Patent classifications
G02F1/33
SYSTEMS AND METHODS FOR CONTROLLING MOLECULES
The invention generally relates to systems and methods for controlling molecules. In certain aspects, the invention provides a system for controlling molecules, the system comprising: a first light source; a second light source; an acousto-optic modulator (AOM) coupled to the second light source; and control circuitry. In certain embodiments, the control circuitry may be configured to: receive a signal from the first light source that is interrogating a location in a sample that may contain a target molecule; compare the signal received from the first light source to a preset signal; and in the event that the signal received from the first light source meets or exceeds the preset signal, then the target molecule is present at the location in the sample and the control circuitry causes the AOM to activate the second light source to transmit light onto the location in the sample that contains the target molecule.
Flow cytometer with optical equalization
Aspects of the present disclosure include methods for producing an output laser beam having two or more angularly deflected laser beams (e.g., for irradiating a sample in a flow stream) with a predetermined intensity profile. Systems for practicing the subject methods having a laser, an acousto-optic device, a radiofrequency generator and a controller for adjusting the amplitude of the radiofrequency drive signals to produce an output laser beam of angularly deflected laser beams with a predetermined intensity profile are also described.
Flow cytometer with optical equalization
Aspects of the present disclosure include methods for producing an output laser beam having two or more angularly deflected laser beams (e.g., for irradiating a sample in a flow stream) with a predetermined intensity profile. Systems for practicing the subject methods having a laser, an acousto-optic device, a radiofrequency generator and a controller for adjusting the amplitude of the radiofrequency drive signals to produce an output laser beam of angularly deflected laser beams with a predetermined intensity profile are also described.
Operating a high-frequency driver circuit
A high-frequency (HF) driver circuit for an acousto-optical component includes an HF power amplifier connected to a voltage regulator for supply with a supply voltage and a bias voltage generator connected to an input of the HF power amplifier via a switch. The HF driver circuit can include a measurement device configured to measure a temperature of the HF power amplifier and a compensation device configured to control the bias voltage generator according to the temperature. The bias voltage generator is configured to provide a bias voltage to the HF power amplifier. By switching in the bias voltage, the HF power amplifier can be adjusted to a low quiescent current. By switching off the bias voltage, the HF power amplifier can be very rapidly and effectively blocked. As a result, very rapid switching-on and switching-off times, e.g., in a range of 10 to 50 ns, can be achieved.
Operating a high-frequency driver circuit
A high-frequency (HF) driver circuit for an acousto-optical component includes an HF power amplifier connected to a voltage regulator for supply with a supply voltage and a bias voltage generator connected to an input of the HF power amplifier via a switch. The HF driver circuit can include a measurement device configured to measure a temperature of the HF power amplifier and a compensation device configured to control the bias voltage generator according to the temperature. The bias voltage generator is configured to provide a bias voltage to the HF power amplifier. By switching in the bias voltage, the HF power amplifier can be adjusted to a low quiescent current. By switching off the bias voltage, the HF power amplifier can be very rapidly and effectively blocked. As a result, very rapid switching-on and switching-off times, e.g., in a range of 10 to 50 ns, can be achieved.
Metrology apparatus
A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
Metrology apparatus
A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
Near-to-eye and see-through holographic displays
A holographic display is comprised of space-multiplexed elemental modulators, each of which consists of a surface acoustic wave transducer atop an anisotropic waveguide. Each “line” of the overall display consists of a single anisotropic waveguide across the display's length with multiple surface acoustic wave transducers spaced along the waveguide length, although for larger displays, the waveguide may be divided into segments, each provided with separate illumination. Light that is undiffracted by a specific transducer is available for diffraction by subsequent transducers. Per transducer, guided-mode light is mode-converted to leaky-mode light, which propagates into the substrate away from the viewer before encountering a volume reflection grating and being reflected and steered towards the viewer. The display is transparent and all reflection volume gratings operate in the Bragg regime, thereby creating no dispersion of ambient light.
Elliptical beam design using cylindrical optics
The disclosure describes various aspects of techniques for elliptical beam design using cylindrical optics that may be used in different applications, including in quantum information processing (QIP) systems. In an aspect, the disclosure describes an optical system having a first optical component having a first focal length, a second optical component having a second focal length and aligned with a first direction, and a third optical component having a third focal length and aligned with a second direction orthogonal to the first direction. The optical system is configured to receive one or more optical beams (e.g., circular or elliptical) and apply different magnifications in the first direction and the second direction to the one or more optical beams to image one or more elliptical Gaussian optical beams. A method for generating elliptical optical beams using a system as the one described above is also disclosed.
Elliptical beam design using cylindrical optics
The disclosure describes various aspects of techniques for elliptical beam design using cylindrical optics that may be used in different applications, including in quantum information processing (QIP) systems. In an aspect, the disclosure describes an optical system having a first optical component having a first focal length, a second optical component having a second focal length and aligned with a first direction, and a third optical component having a third focal length and aligned with a second direction orthogonal to the first direction. The optical system is configured to receive one or more optical beams (e.g., circular or elliptical) and apply different magnifications in the first direction and the second direction to the one or more optical beams to image one or more elliptical Gaussian optical beams. A method for generating elliptical optical beams using a system as the one described above is also disclosed.