H01J2237/0653

REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND SEMICONDUCTOR WAFER ION IMPLANTATION APPARATUS
20240290570 · 2024-08-29 · ·

A repeller may be mounted inside an arc chamber of an ion implantation apparatus for doping impurities into a surface film of a semiconductor wafer. The repeller may include a body including an outer circumferential surface and a surface area enlargement portion on the body. The surface area enlargement portion may include striped grooves continuously formed on the outer circumferential surface of the body at intervals in a longitudinal direction of the body.

PARTICLE SOURCE FOR PRODUCING A PARTICLE BEAM AND PARTICLE-OPTICAL APPARATUS
20180330912 · 2018-11-15 ·

A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

Device for the Extraction of Electrical Charge Carriers from a Charge Carrier Generation Space and Method for Operating Such a Device
20180294135 · 2018-10-11 ·

The invention relates to a device for extracting electrical charge carriers from a charge carrier generation chamber with at least one electrode arrangement for extracting charge carriers, wherein the at least one electrode arrangement has at least a first grid electrode and a second grid electrode with corresponding openings. The first and the second grid electrode each contain at least one first electrically conductive grid electrode region, wherein the at least one first grid electrode region of the first grid electrode is configured in a first layer and the at least one first grid electrode region of the second grid electrode is configured in a second layer. The first layer and the second layer are arranged one after the other within the electrode arrangement in the particle emission direction and are spaced from one another by a first distance along the particle emission direction, wherein the at least one first grid electrode region of the first grid electrode forms a first electrically conductive layer portion in the first layer. In addition, a second electrically conductive layer portion, which is electrically insulated from the first layer portion, is configured in the first layer. The second layer portion is formed by at least one second electrically conductive grid electrode region of the first grid electrode or of the second grid electrode, and the second layer portion is electrically conductively connected to the at least one first grid electrode region of the second grid electrode. The device according to the invention for extracting charge carriers thus represents an electrically switchable extraction grid electrode arrangement by the aid of which the beam characteristics of a particle beam of extracted charge carriers can be changed.

Charged particle source
10032600 · 2018-07-24 · ·

This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Electron Microscope and Method of Operating Same
20180130635 · 2018-05-10 ·

There is provided an electron microscope capable of producing good images by reducing contrast nonuniformity. The electron microscope (1) includes: an electron beam source (11) for producing an electron beam; a noise cancelling aperture (12) and an amplifier (42) for detecting a part of the electron beam; an effective value computing circuit (44) and a low frequency cut-off circuit (46) for extracting a DC component of an effective value of a detection signal emanating from the amplifier (42); an image detector (15) for detecting a signal produced in response to impingement of the beam on a sample (A); a preamplifier circuit (20) and an amplifier circuit (30); a divider circuit (54) for performing a division of the output signal (X) from the amplifier circuit (30) by the output signal (Y) from the amplifier circuit (42) and producing a quotient signal indicative of the result of the decision (X/Y); and a multiplier circuit (58) for multiplying the quotient signal by a signal (Z) extracted by the low frequency cut-off circuit (46).

Charged particle source
09812283 · 2017-11-07 · ·

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Charged particle source
09799484 · 2017-10-24 · ·

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Charged particle source
09754760 · 2017-09-05 · ·

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Charged particle beam writing apparatus and charged particle beam writing method
09673018 · 2017-06-06 · ·

A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

ELECTRON GUN, CONTROL METHOD AND CONTROL PROGRAM THEREOF, AND THREE-DIMENSIONAL SHAPING APPARATUS

When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.