Patent classifications
G06F2111/20
Three-dimensional preview of laser-finished apparel
A system allows a user to create new designs for apparel and preview these designs before manufacture. Software and lasers are used in finishing apparel to produce a desired wear pattern or other design. The user's preview may be based upon a two-dimensional image of a wear pattern in a laser input file and, from a set of two-dimensional images of a base garment, create a three-dimensional view of the base garment with the wear pattern.
System design support apparatus and system design support method
A system design support apparatus generates new user data on the basis of derived user data including: base user data reference information that is information specifying user data to be referred to; and information on an item changed from the user data specified by the base user data reference information and on changed contents. A system design support method includes a step of selecting user data to be used, a step of generating derived user data including: base user data reference information for specifying the selected user data to be used; and information on an item changed from the user data specified by the base user data reference information and on changed contents, and a step of generating new user data on the basis of the derived user data.
Method and system for operating a configuration platform
A method of and a system for propagating a configuration setting of a 3D model to other 3D models, the 3D model and the other 3 Ds being part of a same 3D model category. The 5 method comprises dividing the 3D model into a first plurality of surfaces; associating to each one of the first plurality of surfaces, a unique surface identifier. For each one of the other 3D models, the method comprises dividing the one of the other 3D models into a second plurality of surfaces; establishing a correspondence; associating, for each one of the second plurality of surfaces corresponding to one of the first plurality of surfaces. The method also comprises 0 selecting the configuration setting of the 3D model; determining the unique identifier of the 3D model to which the configuration setting is to be applied; and propagating, the configuration setting to the other 3D models.
Integrated circuit fin layout method
A method of operating an IC manufacturing system includes determining whether an n-type active region of a cell or a p-type active region of the cell is a first active region based on a timing critical path of the cell, positioning the first active region along a cell height direction in an IC layout diagram of a cell, the first active region having a first total number of fins extending in a direction perpendicular to the cell height direction. The method also includes positioning a second active region in the cell along the cell height direction, the second active region being the n-type or p-type opposite the n-type or p-type of the first active region and having a second total number of fins less than the first total number of fins and extending in the direction, and storing the IC layout diagram of the cell in a cell library.
Leakage analysis on semiconductor device
A method includes: identifying attributes that are associated with cell edges of abutted cells in a layout of a semiconductor device, wherein the attributes include at least one of terminal types of the cell edges; determining at least one minimal boundary leakage of the abutted cells based on the attributes, for adjustment of the layout of the semiconductor device. A system is also disclosed herein.
BOUNDARY CELL HAVING A COMMON SEMICONDUCTOR TYPE FOR LIBRARY CELL
Boundary cells are used to abut two standard cell blocks. A standard cell block for an integrated circuit device includes a first standard cell, and a first boundary cell disposed adjacent to the first standard cell and along a boundary of the standard cell block. The first boundary cell includes a first region, a first dummy region, and a first layer extension region. The first region is abutted with the first standard cell and the first dummy region. The first dummy region is abutted with the first layer extension region. The first region and the first dummy region each include one or more non-functional layers. The first region, the first dummy region, and the first layer extension region are of a first semiconductor type.
ADDING DETAILS TO A MODEL IN COMPUTER AIDED MODELING
Mechanisms to increase level of detail in sets of model objects in a model for a construction product are disclosed, the mechanism utilizing a collection comprising a plurality of collection sets with details in metadata. For example, to increase level of detail in a set of model objects, content of a first metadata is determined. The first metadata comprises information indicating at least a type and geometry of the set of model objects. The collection sets are sorted to a suitability order based on compatibility of the first metadata to metadata of the collection sets. If the most suitable collection set is approved, the level of detail of the set of model objects is increased by adding to the first metadata copies of one or more details in the metadata of the most suitable collection set.
Computer-readable recording medium storing structural analysis simulation program, structural analysis simulation method, and information processing device
A non-transitory computer-readable recording medium stores therein a program for causing a computer to execute a process for reading design data from a memory which stores the design data that indicates an auxiliary geometric shape and an article, the auxiliary geometric shape being arranged in association with a setting portion for which a condition for performing simulation for structural analysis of the article is set, and being assigned identification information including the condition; identifying the auxiliary geometric shape and the condition from the design data based on the identification information; setting the condition for the setting portion; and performing the simulation based on the condition.
Standard cells and variations thereof within a standard cell library
Standard cell libraries include one or more standard cells and one or more corresponding standard cell variations. The one or more standard cell variations are different from their one or more standard cells in terms of geometric shapes, locations of the geometric shapes, and/or interconnections between the geometric shapes. The exemplary systems and methods described herein selectively choose from among the one or more standard cells and/or the one or more standard cell variations to form an electronic architectural design for an electronic device. In some situations, some of the one or more standard cells are unable to satisfy one or more electronic design constraints imposed by a semiconductor foundry and/or semiconductor technology node when placed onto the electronic device design real estate. In these situations, the one or more standard cell variations corresponding to these standard cells are placed onto the electronic device design real estate.
Method and system for circuiting in heat exchangers
A system for designing a circuitry configuration of heat-exchanger units includes an interface to acquire design parameters the heat-exchanger units, a memory to store computer-executable programs including a relaxed decision diagram formation module, and a processor, in connection with the memory, configured to perform the computer-executable programs. The computer-executable programs include steps of providing a configuration of the heat-exchanger units, providing the design parameters of the heat-exchanger units acquired via the interface, generating a relaxed decision diagram based on the design parameters, creating constraints with respect to connections of the heat-exchanger units according to the relaxed decision diagram, and generating feasible configurations of the heat-exchanger units by a mixed-integer-programing method using the constraints.