGE COPOLYMER ANTIBIOFILM COATINGS
Disclosed herein is a composite material suitable for inhibiting biofilm growth, the composite material comprising a substrate material and a random copolymeric material covalently bonded to a surface of the substrate material. The random copolymer contains repeating units having at least one functional group bearing a cationic charge and repeating units having at least one functional group bearing an anionic charge, where the repeating units are derived from compatible monomers that belong to different monomer classes having differing polymerisation kinetics. Specifically, the random copolymeric material is poly(AMPTMA-ran-SPM), wherein AMPTMA is (3-acrylamidopropyl) trimethylammonium chloride and SPM is 3-sulfopropyl methacrylate potassium. Also disclosed are methods of manufacturing said material and applications thereof.
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.
Self-polishing zwitterionic anti-fouling resin having main chain degradability and preparation therefor and use thereof
The present invention belongs to the technical field of marine anti-fouling materials, and discloses a self-polishing zwitterionic anti-fouling resin having a main chain degradability and the preparation therefor and the use thereof. The self-polishing zwitterionic anti-fouling resin is formed by copolymerizing the following three monomers (in the total mass of the monomers): 1% to 80% of an olefinic reactive monomer, 1% to 80% of a cycloketene acetal monomer, and 1% to 80% of a betaine type precursor. The anti-fouling resin has a main chain degradability and a side chain hydrolyzability, and the transition of a coating from being hydrophobic to being hydrophilic is achieved by the hydrolysis of a surface to produce a super-hydrophilic zwitterionic surface, in order to further enhance the anti-fouling ability of the system. The material not only overcomes the disadvantages of poor mechanical properties and poor solubility in an organic solvent of a zwitterionic material, but can also effectively control the long-term stable release of an anti-fouling agent, so as to achieve a synergistic anti-fouling effect of the anti-fouling agent and an anti-protein. The method of the present invention is simple, has a relatively low cost, and is suitable for industrial production. The material is used in the field of marine anti-fouling coatings.
Positive resist composition and patterning process
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
Curable high refractive index ink compositions and articles prepared from the ink compositions
Curable ink compositions include at least one aromatic (meth)acrylate, at least one multifunctional (meth)acrylate with heteroaromatic groups, fused aromatic groups, heteroalkylene groups, or a group containing both heteroalkylene and aromatic groups, and a photoinitiator. The curable ink composition is Inkjet printable, having a viscosity of 30 centipoise or less at a temperature of from room temperature to 35° C., and is free from solvents. The ink composition, when printed and cured has a refractive index of 1.55 or greater, and is optically clear. The cured ink composition, when cured to a thickness of from 1-16 micrometers, has a surface roughness of less than or equal to 5 nanometers.
Curable high refractive index ink compositions and articles prepared from the ink compositions
Curable ink compositions include at least one aromatic (meth)acrylate, at least one multifunctional (meth)acrylate with heteroaromatic groups, fused aromatic groups, heteroalkylene groups, or a group containing both heteroalkylene and aromatic groups, and a photoinitiator. The curable ink composition is Inkjet printable, having a viscosity of 30 centipoise or less at a temperature of from room temperature to 35° C., and is free from solvents. The ink composition, when printed and cured has a refractive index of 1.55 or greater, and is optically clear. The cured ink composition, when cured to a thickness of from 1-16 micrometers, has a surface roughness of less than or equal to 5 nanometers.