A diatomite product and method of using such is disclosed. The diatomite product may comprise sodium flux-calcined diatomite, wherein the diatomite product has a crystalline silica content of less than about 1 wt %, and the diatomite product has a permeability between 0.8 darcy and about 30 darcy. In some embodiments, the diatomite product may be in particulate or powdered form. This disclosure also concerns flux-calcined silica products containing low or non-detectable levels of crystalline silica. Some of these products can be further characterized by high permeabilities and a measurable content of opal-C, a hydrated form of silicon dioxide.

The present disclosure relates to a multi-spectrum X-ray grating-based imaging system and imaging method. The multi-spectrum X-ray grating-based imaging system according to the present disclosure comprises an incoherent X-ray source for emitting X-rays to irradiate an object to be detected, a grating module comprising a first absorption grating and a second absorption grating which are disposed in parallel to each other and are sequentially arranged in an X-ray propagation direction, and an energy-resolved detecting device for receiving the X-rays that have passed through the first absorption grating and the second absorption grating. One of the first absorption grating and the second absorption grating performs phase stepping actions within at least one period; during each phase stepping action, the incoherent X-ray source emits X-rays to irradiate the object to be detected; the energy-resolved detecting device receives the X-rays and performs spectrum identification of the X-rays; and after a series of phase stepping actions and data acquisitions over a period, at each pixel on the energy-resolved detecting device, X-ray intensities in each energy range are represented as an intensity curve.

A device for determining the microstructure of a metal product during metallurgical production of the metal product, the device having at least one X-ray source, at least one X-ray detector and at least one accommodating chamber, inside which the X-ray source and/or the X-ray detector is/are arranged and which has at least one window which is transparent to X-ray radiation. To allow reliable determination of the microstructure of a metal product during the metallurgical production thereof, the device includes at least one cooling installation for actively cooling the accommodating chamber.

An analysis apparatus comprises: a moveable stage assembly; a sample holder on a top surface of the stage assembly; a first photon source and a first photon detector or detector array, the first photon source being configured to emit a first beam of photons that intercepts the surface of a sample at a first location on the sample and the first photon detector or detector array being configured to detect photons that are emitted from the first location; and a second photon source and a second photon detector or detector array, the second photon source being configured to emit a second beam of photons that intercepts the surface of the sample at a second location on the sample, the second location being spaced apart from the first location, and the second photon detector or detector array being configured to detect photons that are emitted from the second location.

Provided is a method of analyzing a diffraction pattern of a mixture, the method including: a first step of fitting, through use of a fitting pattern including a term obtained by multiplying a known target pattern indicating a target component by a first intensity ratio, and a term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and having the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters, the fitting pattern to the observed pattern by changing the first and the second intensity ratio in a state where the unknown pattern is set to an initial pattern; and a second step of fitting the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first and the second intensity ratio.

A surface analyzer is provided with a measuring unit, a scatter diagram generation unit, a cluster analysis unit, and a cluster region detection unit. The measuring unit acquires a signal reflecting a quantity of each of a plurality of components or elements that are analysis targets at a plurality of positions on a sample. The scatter diagram generation unit generates a scatter diagram based on a measurement result by the measuring unit. The cluster analysis unit performs the clustering of points in the scatter diagram. The cluster region detection unit acquires, based on clustering information given to each point in the scatter diagram by the cluster analysis unit, for each cluster, cluster region boundary information on a polygon having a predetermined number or less of vertices.

In an analyzer, an image processing unit performs processing of: dividing a measurement image into a plurality of partial measurement images, and dividing a reference image into a plurality of partial reference images; calculating a positional deviation amount of each of the partial measurement images relative to a corresponding partial reference image among the partial reference images; determining whether the positional deviation amount is a threshold or less; and correcting positional deviation of the measurement image based on the positional deviation amounts of the plurality of partial measurement images when the image processing unit has determined that the positional deviation amount is not the threshold or less.

There is provided a molded article containing an amorphous resin, wherein a peak position change rate r (%) of the molded article defined by Equation: Peak position change rate r (%)=100×(Q1−Q2)/Q2 is 1 or more. In the equation, Q1 and Q2 are peak positions (nm.sup.−1) of the molded article and a predetermined reference molded article, respectively, the peak position being determined by a wide angle X-ray diffraction method. The peak position is a peak derived from the amorphous resin in a scattering vector magnitude Q-intensity profile calculated from a diffraction image obtained by a transmission method and measured by the wide angle X-ray diffraction method and obtained after background correction and transmittance correction, and the peak position is a value of Q at a peak at which Q is the smallest among peaks at which Q is in a range of 5 nm.sup.−1 to 25 nm.sup.−1.

A diffraction analysis device and a method for a full-field X-ray fluorescence imaging analysis are disclosed. The device includes a switching assembly, collimation assemblies, an X-ray source, an X-ray detector, a laser indicator, and a computer control system. The switching assembly combines with the collimation assemblies to achieve a functional effect that is previously achieved by two different types of devices through only one device by changing the positioning layout of the X-ray source and the X-ray detector. The full-field X-ray fluorescence imaging analysis can be realized, and the crystal phase composition information and the element distribution imaging information of the sample can be quickly obtained through the same device without scanning, which not only greatly improves the utilization rate of each assembly in the device, reduces the assemblies cost of the device, makes the device structure more compact, but also greatly improves the analysis efficiency and detection accuracy.

A phase analyzer includes a data acquisition unit that acquires spectrum imaging data in which a position on a sample is associated with a spectrum of a signal from the sample; a phase analysis unit that performs phase analysis based on the spectrum imaging data; a display control unit that displays results of the phase analysis on a first screen; and a condition reception unit that receives an operation for changing a condition for the phase analysis, when the condition reception unit has received the operation for changing the condition, the phase analysis unit performing phase analysis under the changed condition, the display control unit displaying on a second screen the results of the phase analysis performed under the changed condition and when a predetermined operation has been performed, the display control unit reflecting on the first screen the results of the phase analysis displayed on the second screen.