A sewing data generating unit acquires embroidery frame information and a mark alignment region displayed on a display unit for guiding multiple marks that define an embroidery region of the embroidery frame. When the marks are all positioned within the mark alignment region displayed on the display unit, the sewing data generating apparatus acquires an image of the embroidery frame and a sewing target mounted on a base cloth mounted on the embroidery frame. The sewing data generating apparatus performs image analysis based on a correspondence between the acquired information with respect to the embroidery frame and the marks in the acquired image, so as to determine the embroidery region of the embroidery frame. The sewing data generating apparatus generates outline data for the sewing target based on the determined embroidery region. This allows an applique to be sewn at an accurate position without a need to prepare dedicated data.

When marks all align with a mark alignment region in an image, an image is acquired for an embroidery frame and embroidery design sewn to a portion of a cloth mounted on the frame. Image analysis is performed based on correspondence between acquired information for the embroidery frame and for the marks. The embroidery region of the embroidery frame is determined based on analysis results. Acquired images of the cloth having the embroidery design portion and an embroidery design to be sewn to it are displayed. The embroidery design image to be sewn is edited to connect it to the image of the embroidery design already sewn to the portion in the displayed image. This prevents the occurrence of overlapping or gaps between embroidery design units even if accumulated shrinkage occurs in sewing, or slight alignment errors occur in position or rotation when cloth is mounted on the embroidery frame.

A sewing data generating apparatus acquires information with respect to an embroidery frame. The sewing data generating apparatus acquires an image including a base cloth mounting a sewing target and mounted on the embroidery frame, and analyzes a correspondence between acquired information with respect to the embroidery frame and the image of the embroidery frame thus acquired. The sewing data generating apparatus generates outline data for the sewing target based on the analysis result, and generates sewing data based on the outline data thus generated. The sewing data generating apparatus transmits the sewing data thus generated to a sewing machine. The sewing machine receives the sewing data from the sewing data generating apparatus. The sewing machine executes sewing for the outline of the sewing target according to the sewing data thus received. This allows an applique to be sewn at an accurate position without a need to prepare dedicated data.

A sewing data generating apparatus acquires information with respect to an embroidery frame. The sewing data generating apparatus acquires an image including a base cloth mounting a sewing target and mounted on the embroidery frame, and analyzes a correspondence between acquired information with respect to the embroidery frame and the image of the embroidery frame thus acquired. The sewing data generating apparatus generates outline data for the sewing target based on the analysis result, and generates sewing data based on the outline data thus generated. The sewing data generating apparatus transmits the sewing data thus generated to a sewing machine. The sewing machine receives the sewing data from the sewing data generating apparatus. The sewing machine executes sewing for the outline of the sewing target according to the sewing data thus received. This allows an applique to be sewn at an accurate position without a need to prepare dedicated data.

Information with respect to an embroidery frame and information with respect to a mark alignment region are acquired. The mark alignment region is displayed for guiding multiple marks that are provided to an embroidery frame in order to define an embroidery region in the embroidery frame. When the multiple marks thus displayed are all positioned within the mark alignment region, an image of the embroidery region is acquired. Image analysis is performed based on the information with respect to the embroidery frame thus acquired and the information with respect to the multiple corresponding marks within the acquired image. Subsequently, the embroidery region within the embroidery frame is determined based on the analysis result. This allows the embroidery region to be detected with high precision in a simple manner.

Information with respect to an embroidery frame and information with respect to a mark alignment region are acquired. The mark alignment region is displayed for guiding multiple marks that are provided to an embroidery frame in order to define an embroidery region in the embroidery frame. When the multiple marks thus displayed are all positioned within the mark alignment region, an image of the embroidery region is acquired. Image analysis is performed based on the information with respect to the embroidery frame thus acquired and the information with respect to the multiple corresponding marks within the acquired image. Subsequently, the embroidery region within the embroidery frame is determined based on the analysis result. This allows the embroidery region to be detected with high precision in a simple manner.

This system is directed to a computerized system for development of textiles with modified physical properties through stitching and can include a set of non-transitory computer readable instructions configured for: receiving a design pattern representing desired physical properties of a textile having a higher stiffness area and a lower stiffness area; developing a contiguous stitching pattern constrained by a pattern perimeter boundary and having a continuous stitching path, developing a first stiffness area within the contiguous stitching pattern having a first area of density, developing a second stiffness area within the contiguous stitching pattern having a second area of density wherein the first area of density has more stitch density than the second area of density, and transmitting the contiguous stitching pattern to an embroidery machine configured to provide a textile having the contiguous stitching pattern incorporating into the textile.

The sewing system includes a device and a sewing machine including a movement mechanism to move an embroidery frame. The device identifies reference point coordinates representing a position of a reference point provided in a range prescribed by an inner frame of the embroidery frame and transmits the reference point coordinates to the sewing machine. The sewing machine notifies a notification position, using a notification portion, with respect to the range prescribed by the inner frame and acquires a relative movement amount of the embroidery frame with respect to the notification portion, for aligning the notification position and the reference point provided in the range prescribed by the inner frame. The sewing machine decides, on the basis of a relationship between the movement amount and the reference point coordinates, a deviation from a prescribed state of a positional relationship between the inner frame and the movement mechanism.

The sewing system includes a device and a sewing machine including a movement mechanism to move an embroidery frame. The device identifies reference point coordinates representing a position of a reference point provided in a range prescribed by an inner frame of the embroidery frame and transmits the reference point coordinates to the sewing machine. The sewing machine notifies a notification position, using a notification portion, with respect to the range prescribed by the inner frame and acquires a relative movement amount of the embroidery frame with respect to the notification portion, for aligning the notification position and the reference point provided in the range prescribed by the inner frame. The sewing machine decides, on the basis of a relationship between the movement amount and the reference point coordinates, a deviation from a prescribed state of a positional relationship between the inner frame and the movement mechanism.

Provided is a sewing machine in which a stitching needle and a holding frame holding an article to be sewn are positioned relative to each other based on sewing pattern data defining a plurality of needle drop positions, and sewing is performed in accordance with a sewing pattern. The sewing machine includes: an imager for capturing an image of the holding frame; a position detector for detecting, from the image captured by the imager, the position of an indicator indicating a reference position marked in an object to be imaged; and a corrector which, based on a deviation of a detected position of the indicator detected by the position detector with respect to a regular position defined in advance for the indicator, corrects a plurality of needle drop positions defined in the sewing pattern data.