The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.

To provide a polychloroprene latex from which a dip-formed film that is excellent in mechanical properties while having flexibility can be obtained. The polychloroprene latex is a mercaptan-modified polychloroprene latex comprising polychloroprene that is a copolymer of chloroprene and 2,3-dichloro-1,3-butadiene, wherein in a solid state 13C NMR spectrum of the polychloroprene obtained by freeze-drying the mercaptan-modified polychloroprene latex, an area (A) of a peak at 126.2 to 127.6 ppm, an area (B) of a peak at 122.0 to 126.2 ppm and an area (C) of a peak at 129.9 to 130.3 ppm are in the ranges represented by the following expression (I), an amount of the 2,3-dichloro-1,3-butadiene copolymerized is 4 to 35% by mass per 100% by mass in total of the chloroprene and the 2,3-dichloro-1,3-butadiene contained in the polychloroprene, and a toluene-insoluble content of the polychloroprene is 50 to 100% by mass in 100% by mass of the polychloroprene.

[00001]$\begin{array}{cc}\frac{4.0}{100}\leqq \frac{A}{B-C}\leqq \frac{5.8}{100}& \left(I\right)\end{array}$

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.

Embodiments of an optical adhesive are provided. The optical adhesive includes about 20% to about 60% by volume of first monomers. The first monomers have at least two acrylate or methacrylate groups. The optical adhesive also includes about 40% to about 80% by volume of second monomers. The second monomers have at least one fluorine atom and at least one acrylate or methacrylate group. The optical adhesive has a refractive index of from about 1.40 to about 1.55, and in the temperature range of about 10 C. to about 85 C., the refractive index of the optical adhesive has a thermal drift dn/dT of less than about 410.sup.4/ C. Embodiments of a mechanical joint between two optical fiber segments using the optical adhesive and embodiments of a method for joining two optical fiber segments are also provided.

Embodiments of an optical adhesive are provided. The optical adhesive includes about 20% to about 60% by volume of first monomers. The first monomers have at least two acrylate or methacrylate groups. The optical adhesive also includes about 40% to about 80% by volume of second monomers. The second monomers have at least one fluorine atom and at least one acrylate or methacrylate group. The optical adhesive has a refractive index of from about 1.40 to about 1.55, and in the temperature range of about 10 C. to about 85 C., the refractive index of the optical adhesive has a thermal drift dn/dT of less than about 410.sup.4/ C. Embodiments of a mechanical joint between two optical fiber segments using the optical adhesive and embodiments of a method for joining two optical fiber segments are also provided.

The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same.

The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same.

Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkyl group which may be substituted with a fluorine atom, R.sup.3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R.sup.4 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R.sup.2 and R.sup.3 is 1 to 6, and R.sup.2 and R.sup.3, or R.sup.2 and R.sup.4 may be bonded to each other and form a ring. ##STR00001##

Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkyl group which may be substituted with a fluorine atom, R.sup.3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R.sup.4 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R.sup.2 and R.sup.3 is 1 to 6, and R.sup.2 and R.sup.3, or R.sup.2 and R.sup.4 may be bonded to each other and form a ring. ##STR00001##