H01J37/266

ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD USING THE SAME
20210233741 · 2021-07-29 ·

An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

System and method of preparing integrated circuits for backside probing using charged particle beams

Described herein are a system and method of preparing integrated circuits (ICs) so that the ICs remain electrically active and can have their active circuitry probed for diagnostic and characterization purposes using charged particle beams. The system employs an infrared camera capable of looking through the silicon substrate of the ICs to image electrical circuits therein, a focused ion beam system that can both image the IC and selectively remove substrate material from the IC, a scanning electron microscope that can both image structures on the IC and measure voltage contrast signals from active circuits on the IC, and a means of extracting heat generated by the active IC. The method uses the system to identify the region of the IC to be probed, and to selectively remove all substrate material over the region to be probed using ion bombardment, and further identifies endpoint detection means of milling to the required depth so as to observe electrical states and waveforms on the active IC.

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL

Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION

Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

Plasma Impedance Tomography for Plasma Parameter Imaging

A method for non-invasively imaging plasma parameters has been invented. Crossed dipole pairs are used to differentiate changes in the measured complex self- and mutual impedances due to plasma density and magnetic field. Measurements of the complex self-impedance and mutual impedance between pairs of antennas over a wide range of frequencies provide spatial information to create an image of the plasma density and magnetic field. The spectral information is acquired simultaneously using a Gaussian monopulse as the driver signal.

Corrector transfer optics for Lorentz EM
10825644 · 2020-11-03 · ·

Charged particle microscopes having an optimized performance across multiple modes of operation are disclosed herein. More specifically, the disclosure includes improved charged particle microscopes that increase and/or optimize the performance of the microscope in both a standard mode of operation and a Lorentz mode of operation. The charged particle microscopes include an extra transfer lens between a corrector and the traditional transfer lens which allows for the flexibility to optimize performance in both the standard mode of operation and the Lorentz mode of operation. For example, in a Lorentz mode of operation, improved charged particle microscope according to the present disclosure can be used to tune the C.sub.5 aberration, while hardly affecting defocus and/or C.sub.S aberrations. Additionally, the inclusion of the extra transfer lens provides the charged particle microscopes disclosed herein with an extra degree of freedom with which to zero defocus and total C.sub.S and C.sub.5.

Systems and methods for charged particle flooding to enhance voltage contrast defect signal

Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

MAGNETIC MATERIAL OBSERVATION METHOD, AND MAGNETIC MATERIAL OBSERVATION APPARATUS
20200249288 · 2020-08-06 ·

A magnetic material observation method in accordance with the present invention includes: an irradiating step including irradiating a region of a sample with an excitation beam and thereby allowing a magnetic element contained in the sample to radiate a characteristic X-ray; a detecting step including detecting intensities of a right-handed circularly polarized component and a left-handed circularly polarized component contained in the characteristic X-ray; and a calculating step including calculating the difference between the intensity of the right-handed circularly polarized component and the intensity of the left-handed circularly polarized component. Reference to such a difference enables precise measurement of the direction or magnitude of magnetization without strict limitations as to the sample.

Apparatuses including test segment circuits having latch circuits for testing a semiconductor die

Apparatuses including test segment circuits and methods for testing the same are disclosed. An example apparatus includes a plurality of segment lines configured to form a ring around a die and a plurality of test segment circuits, each test segment circuit coupled to at least two segment lines of the plurality of segment lines. Each test segment circuit is coupled to a portion of a first signal line, a portion of a second signal line, and a portion of a third signal line and each test segment circuit is configured to control an operation performed on at least one segment line of the plurality of segment lines.

METHOD FOR CREATING ELECTRON-BEAM HOLOGRAM, MAGNETIC FIELD INFORMATION MEASUREMENT METHOD AND MAGNETIC FIELD INFORMATION MEASURING DEVICE
20200124687 · 2020-04-23 · ·

An object wave made of an electron beam influenced by a sample and reference beam made of an electron beam not influenced by the sample are made to interfere with each other where a magnetic field has been applied to the sample to create a first electron-beam hologram and create a first reconstructed phase image from the first electron-beam hologram. An object wave made of an electron beam influenced by the sample and a reference beam made of an electron beam not influenced by the sample are made to interfere where a magnetic field has not been applied to the sample to create a second electron-beam hologram and create a second reconstructed phase image from the second electron-beam hologram. Magnetic field information indicating the influence of the magnetic field on the sample is acquired on the basis of the difference between the first and second reconstructed phase images.