The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.

A retainer is placed on a retainer holding portion formed on a sample chip worktable. With an operation of a button, a take-out support mechanism operates. That is, an upthrust pin moves upward. With this process, an orientation of a sample chip stored in the retainer is changed from a horizontal orientation to an inclined orientation. A plurality of openings through which the upthrust pin passes are formed in the retainer.

Disclosed are systems and methods for processing gift transactions. An example method includes receiving an identification of a first merchant from a giver at a first time, wherein a gift from the giver to a recipient is redeemable at the first merchant. The method can include generating a policy comprising the first merchant. The policy can be at least in part giver-defined and linked to the recipient payment account. The method can then include transmitting an electronic notice to a recipient device, receiving a selection from the recipient of a second merchant at which to redeem the gift from the giver, updating the policy to apply to the second merchant selected by the recipient to yield an updated policy and, upon receiving an indication of a triggering event caused by use of the recipient payment account as defined by the updated policy, applying an amount of money to the gift.

A chamber for use in implementing a deposition process includes a pedestal for supporting a semiconductor wafer. A silicon ring is disposed over the pedestal and surrounds the semiconductor wafer. The silicon ring has a ring thickness that approximates a semiconductor wafer thickness. The silicon ring has an annular width that extends a process zone defined over the semiconductor wafer to an extended process zone that is defined over the semiconductor wafer and the silicon ring. A confinement ring defined from a dielectric material is disposed over the pedestal and surrounds the silicon ring. A showerhead having a central showerhead area and an extended showerhead area is also included. The central showerhead area is substantially disposed over the semiconductor wafer and the silicon ring. The extended showerhead area is substantially disposed over the confinement ring. The annular width of the silicon ring enlarges a surface area of the semiconductor wafer that is exposed and shifts non-uniformity effects of deposition materials over the semiconductor wafer from an edge of the semiconductor wafer to an outer edge of the silicon ring.

Disclosed are systems and methods for processing gift transactions. An example method includes receiving an identification of a first merchant from a giver at a first time, wherein a gift from the giver to a recipient is redeemable at the first merchant. The method can include generating a policy comprising the first merchant. The policy can be at least in part giver-defined and linked to the recipient payment account. The method can then include transmitting an electronic notice to a recipient device, receiving a selection from the recipient of a second merchant at which to redeem the gift from the giver, updating the policy to apply to the second merchant selected by the recipient to yield an updated policy and, upon receiving an indication of a triggering event caused by use of the recipient payment account as defined by the updated policy, applying an amount of money to the gift.

An electronic microscope has a great depth of focus compared with an optical microscope. Thus, information is superimposed in the depth direction in one image. Thus, observation of a three-dimensional structure inside a specimen with use of the electronic microscope requires accurate specification of a three-dimensional position or density of a structure inside the specimen. Furthermore, the specimen on a slide glass that is observed with the optical microscope may not be put in a TEM device in the related art. Thus, a very complicated preparation of the specimen is required for performing three-dimensional internal structure observation, with the electronic microscope, of a location that is observed with the optical microscope.

Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.

A system for zapping a wafer, the system may include a pulse generation unit that is configured to generate (a) first zapping pulses for causing a breakdown in a first location of a backside insulating layer of a wafer, and (b) second zapping pulses for causing a breakdown in a second location of the backside insulating layer of the wafer; a first conductive interface that is configured to convey the first zapping pulses to the first location, while contacting the first location; a second conductive interface that is configured to convey the second zapping pulses to the second location, while contacting the second location; and wherein the first location differs from the second location.

Disclosed is a pin lifting device which includes a housing extending along an adjustment axis, a housing end at a first end region of the housing and has a housing opening, a drive part arranged at a second end region of the housing, an adjusting device having a part which can move in the housing in the direction of the adjustment axis, a guide section for the adjusting device formed on the inside of the housing between a first stop at the frontal housing end and a second stop remote therefrom, a tight connecting device formed inside the housing between the frontal housing end and the adjusting device, and a connecting channel extending from the first stop to the second stop at the guide section. A contiguous second inner region leads to minimal changes in the volume of the second inner region even during movements of the movable part.

The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.

A multipurpose and transferrable sample platform for supporting, analyzing and/or processing a target material. The platform includes a substrate; a dielectric layer formed over a face of the substrate; electrodes formed over the dielectric layer; a slot formed through the substrate and the dielectric layer; and an exfoliated graphene-based membrane placed over the slot and in electrical contact with the electrodes. The exfoliated graphene-based membrane is configured to support, or act upon, a study material or chemical precursors.