Provided herein are approaches for cooling a process chamber window. In some embodiments, a system for process chamber window cooling may include a process chamber for processing a wafer, wherein the process chamber includes a window. In some embodiments, the window allows light from a lamp assembly to be delivered to the wafer. The system further includes a cooling apparatus operable with the process chamber, the cooling apparatus for delivering a gas to the window. The cooling apparatus includes a support ring supporting the window. The support ring includes a perimeter wall, and a plurality of slots formed through the perimeter wall. The plurality of slots may deliver a gas (e.g., air) across the window.

A passive IR imaging system with a matrix-array detector in a cryostat includes a cold diaphragm, an image-forming device, of focal length that is continuously variable between F.sub.GC and F.sub.PC with, in this range of focal lengths, a constant numerical aperture and an aperture diaphragm level with the cold diaphragm, comprising a head group of fixed position and constant focal length with at least one lens in a mechanical holding means by the PC configuration, a first group and second group that are movable and positioned in order to ensure the change of focal length between and the focus of the image, an image-transport group of fixed position and of constant magnification, able to image the aperture diaphragm in order to limit the diameter of the PC useful beams on the lenses of the head group. The device comprises a TPC configuration with the first and second movable groups positioned to obtain the focal length F.sub.TPC, and its aperture diaphragm embodied in the mechanical holding means.

Baffle and shutter assembly (BSA) includes a baffle defined by a tubular member having a proximal end, a distal end, and a lumen extending therethrough. A baffle cover disposed at the distal end extends across a major aperture defined by the lumen and includes a cover aperture. A shutter system disposed within the lumen includes a shutter panel having a shutter aperture, and a shutter door. A door distal surface faces the baffle cover when the door is closed and has a reflective coating. The baffle cover has a cover proximal surface which faces toward the shutter system and is highly absorptive of electromagnetic energy in the optical spectrum.

An optical device for microscopic observation 4 comprises: a cold stop 13 having openings 13d, 13e corresponding to a low-magnification microscope optical system 5 and being a stop member arranged in a vacuum vessel 12 to let the light from the sample S pass to the camera 3; a warm stop 10 having an opening 14 corresponding to a high-magnification microscope optical system 5 and being a stop member arranged outside the vacuum vessel 12 to let the light from the sample S pass toward the cold stop 13; and a support member 11 supporting the warm stop 10 so that the warm stop can be inserted to or removed from on the optical axis of the light from the sample S, wherein the warm stop 10 has a reflective surface 15 on the camera 3 side and wherein the opening 14 is smaller than the openings 13d, 13e.

An optical device for microscopic observation 4 comprises: a cold stop 13 having openings 13d, 13e corresponding to a low-magnification microscope optical system 5 and being a stop member arranged in a vacuum vessel 12 to let the light from the sample S pass to the camera 3; a warm stop 10 having an opening 14 corresponding to a high-magnification microscope optical system 5 and being a stop member arranged outside the vacuum vessel 12 to let the light from the sample S pass toward the cold stop 13; and a support member 11 supporting the warm stop 10 so that the warm stop can be inserted to or removed from on the optical axis of the light from the sample S, wherein the warm stop 10 has a reflective surface 15 on the camera 3 side and wherein the opening 14 is smaller than the openings 13d, 13e.

This infrared optical system using the wavelength range of 3 to 5 ?m comprises, in the order from an object side, a first lens having a negative power and formed with a convex meniscus toward an object, a second lens that is convex on both sides, and a cold aperture. A bandpass filter is provided between the second lens and the image surface. The first and second lenses are configured with silicon or germanium with each provided with an aspheric surface at least on one side. The infrared optical system satisfies the conditional expressions: 0.1 ?m<?2??1<1 ?m, 3 ?m<?1<5 ?m, and 3 ?m<?2<5 ?m. (Where ?1 and ?2 respectively represent a wavelength near the shorter wavelengths and a wavelength near the longer wavelengths in a half width of the transmission wavelength region of the bandpass filter)

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.

A system comprises a sensor subsystem for imaging an object space, and a telescope for coupling electromagnetic energy from the object space to the sensor subsystem. The system comprises a bypass optical path that bypasses the telescope on the way to the sensor subsystem in order to provide a larger field of view of the object space. The bypass path and the telescope path merge at a merging point between the telescope and the sensor subsystem, and are disjoint upstream of the merging point. A simple bypass configuration is therefore provided, with possibly just a single fold mirror at the merging point. A sensor may form an intermediate image, and a frame is placed at the intermediate image to reject stray radiation and provide a real and accessible intermediate pupil for the sensor. Other features are also provided.

Baffle and shutter assembly (BSA) includes a baffle defined by a tubular member having a proximal end, a distal end, and a lumen extending therethrough. A baffle cover disposed at the distal end extends across a major aperture defined by the lumen and includes a cover aperture. A shutter system disposed within the lumen includes a shutter panel having a shutter aperture, and a shutter door. A door distal surface faces the baffle cover when the door is closed and has a reflective coating. The baffle cover has a cover proximal surface which faces toward the shutter system and is highly absorptive of electromagnetic energy in the optical spectrum.