A position detection apparatus that illuminates light from a light source unit onto an object and that receives reflected light from the object on a light receiver to detect position information of the object, includes a detector (10) and a signal processor (102), the detector includes a first grating (15) in an optical path between the light source unit and the object, a second grating (16) in an optical path between the object and the light receiver, and a third grating (17) in an optical path between the second grating and the light receiver, the signal processor acquires the position information of the object based on a phase variation of the second periodic image detected by the light receiver, and the position information of the object is information related to a distance from the detector to the object.

A kinematically engaged yoke system (KEYS) for multiple-order-diffraction engineered material may comprise a harness comprising a frame and a plurality of semi-kinematic keys disposed on the frame, wherein the semi-kinematic keys are configured based on a MOD-side mechanical profile of a plurality of segments of a multiple-order-diffraction engineered material, and wherein the MOD-side mechanical profile, when engaged with the semi-kinematic keys, functions as a fiducial that provides alignment between neighboring segments; and one or more shims disposed between one or more pairs of neighboring segments of the plurality of segments of the multiple-order-diffraction engineered material, wherein the one or more shims facilitate alignment of the one or more pairs of neighboring segments of the plurality of segments based on a translation across one or more surfaces of the one or more shims.

The present technology relates to an imaging device capable of efficiently separating signals having different characteristics. An image generating unit generates an image of a subject on the basis of pixel signals obtained by performing imaging in a state where light of a predetermined pattern from a structured light (SL) light source is irradiated to projection areas of specific pixels of an imaging unit that images the subject. The present disclosure can be applied to, for example, a camera system including an SL light source and an imaging device.

A method of overlay error measurement includes disposing a reference pattern module over a substrate. The substrate includes first and second overlay measurement patterns in first and second locations. The reference pattern module includes first and second reference patterns. The method includes creating a first overlap of the first reference pattern with the first overlay measurement pattern and a second overlap of the second reference pattern with the second overlay measurement pattern. The method further includes determining a first overlay error between the first reference pattern of the reference pattern module and the first overlay measurement pattern of the substrate and determining a second overlay error between the second reference pattern and the second overlay measurement pattern. The method also includes determining a total overlay error between the first and second overlay measurement patterns of the substrate based on the first and second overlay errors.

A display device includes: a display panel including an active region, an inactive region disposed adjacent to the active region, and a first alignment mark, wherein a plurality of sub-pixels are disposed in the active region, and the first alignment mark is positioned at a first distance in a first direction from an alignment reference pixel disposed adjacent to a boundary of the active region; and an optical member including a plurality of lenses and a second alignment mark, wherein the plurality of lenses are disposed to be inclined at a first angle with respect to a direction in which the plurality of sub-pixels are arranged, and wherein the second alignment mark is positioned at the first distance in the first direction from the alignment reference pixel and is positioned at a second distance in a second direction, crossing the first direction, from the first alignment mark.

A waveguide type display apparatus is provided. This waveguide type display apparatus includes a waveguide through which an image proceeds and a leakage image reducer configured to reduce emission of a leakage image leaked from the waveguide without total internal reflection in the waveguide, from among images, to the outside by a volume grating.

In various embodiments, alignment systems for laser resonators generate near-field and/or far-field images of input beams produced by the laser resonators to enable the alignment of the input beams.

A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer.

An index grating of an optical encoder provided by the invention has a main technical feature of increasing a ratio of light-transmissible area of a grating per unit area, thereby increasing a light source utilization efficiency and a signal intensity, and reducing light-blocking ratio caused by dust and other foreign matters, thereby reducing a degree of influence on light intensity, so as to improve a sensing precision of the optical encoder.

A method of overlay error measurement includes disposing a reference pattern module over a substrate. The substrate includes first and second overlay measurement patterns in first and second locations. The reference pattern module includes first and second reference patterns. The method includes creating a first overlap of the first reference pattern with the first overlay measurement pattern and a second overlap of the second reference pattern with the second overlay measurement pattern. The method further includes determining a first overlay error between the first reference pattern of the reference pattern module and the first overlay measurement pattern of the substrate and determining a second overlay error between the second reference pattern and the second overlay measurement pattern. The method also includes determining a total overlay error between the first and second overlay measurement patterns of the substrate based on the first and second overlay errors.