Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

A separation device, such as a centrifugal dryer, for separating a mixture of a solid material and a fluid is described. The device has a housing having at least one housing inlet for supplying the mixture and at least one housing outlet for discharging the solid material or the fluid separated from the mixture. The device also has a rotor that is arranged within the housing and is mounted rotatably around a longitudinal axis. The rotor causes movement of the solid material in the direction of the longitudinal axis by rotating. The rotor has multiple rotor segments, which can be separated from each other.

A modular oast floor panel and an oast drying system is disclosed, particularly for use in drying agricultural crops such as herbs, hops and the like.

A modular oast floor panel and an oast drying system is disclosed, particularly for use in drying agricultural crops such as herbs, hops and the like.

A device for drying work pieces, in particular vehicle wheels, having a dryer housing which borders a dryer chamber and has at least one access to the dryer chamber. Work piece carriers loaded with work pieces can be conveyed through the dryer chamber by a conveyance system. There is a transfer device which transfers work pieces to be dried to a work piece carrier located in the dryer chamber, and removes dried work pieces by a work piece carrier located in the dryer chamber. The work piece carriers can be conveyed in circulation through the dryer chamber without leaving same. A method for drying work pieces, wherein the work piece carriers are correspondingly conveyed through the dryer chamber without leaving same, wherein work pieces to be dried are transferred to a work piece carrier located in the dryer chamber and dried work pieces are removed by a work piece carrier located in the dryer chamber.

A device for drying work pieces, in particular vehicle wheels, having a dryer housing which borders a dryer chamber and has at least one access to the dryer chamber. Work piece carriers loaded with work pieces can be conveyed through the dryer chamber by a conveyance system. There is a transfer device which transfers work pieces to be dried to a work piece carrier located in the dryer chamber, and removes dried work pieces by a work piece carrier located in the dryer chamber. The work piece carriers can be conveyed in circulation through the dryer chamber without leaving same. A method for drying work pieces, wherein the work piece carriers are correspondingly conveyed through the dryer chamber without leaving same, wherein work pieces to be dried are transferred to a work piece carrier located in the dryer chamber and dried work pieces are removed by a work piece carrier located in the dryer chamber.

Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.