A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.

In one general embodiment, an apparatus for moving a sample a precise distance in an imaging device includes a base, and a movable portion positioned above the base and configured to move relative to the base. An extent of motion of the movable portion is constrained by stops. The extent of motion is within 10 nm of a predefined distance of greater than 1 mm. Additional apparatuses and methods are also presented.

In one general embodiment, an apparatus for moving a sample a precise distance in an imaging device includes a base, and a movable portion positioned above the base and configured to move relative to the base. An extent of motion of the movable portion is constrained by stops. The extent of motion is within 10 nm of a predefined distance of greater than 1 mm. Additional apparatuses and methods are also presented.