A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include window(s) having transparent region(s) that are transparent to electromagnetic radiation within a measurement wavelength range and opaque region(s) that are opaque to electromagnetic radiation within a portion of the measurement wavelength range. A temperature measurement system can include a plurality of infrared emitters configured to emit infrared radiation and a plurality of infrared sensors configured to measure infrared radiation within the measurement wavelength range where the transparent region(s) are at least partially within a field of view the infrared sensors. A controller can be configured to perform operations including obtaining transmittance and reflectance measurements associated with the workpiece and determining, based on the measurements, a temperature of the workpiece less than about 600° C.

An imaging device includes a plurality of electronic components, a phase change material, and a heat transfer structure. The plurality of electronic components is configured to collect data and have a predetermined temperature parameter. The plurality of electronic components is disposed within the phase change material. The phase change material has a first material phase and a second material phase. The phase change material has a first material phase and a second material phase. The phase change material is configured to absorb heat through changing from the first material phase to the second material phase. The heat transfer structure is disposed within the phase change material. The heat transfer structure is configured to conduct heat within the phase change material. The phase change material and the heat transfer structure are further configured to regulate a temperature of the electronic components below the predetermined temperature parameter.

Thermal monitors comprising a substrate with at least one camera position on a bottom surface thereof, a wireless communication controller and a battery. The camera has a field of view sufficient to produce an image of at least a portion of a wafer support, the image representative of the temperature within the field of view. Methods of using the thermal monitors are also described.

A getter assembly is provided and includes a first canister, an internal can including getter, and a second canister. The internal can is disposable in the first canister to occupy a first position at which the getter is hermetically sealable and second positions at which the getter is exposed to an exterior environment. The second canister is engageable with the first canister to drive movements of the internal can between the first position and the second positions following activation and hermetic sealing of the getter.

A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include window(s) having transparent region(s) that are transparent to electromagnetic radiation within a measurement wavelength range and opaque region(s) that are opaque to electromagnetic radiation within a portion of the measurement wavelength range. A temperature measurement system can include a plurality of infrared emitters configured to emit infrared radiation and a plurality of infrared sensors configured to measure infrared radiation within the measurement wavelength range where the transparent region(s) are at least partially within a field of view the infrared sensors. A controller can be configured to perform operations including obtaining transmittance and reflectance measurements associated with the workpiece and determining, based on the measurements, a temperature of the workpiece less than about 600° C.

In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

An apparatus for on-line temperature measurement and gas sampling used in the chute area of CDQ coke oven. The oven external unit includes a temperature indicator, a gas tube, a vacuum tank, and the oven internal unit includes a temperature measuring element, a temperature indicator. The temperature measuring element pass through the oven shell and oven along the oven radical, is located in the upper channel of the high-temperature ceramic tube with double-channel, one end of the high-temperature ceramic tube with double-channel is connected with the gas tube of the vacuum tank. The apparatus solves the problem that hard to measure the temperature and sample the gas of the part where the environment is the most complicated in CDQ coke oven, and has the advantages that the structure is simple, operation is easy to handle and can achieve real-time monitoring for the inner environment of the CDQ coke oven.

A device including a sensor is disclosed. In one embodiment, the sensor includes a thermal infrared sensor or a sensor based on CMOS-SOI-MEMS technology (also referred to as “TMOS”). The sensor is capable of performing at least two functions at the same time. The first is remote temperature measurement and the second is presence detection. The sensor passively collects infrared information and a microprocessor coupled to the sensor determines the temperature as well as presence.

The present invention relates to a method for controlling an evaporation rate of source material (20) in a system (10) for thermal evaporation with electromagnetic radiation (120), wherein the system (10) comprises an electromagnetic radiation source (110) for providing an electromagnetic radiation (120), a vacuum chamber (12) containing a reaction atmosphere (16) and a main detector (40, 100) for measuring electromagnetic radiation (120), wherein a source material (20) and a target material (18) to be coated are arranged in the vacuum chamber (12) and the electromagnetic radiation source (110) is arranged such that its electromagnetic radiation (120) impinges at an angle, preferably at an angle of 45°, on a source surface (22) of the source material (20) for a thermal evaporation and/or sublimation of the source material (20) below the plasma threshold, and wherein the main detector (40, 100) for measuring electromagnetic radiation (120) is arranged such that electromagnetic radiation (120) reflected on the source surface (22) reaches the main detector (40, 100), further wherein the source material (20) is provided by a source element (24), wherein the source surface (22) is located accessible for the electromagnetic radiation (120) at the source element (24), whereby the source element (24) is arranged in a holding structure (28) and movable by the holding structure (28) perpendicular to the source surface (22). Further, the present invention relates to a detector (40) for measuring electromagnetic radiation (120), the detector (40) preferably suitable for a method according to the present invention, and additionally to a system (10) for thermal evaporation with electromagnetic radiation (120) suitable for the method according to the present invention.

A getter assembly is provided and includes a first canister, an internal can including getter, and a second canister. The internal can is disposable in the first canister to occupy a first position at which the getter is hermetically sealable and second positions at which the getter is exposed to an exterior environment. The second canister is engageable with the first canister to drive movements of the internal can between the first position and the second positions following activation and hermetic sealing of the getter.