An apparatus for intraoral scanning comprises an elongate handheld wand comprising a probe at a distal end, one or more light projectors, and two or more cameras. Each light projector comprises at least one light source configured to generate light and a pattern generating optical element configured to generate a pattern of light when the light is transmitted through the pattern generating optical element. Each camera comprises a camera sensor and one or more lenses and is configured to capture a plurality of images that depict at least a portion of the projected pattern of light on an intraoral surface, wherein each camera is configured to focus at an object focal plane that is located between about 1 mm and about 30 mm from a lens of the one or more lenses that is farthest from the camera sensor.

A maskless, extreme ultraviolet (EUV) lithography scanner uses an array of microlenses, such as binary-optic, zone-plate lenses, to focus EUV radiation onto an array of focus spots (e.g. about 2 million spots), which are imaged through projection optics (e.g., two EUV mirrors) onto a writing surface (e.g., at 6× reduction, numerical aperture 0.55). The surface is scanned while the spots are modulated to form a high-resolution, digitally synthesized exposure image. The projection system includes a diffractive mirror, which operates in combination with the microlenses to achieve point imaging performance substantially free of geometric and chromatic aberration. Similarly, a holographic EUV lithography stepper can use a diffractive photomask in conjunction with a diffractive projection mirror to achieve substantially aberration-free, full-field imaging performance for high-throughput, mask-projection lithography. Maskless and holographic EUV lithography can both be implemented at the industry-standard 13.5-nm wavelength, and could potentially be adapted for operation at a 6.7-nm wavelength.

An apparatus for intraoral scanning comprises an elongate handheld wand comprising a probe at a distal end, one or more light projectors, and two or more cameras. Each light projector comprises at least one light source configured to generate light and a pattern generating optical element configured to generate a pattern of light when the light is transmitted through the pattern generating optical element. Each camera comprises a camera sensor and one or more lenses and is configured to capture a plurality of images that depict at least a portion of the projected pattern of light on an intraoral surface, wherein each camera is configured to focus at an object focal plane that is located between about 1 mm and about 30 mm from a lens of the one or more lenses that is farthest from the camera sensor.

An image display apparatus of the present invention includes: a beam emitting section (10) that radially emits a plurality of beams (Ls1 to Ls5) in a horizontal direction; a mirror rotary member (20) having a rotation axis (Pc) and an inner surface, the inner surface having a plurality of mirror surfaces (21) that reflects each of the plurality of beams (Ls1 to Ls5), the mirror rotary member as a whole rotating about the rotation axis (Pc) as a center to thereby perform, by the plurality of mirror surfaces (21), scanning with each of the plurality of beams (Ls1 to Ls5) emitted from the beam emitting section (10) in the horizontal direction; and a screen (2) to be irradiated with the plurality of beams (Ls1 to Ls5) with which the scanning is performed by the plurality of mirror surfaces (21).

A maskless, extreme ultraviolet (EUV) lithography scanner uses an array of microlenses, such as binary-optic, zone-plate lenses, to focus EUV radiation onto an array of focus spots (e.g. about 2 million spots), which are imaged through projection optics (e.g., two EUV mirrors) onto a writing surface (e.g., at 6X reduction, numerical aperture 0.55). The surface is scanned while the spots are modulated to form a high-resolution, digitally synthesized exposure image. The projection system includes a diffractive mirror, which operates in combination with the microlenses to achieve point imaging performance substantially free of geometric and chromatic aberration. Similarly, a holographic EUV lithography stepper can use a diffractive photomask in conjunction with a diffractive projection mirror to achieve substantially aberration-free, full-field imaging performance for high-throughput, mask-projection lithography. Maskless and holographic EUV lithography can both be implemented at the industry-standard 13.5-nm wavelength, and could potentially be adapted for operation at a 6.7-nm wavelength.

An exposure apparatus includes an illumination optical system for illuminating an original including a periodic pattern, a projection optical system for forming an image of the original on a substrate, a controller configured to cause light from the illumination optical system to be obliquely incident on the original such that a light intensity distribution which is line-symmetric with respect to a line, passing through an origin of a pupil region of the projection optical system and orthogonal to a periodic direction of the periodic pattern, is formed in the pupil region by diffracted light beams including diffracted light of not lower than 2nd-order from the periodic pattern, and to control exposure of the substrate such that each point in a shot region of the substrate is exposed in not less than two focus states.

A display apparatus includes a lightguide for conveying images to an eyebox. The lightguide includes a substrate, a diffractive optical element (DOE) configured to couple the image light into the substrate. The DOE has a spatially variable pitch configured to provide the DOE with a positive optical power. The lightguide further includes a grating out-coupler supported by the substrate for out-coupling portions of the image light from the substrate toward the eyebox.

A handheld wand comprises a probe at a distal end of the elongate handheld wand. The probe includes a light projector and a light field camera. The light projector includes a light source and a pattern generator configured to generate a light pattern. The light field camera includes a light field camera sensor, the light field camera sensor comprising an image sensor comprising an array of sensor pixels, and an array of micro-lenses disposed in front of the image sensor such that each micro-lens is disposed over a sub-array of the array of sensor pixels.

A structured light projector and a method for structured light projection are disclosed. The structured light projector includes a projection module, an image sensor and a processor. The projection module is configured to project an optical pattern onto a region of space. The image sensor is configured to capture an image by detecting the optical pattern projected onto the region of space. The processor is configured to calculate disparity information of the optical pattern projected onto the region of space from the captured image, and is configured to compensate for the disparity of depending on an environment temperature of the projection module.

To protect observer's eyes while forming a clear illumination pattern on a desired region to be illuminated. An illumination device includes a light source that emits coherent light, a collimating optical system that enlarges and collimates a beam diameter of the coherent light emitted from the light source, and a diffractive optical element that diffracts the coherent light collimated by the collimating optical system into a predetermined diffusion angle space. The diffractive optical element has a plurality of element diffractive optical portions and has a function to illuminate the region to be illuminated defined at a predetermined position and having predetermined size and shape to form the desired illumination pattern. Each of the plurality of element diffractive optical portions has a function to illuminate at least a part of the region to be illuminated, and diffractive characteristics of the element diffractive optical portions are different from each other.