A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

A device for emitting ultraviolet light includes at least one excimer lamp and a housing for the excimer lamp(s). Each excimer lamp has a discharge vessel filled with light-emitting gases, and a pair of first and second electrodes that are placed in contact with the discharge vessel and produce a dielectric barrier discharge inside the discharge vessel. The housing is made of an insulating and heat-resistant resin material. The housing is configured to house the excimer lamp(s), and has a light-emitting window that allows light with a center wavelength in a range from 200 nm to 230 nm emitted from the excimer lamp(s) to exit from the housing.

A device for emitting ultraviolet light includes at least one excimer lamp and a housing for the excimer lamp(s). Each excimer lamp has a discharge vessel filled with light-emitting gases, and a pair of first and second electrodes that are placed in contact with the discharge vessel and produce a dielectric barrier discharge inside the discharge vessel. The housing is made of an insulating and heat-resistant resin material. The housing is configured to house the excimer lamp(s), and has a light-emitting window that allows light with a center wavelength in a range from 200 nm to 230 nm emitted from the excimer lamp(s) to exit from the housing.

The present application discloses an ultraviolet lamp tube and a novel gas discharge UV lamp, which, through unique coating methods, can ensure monochromaticity of light output of the light source, while increasing the luminous angle of the ultraviolet lamp tube, thus effectively improving the light efficiency, simplifying structure, and greatly reducing production costs.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

The apparatuses disclosed herein include a discharge lamp configured to emit ultraviolet and visible light, an optical filter configured to attenuate visible light, and a power circuit configured to operate the discharge lamp. Some embodiments of the apparatuses are configured such that ultraviolet light emitted from the discharge lamp and passed through the optical filter encircles an exterior surface of the apparatus. Some cases of the apparatuses include a sensor system configured to monitor a first parameter associated with the operation of the discharge lamp and a second parameter associated with the transmittance of the optical filter. Some of the apparatuses include a means for moving the optical filter while the apparatus is in operation. In some cases, the apparatuses may be configured such that the optical filter may be arranged in and out of alignment with the discharge lamp. In some embodiments, the optical filter may be a multifaceted.

The apparatuses disclosed herein include a discharge lamp configured to emit ultraviolet and visible light, an optical filter configured to attenuate visible light, and a power circuit configured to operate the discharge lamp. Some embodiments of the apparatuses are configured such that ultraviolet light emitted from the discharge lamp and passed through the optical filter encircles an exterior surface of the apparatus. Some cases of the apparatuses include a sensor system configured to monitor a first parameter associated with the operation of the discharge lamp and a second parameter associated with the transmittance of the optical filter. Some of the apparatuses include a means for moving the optical filter while the apparatus is in operation. In some cases, the apparatuses may be configured such that the optical filter may be arranged in and out of alignment with the discharge lamp. In some embodiments, the optical filter may be a multifaceted.

A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.