The invention provides a method for the cleaning of a soiled substrate, the method comprising treating the substrate with a non-polymeric solid particulate cleaning material and wash water, the treatment being carried out in an apparatus comprising a drum comprising perforated side walls and having a capacity of between 5 and 50 liters for each kg of fabric in the washload, wherein the solid particulate cleaning material comprises a multiplicity of non-polymeric particles at a particle to fabric addition level of 0.1:1-10:1 by mass, each of the particles being substantially cylindrical or spherical in shape, and wherein the drum comprising perforated side walls is rotated at a speed which generates G forces in the range of from 0.05 to 900 G. The non-polymeric particles may comprise particles of glass, silica, stone, wood, or any of a variety of metals or ceramic materials. Preferably the solid particulate cleaning material additionally comprises a multiplicity of polymeric particles each of which is substantially cylindrical or spherical in shape. Preferably, at least one detergent is employed in the cleaning process. The invention provides optimum cleaning performance as a result of improved mechanical interaction between substrate and cleaning media and is preferably used for the cleaning of textile fabrics. The method allows for significant reductions in the consumption of detergents, water and energy when compared with the conventional wet cleaning of textile fabrics, and also facilitates reduced washing-related textile fabric damage. The invention also envisages a cleaning composition comprising a solid particulate cleaning composition and at least one additional cleaning agent.

The invention provides a method for the cleaning of a soiled substrate, the method comprising treating the substrate with a non-polymeric solid particulate cleaning material and wash water, the treatment being carried out in an apparatus comprising a drum comprising perforated side walls and having a capacity of between 5 and 50 liters for each kg of fabric in the washload, wherein the solid particulate cleaning material comprises a multiplicity of non-polymeric particles at a particle to fabric addition level of 0.1:1-10:1 by mass, each of the particles being substantially cylindrical or spherical in shape, and wherein the drum comprising perforated side walls is rotated at a speed which generates G forces in the range of from 0.05 to 900 G. The non-polymeric particles may comprise particles of glass, silica, stone, wood, or any of a variety of metals or ceramic materials. Preferably the solid particulate cleaning material additionally comprises a multiplicity of polymeric particles each of which is substantially cylindrical or spherical in shape. Preferably, at least one detergent is employed in the cleaning process. The invention provides optimum cleaning performance as a result of improved mechanical interaction between substrate and cleaning media and is preferably used for the cleaning of textile fabrics. The method allows for significant reductions in the consumption of detergents, water and energy when compared with the conventional wet cleaning of textile fabrics, and also facilitates reduced washing-related textile fabric damage. The invention also envisages a cleaning composition comprising a solid particulate cleaning composition and at least one additional cleaning agent.

A porous silica particle with the small specific surface area and large pore volume, which is contained as the scrubbing agent in the cleansing cosmetics is provided. The porous silica particle has high collapsibility, and therefore the damage of the skin can be prevented. A porous silica particle according to the present invention has: an average circularity of 0.1 to 0.5; a pore volume of 0.1≦Pv<1.0 ml/g; a specific surface area of 5 to 60 m.sup.2/cm.sup.3; a median size of 100 to 1000 μm; a ratio of a maximum particle diameter to the median size, of 3.0 or less; and a median size of 5 to 40 μm and a maximum particle diameter of 15 to 200 μm, after rubbing for 30 seconds with a load of 1.0 to 1.4 KPa.

A liquid cleaning and/or cleansing composition comprising abrasive cleaning particles; one or more surfactants selected from the group consisting of anionic, nonionic, cationic, amphoteric and mixtures thereof; and a first acidic component wherein said acidic component consists of one or more chelating acids; wherein at least one nonionic surfactant is comprised in said composition and the total level of nonionic surfactant is less than 2% by weight of the total composition and/or at least one anionic surfactant is comprised in said composition and the total level of anionic surfactant is less than 2% by weight of the total composition.

A liquid cleaning and/or cleansing composition comprising abrasive cleaning particles; one or more surfactants selected from the group consisting of anionic, nonionic, cationic, amphoteric and mixtures thereof; and a first acidic component wherein said acidic component consists of one or more chelating acids; wherein at least one nonionic surfactant is comprised in said composition and the total level of nonionic surfactant is less than 2% by weight of the total composition and/or at least one anionic surfactant is comprised in said composition and the total level of anionic surfactant is less than 2% by weight of the total composition.

A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×10.sup.1 to 1.5×10.sup.3 per mL.

A method for cleaning a substrate which is or comprises a textile, the method comprising agitating the substrate in the presence of a cleaning composition comprising: i. cleaning particles comprising a thermoplastic polyamide and a particulate inorganic filler having a density of at least 2.5 g/cm.sup.3, said cleaning particles having an average particle size of from 1 to 100 mm, wherein the cleaning particles have an average density of at least 1.65 g/cm.sup.3 and/or the particulate inorganic filler has a D.sub.50 particle size of at least 10 microns and/or a D.sub.90 particle size of at least 40 microns; and ii. a liquid medium.

A method for cleaning a substrate which is or comprises a textile, the method comprising agitating the substrate in the presence of a cleaning composition comprising: i. cleaning particles comprising a thermoplastic polyamide and a particulate inorganic filler having a density of at least 2.5 g/cm.sup.3, said cleaning particles having an average particle size of from 1 to 100 mm, wherein the cleaning particles have an average density of at least 1.65 g/cm.sup.3 and/or the particulate inorganic filler has a D.sub.50 particle size of at least 10 microns and/or a D.sub.90 particle size of at least 40 microns; and ii. a liquid medium.

The invention is related to a cleaning capsule for admission to the inner part of a hot beverage system, in particular a coffee machine, whose hollow space contains a cleaning material. The cleaning capsule contains in the hollow space an inert filling material in addition to the cleaning material.

The invention is related to a cleaning capsule for admission to the inner part of a hot beverage system, in particular a coffee machine, whose hollow space contains a cleaning material. The cleaning capsule contains in the hollow space an inert filling material in addition to the cleaning material.