G11C7/005

NON-CONTACT ELECTRON BEAM PROBING TECHNIQUES AND RELATED STRUCTURES

Methods, systems, and devices for non-contact electron beam probing techniques, including at one or more intermediate stages of fabrication, are described. One subset of first access lines may be grounded and coupled with one or more memory cells. A second subset of first access lines may be floating and coupled with one or more memory cells. A second access line may correspond to each first access line and may be configured to be coupled with the corresponding first access line, by way of one or more corresponding memory cells, when scanned with an electron beam. A leakage path may be determined by comparing an optical pattern generated in part by determining a brightness of each scanned access line and comparing the generated optical pattern with a second optical pattern.

Optical memory gates

In example implementations, an optical gate is provided. The optical gate receives at least one optical signal via a waveguide of an optical memory gate. The optical gate compares a wavelength of the at least one optical signal to a resonant wavelength associated with a resonator. When the wavelength of the at least one optical signal matches the resonant wavelength, a value that is stored in the resonator is read out via the at least one optical signal. Then, the at least one optical signal with the value that is read out is transmitted out of the optical gate.

Non-contact electron beam probing techniques and related structures

Methods, systems, and devices for non-contact electron beam probing techniques, including at one or more intermediate stages of fabrication, are described. One subset of first access lines may be grounded and coupled with one or more memory cells. A second subset of first access lines may be floating and coupled with one or more memory cells. A second access line may correspond to each first access line and may be configured to be coupled with the corresponding first access line, by way of one or more corresponding memory cells, when scanned with an electron beam. A leakage path may be determined by comparing an optical pattern generated in part by determining a brightness of each scanned access line and comparing the generated optical pattern with a second optical pattern.

Laser-written submicron pixels with tunable circular polarization and write-read-erase-reuse capability on a nano material or two-dimensional heterostructure at room temperature

A method of laser-writing submicron pixels with tunable circular polarization and write-read-erase-reuse capability on Bi.sub.2Se.sub.3/WS.sub.2 at room temperature, comprising the steps of applying a laser to the Bi.sub.2Se.sub.3/WS.sub.2, writing a submicron pixel, wherein the submicron pixel has a circular polarization, modifying the circular polarization, allowing the circular polarization to be tuned across a range of 39.9%, tuning photoluminescence intensity, and tuning photoluminescence peak position. A method of growing Bi.sub.2Se.sub.3/WS.sub.2 as a nano-material or two-dimensional heterostructure for laser-writing submicron pixels with tunable circular polarization and write-read-erase-reuse capability on the Bi.sub.2Se.sub.3/WS.sub.2 heterostructure at room temperature.

Method for forming a non-volatile memory cell, non-volatile memory cell formed according to said method and microelectronic device comprising such memory cells

A method for forming a non-volatile memory cell intended to switch the memory cell from an unformed state to a formed state, the memory cell including an ordered stack of a lower electrode, a layer of insulating material and an upper electrode. The forming method includes a breakdown operation in which at least one laser shot is emitted towards the layer of insulating material to make the layer of insulating material active by making it pass from a high resistance state to a low resistance state, the memory cell being formed when the layer of insulating material is active.

NON-CONTACT ELECTRON BEAM PROBING TECHNIQUES AND RELATED STRUCTURES

Methods, systems, and devices for non-contact electron beam probing techniques, including at one or more intermediate stages of fabrication, are described. One subset of first access lines may be grounded and coupled with one or more memory cells. A second subset of first access lines may be floating and coupled with one or more memory cells. A second access line may correspond to each first access line and may be configured to be coupled with the corresponding first access line, by way of one or more corresponding memory cells, when scanned with an electron beam. A leakage path may be determined by comparing an optical pattern generated in part by determining a brightness of each scanned access line and comparing the generated optical pattern with a second optical pattern.

All-optical single-atom photon router controlled by a single photon

A switch activated by a single control photon for routing a single target photon from either of two switch inputs to either of two switch outputs. The device is based on a single quantum emitter, such as an atom, coupled to a fiber-coupled, chip-based optical micro-resonator. A single reflected control photon toggles the switch from high reflection to high transmission mode, with no additional control fields required. The control and target photons are both in-fiber and practically identical, for compatibility with scalable architectures for quantum information processing.

Optical memory gates

In example implementations, an optical gate is provided. The optical gate receives at least one optical signal via a waveguide of an optical memory gate. The optical gate compares a wavelength of the at least one optical signal to a resonant wavelength associated with a resonator. When the wavelength of the at least one optical signal matches the resonant wavelength, a value that is stored in the resonator is read out via the at least one optical signal. Then, the at least one optical signal with the value that is read out is transmitted out of the optical gate.

METHOD FOR FORMING NON-VOLATILE MEMORY CELL, NON-VOLATILE MEMORY CELL FORMED ACCORDING TO SAID METHOD AND MICROELECTRONIC DEVICE COMPRISING SUCH MEMORY CELLS

A method for forming a non-volatile memory cell intended to switch the memory cell from an unformed state to a formed state, the memory cell including an ordered stack of a lower electrode, a layer of insulating material and an upper electrode. The forming method includes a breakdown operation in which at least one laser shot is emitted towards the layer of insulating material to make the layer of insulating material active by making it pass from a high resistance state to a low resistance state, the memory cell being formed when the layer of insulating material is active.

Electric field storage device

The system includes a data storage medium comprising cells, an excitation circuit, and an emitter. The cells arranged in a three dimensional space. The excitation circuit excites each cell independently. Exciting a cell changes an optical property of the cell. The emitter emits a first beam onto a first cell during a first excitation period to orient electrical charges within the first cell to a first oriented value and intensity of electric field to a first intensity value. The emitter emits a second beam onto a second cell during a second excitation period to orient electrical charges within the second cell to a second oriented value and intensity of electric field to a second intensity value. The first and second cells maintain the first and the second oriented values and the first and second intensity values after the first and second excitation periods are over, respectively.