A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3):

##STR00001##

wherein, X is C.sub.1-5 linear alkylene, R.sup.1 is H or CH.sub.3; each of R.sup.2, R.sup.3, and R.sup.4 is independently H, CH.sub.3, or C.sub.2H.sub.5; and the sum of the number of carbon atoms on R.sup.2, R.sup.3, and R.sup.4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends:

##STR00002##

wherein, each of R.sup.6 and R.sup.7 is independently C.sub.1-3 alkyl; R.sup.5 is C.sub.1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.

A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3):

##STR00001##

wherein, X is C.sub.1-5 linear alkylene, R.sup.1 is H or CH.sub.3; each of R.sup.2, R.sup.3, and R.sup.4 is independently H, CH.sub.3, or C.sub.2H.sub.5; and the sum of the number of carbon atoms on R.sup.2, R.sup.3, and R.sup.4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends:

##STR00002##

wherein, each of R.sup.6 and R.sup.7 is independently C.sub.1-3 alkyl; R.sup.5 is C.sub.1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.

A hydrophobic hybrid organosiloxane nano latex is provided as the copolymerizate of: (a) organosiloxane monomer of the general formula M.sub.aM.sup.v.sub.bD.sub.cD.sup.v.sub.dT.sub.eT.sup.v.sub.fQ.sub.g
wherein: M=R.sub.1R.sub.2R.sub.3SiO.sub.1/2, M.sup.v=R.sub.4R.sub.5R.sub.uSiO.sub.1/2, D=R.sub.6R.sub.7SiO.sub.2/2, D.sup.v=R.sub.8R.sub.uSiO.sub.2/2, T=R.sub.9SiO.sub.3/2, T.sup.v=R.sub.uSiO.sub.3/2, and Q=SiO.sub.4/2 in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8 and R.sub.9 each independently is hydrogen, a hydroxyl group, a hydrocarbyl group having up to 100 carbon atoms and optionally containing at least one hetroatom; R.sub.u is a free-radical polymerizable group; subscripts a, b, c, d, e, f and g each independently range from 0 to 10,000 subject to the limitation that b+d+f is at least 1, p, q and r are integers independently selected from 0 to 100 and subscript h is 0 or 1; and, (b) monomer possessing a group which is free-radical copolymerizable with group R.sub.u of organosiloxane monomer (a).

A hydrophobic hybrid organosiloxane nano latex is provided as the copolymerizate of: (a) organosiloxane monomer of the general formula M.sub.aM.sup.v.sub.bD.sub.cD.sup.v.sub.dT.sub.eT.sup.v.sub.fQ.sub.g
wherein: M=R.sub.1R.sub.2R.sub.3SiO.sub.1/2, M.sup.v=R.sub.4R.sub.5R.sub.uSiO.sub.1/2, D=R.sub.6R.sub.7SiO.sub.2/2, D.sup.v=R.sub.8R.sub.uSiO.sub.2/2, T=R.sub.9SiO.sub.3/2, T.sup.v=R.sub.uSiO.sub.3/2, and Q=SiO.sub.4/2 in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8 and R.sub.9 each independently is hydrogen, a hydroxyl group, a hydrocarbyl group having up to 100 carbon atoms and optionally containing at least one hetroatom; R.sub.u is a free-radical polymerizable group; subscripts a, b, c, d, e, f and g each independently range from 0 to 10,000 subject to the limitation that b+d+f is at least 1, p, q and r are integers independently selected from 0 to 100 and subscript h is 0 or 1; and, (b) monomer possessing a group which is free-radical copolymerizable with group R.sub.u of organosiloxane monomer (a).

A radiation-curable organopolysiloxane composition comprising the components (A), (B) and (C): (A) organopolysiloxane represented by the formula (1), wherein at least one of R.sup.1 is a (meth)acryloyl group-containing organic group, a is an integer of 2 or more, a, b, c and d satisfy an equation, 2≤a+b+c+d≤1,000, and a ratio of the total number of the hydroxyl group and the hydroxyl group-containing organic group to the total number of the (meth)acryloyl group-containing organic group, the hydroxyl group and the hydroxyl group-containing organic group is 0.4 or less; (B) compound having two or more acrylic groups in one molecule in an amount of 0.1 to 50 parts by mass, relative to 100 parts by mass of component (A); and (C) radical polymerization initiator in an amount of 0.1 to 15 parts by mass, relative to 100 parts by mass of component (A).

A radiation-curable organopolysiloxane composition comprising the components (A), (B) and (C): (A) organopolysiloxane represented by the formula (1), wherein at least one of R.sup.1 is a (meth)acryloyl group-containing organic group, a is an integer of 2 or more, a, b, c and d satisfy an equation, 2≤a+b+c+d≤1,000, and a ratio of the total number of the hydroxyl group and the hydroxyl group-containing organic group to the total number of the (meth)acryloyl group-containing organic group, the hydroxyl group and the hydroxyl group-containing organic group is 0.4 or less; (B) compound having two or more acrylic groups in one molecule in an amount of 0.1 to 50 parts by mass, relative to 100 parts by mass of component (A); and (C) radical polymerization initiator in an amount of 0.1 to 15 parts by mass, relative to 100 parts by mass of component (A).

According to the present invention, an ultraviolet curable silicone composition for stereolithography, which contains (A) an organopolysiloxane that has two groups represented by formula (1) ##STR00001##
(wherein each R.sup.1 independently represents a monovalent hydrocarbon group having 1-20 carbon atoms; R.sup.2 represents an oxygen atom or the like; R.sup.3 represents an acryloyloxyalkyl group or the like; p represents a number satisfying 0≤p≤10; and a represents a number satisfying 1≤a≤3) in each molecule,
(B) an organopolysiloxane resin that is composed of (a) a unit represented by formula (2) ##STR00002##
(wherein R.sup.1-R.sup.3, a and p are as defined above), (b) an R.sup.4.sub.3SiO.sub.1/2 unit (wherein each R.sup.4 independently represents a monovalent hydrocarbon group having 1-10 carbon atoms) and (c) an SiO.sub.4/2 unit, and wherein the molar ratio of the total of the unit (a) and the unit (b) to the unit (c) is within the range of 0.6-1.2:1 and
(C) a photopolymerization initiator has a viscosity that is applicable to a stereolithography system such as lifting system and forms a cured product which has excellent physical properties of rubber.

According to various embodiments, an extruded foam is formed from a composition comprising from 1 to 99 wt % of a silicone-functionalized polyethylene comprising a reaction product of the polymerization of ethylene and (meth)acrylic ester functionalized polydimethylsiloxane, and a physical blowing agent. The foam has a density of less than or equal to 0.200 g/cm.sup.3 as measured in accordance with ASTM D1622-88 at 25° C.