Patent classifications
H01J2201/30484
Emitter, electron gun using emitter, electronic apparatus using electron gun, and method of producing emitter
The emitter of the present invention includes a nanowire. The nanowire is formed from a hafnium carbide (HfC) single crystal, and at least an end portion of the hafnium carbide single crystal, from which electrons are to be emitted, is covered with hafnium oxide (HfO.sub.2). In the emitter, the thickness of the hafnium oxide may be 1 nm to 20 nm.
Emitter, Electron Gun Using Emitter, Electronic Apparatus Using Electron Gun, and Method of Producing Emitter
The emitter of the present invention includes a nanowire. The nanowire is formed from a hafnium carbide (HfC) single crystal, and at least an end portion of the hafnium carbide single crystal, from which electrons are to be emitted, is covered with hafnium oxide (HfO.sub.2). In the emitter, the thickness of the hafnium oxide may be 1 nm to 20 nm.
Cold field electron emitters based on silicon carbide structures
A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm.sup.2 at 7.5 V/m is demonstrated in a macroscopic emitter array. The emitter has a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.