Disclosed are an electrochromic photonic-crystal reflective display device and a method of manufacturing the same. The electrochromic photonic-crystal reflective display device includes a substrate having lower electrodes, a first solid polymer electrolyte thin film, a block copolymer photonic-crystal thin film, a second solid polymer electrolyte thin film, and upper electrodes. The first solid polymer electrolyte thin film is formed on the top of the substrate, and is made from a mixed solution including a polymer electrolyte and an ionic liquid. The block copolymer photonic-crystal thin film is formed on the top of the first solid polymer electrolyte thin film. The second solid polymer electrolyte thin film is formed on the top of the block copolymer photonic-crystal thin film, and is made from a mixed solution including a polymer electrolyte and an ionic liquid. The upper electrodes are formed on the top of the second solid polymer electrolyte thin film.

An electrochromic device includes a nanostructured transition metal oxide bronze layer that includes one or more transition metal oxide and one or more dopant. The electrochromic device also includes nanoparticles containing one or more transparent conducting oxide (TCO), a solid state electrolyte, a counter electrode, and at least one protective layer to prevent degradation of the one or more nanostructured transition metal oxide bronze. The nanostructured transition metal oxide bronze selectively modulates transmittance of near-infrared (NIR) and visible radiation as a function of an applied voltage to the device.

Various embodiments herein relate to electrochromic devices and electrochromic device precursors, as well as methods and apparatus for fabricating such electrochromic devices and electrochromic device precursors. In certain embodiments, the electrochromic device or precursor may include one or more particular materials such as a particular electrochromic material and/or a particular counter electrode material. In various implementations, the electrochromic material includes tungsten molybdenum oxide. In these or other implementation, the counter electrode material may include nickel tungsten oxide, nickel tungsten tantalum oxide, nickel tungsten niobium oxide, nickel tungsten tin oxide, or another material.

An electrochromic system and method for controlling photochromic darkening of an electrochromic device, the system including an EC device, a control unit, a voltage detector, and a power supply. The EC device includes a working electrode, a counter electrode, a solid-state polymer electrolyte disposed therebetween, and a Bragg reflector configured to selectively reflect UV radiation away from the working electrode. The control unit is configured to control a sweep voltage applied between the working and counter electrodes, such that the sweep voltage is applied when an open circuit voltage (OCV) between the working and counter electrodes is less than a threshold voltage.

An electrochromic system and method for controlling photochromic darkening of an electrochromic device, the system including an EC device, a control unit, a voltage detector, and a power supply. The EC device includes a working electrode, a counter electrode, and a solid-state polymer electrolyte disposed therebetween. The control unit is configured to control a sweep voltage applied between the working and counter electrodes, such that the sweep voltage is applied when an open circuit voltage (OCV) between the working and counter electrodes is less than a threshold voltage.

An electrochromic system and method for controlling photochromic darkening of an electrochromic device, the system including an EC device, a control unit, a voltage detector, and a power supply. The EC device includes a working electrode, a counter electrode, a solid-state polymer electrolyte disposed therebetween, and an ionically conductive and electrically insulating protective layer disposed between the electrolyte and the working electrode. The control unit is configured to control a sweep voltage applied between the working and counter electrodes, such that the sweep voltage is applied when an open circuit voltage (OCV) between the working and counter electrodes is less than a threshold voltage.

In the electrochromic device according to an embodiment of the present application, when the first voltage is applied to the electrochromic device in a state that the electrochromic element has the first state, the electrochromic device becomes the second state, and when the first voltage is applied to the electrochromic element in a state that the electrochromic element has the fourth state, the electrochromic element becomes the third state.

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In various embodiments, a counter electrode is fabricated to include a base anodically coloring material and one or more additives.

The present disclosure describes electrochromic devices comprising transparent conductive layer acting as an electrode, an active electrochromic film, an ion conductor, and an ion storage film at least one of which comprises at least one MXene material.

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.