C08K5/5398

POLYARYLENE SULFIDE RESIN COMPOSITION, AND METHOD FOR IMPROVING MOLDABILITY OF POLYARYLENE SULFIDE RESIN
20230272189 · 2023-08-31 ·

The present disclosure is directed to providing a polyarylene sulfide resin composition having excellent mechanical properties, surface appearance and heat resistance as well as excellent moldability, and a method for enhancing moldability of a polyarylene sulfide resin without deterioration of mechanical properties such as strength, impact, and heat resistance, as well as surface appearance. The goal of the present disclosure is accomplished by a polyarylene sulfide resin composition including a polyarylene sulfide and a zinc dialkyldithiophosphate.

Giant macromolecules: copolydendrimers containing heteroatoms

A synthesis method includes synthesising copolydendrimers containing heteroatoms from at least two dendrimers as starting precursors.

Giant macromolecules: copolydendrimers containing heteroatoms

A synthesis method includes synthesising copolydendrimers containing heteroatoms from at least two dendrimers as starting precursors.

COMPOUND

The present invention provides a novel compound represented by formula (I) or formula (II) capable of reducing the color difference before and after post-baking.

##STR00001##

[In the formula (I), Y.sup.1 and Z.sup.1 each independently represent an oxygen atom or a sulfur atom, and Z.sup.2 and Z.sup.3 each independently represent a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y.sup.1, Z.sup.1, Z.sup.2, and Z.sup.3 represents a sulfur atom, and in the formula (II), Y2 and Z4 each independently represent an oxygen atom or a sulfur atom, and Z5 represents a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y2, Z4, and Z5 represents a sulfur atom.]

COMPOUND

The present invention provides a novel compound represented by formula (I) or formula (II) capable of reducing the color difference before and after post-baking.

##STR00001##

[In the formula (I), Y.sup.1 and Z.sup.1 each independently represent an oxygen atom or a sulfur atom, and Z.sup.2 and Z.sup.3 each independently represent a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y.sup.1, Z.sup.1, Z.sup.2, and Z.sup.3 represents a sulfur atom, and in the formula (II), Y2 and Z4 each independently represent an oxygen atom or a sulfur atom, and Z5 represents a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y2, Z4, and Z5 represents a sulfur atom.]

Rubber mixture and tire made by the same

The present disclosure provides a rubber mixture and a tire made the same. The rubber mixture consists essentially of: at least one kind of polar or non-polar rubber, at least one kind of filler, at least one kind of vulcanizing agent, at least one kind of accelerant, an optional anti-scorching agent, and an optional aromatic material. The accelerant is a compound containing two or more X-Y single bonds, wherein X is selected from element O and S, and Y is selected from element N and P. The rubber mixture and the tires of the present disclosure adopt improved accelerants and anti-scorching agents to reduce the generation of pungent volatile organic compound such as aniline, cyclohexylamine, tert-butylamine, and imine, thereby improving the odor problem of the tire. Meanwhile, the present disclosure omits carbon black, zinc oxide and other substances with fine powders, thereby reducing dust hazards to the operators.

Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance

The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.

Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance

The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.

FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE

The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.

FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE

The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.