H01L2224/10

Solid-state image-capturing device, semiconductor apparatus, electronic apparatus, and manufacturing method

Provided are a solid-state image-capturing device, a semiconductor apparatus, an electronic apparatus, and a manufacturing method that enable improvement in reliability of through electrodes and increase in density of through electrodes. A common opening portion is formed including a through electrode formation region that is a region in which the plurality of through electrodes electrically connected respectively to a plurality of electrode pads provided on a joint surface side from a device formation surface of a semiconductor substrate is formed. A plurality of through portions is formed so as to penetrate to the plurality of respective electrode pads in the common opening portion, and wiring is formed along the common opening portion and the through portions from the electrode pads to the device formation surface corresponding to the respective through electrodes. The present technology can be applied to a layer-type solid-state image-capturing device, for example.

PIEZOELECTRIC DEVICE AND METHOD FOR MANUFACTURING THE SAME

A lead-out wiring, which is connected to a comb-shaped electrode formed on a principal surface of a piezoelectric substrate and is disposed to extend to an outer edge of the piezoelectric substrate an outer surrounding wall layer, which is arranged surrounding an outer periphery of the piezoelectric substrate including the lead-out wiring and forms a hollow portion that serves as an operation space for the comb-shaped electrode, and a top board, which bridges the outer surrounding wall layer to seal the hollow portion, are included.

Method of fabricating three dimensional integrated circuit

A method of fabricating a three dimensional integrated circuit comprises forming a redistribution layer on a first side of a packaging component, forming a holding chamber in the redistribution layer, attaching an integrated circuit die on the first side of the packaging component, wherein an interconnect bump of the integrated circuit die is inserted into the holding chamber, applying a reflow process to the integrated circuit die and the packaging component and forming an encapsulation layer on the packaging component.

Graphite-laminated chip-on-film-type semiconductor package having improved heat dissipation and electromagnetic wave shielding functions
11355687 · 2022-06-07 · ·

The present invention relates to a chip-on film type semiconductor package including an integrated circuit chip, a printed circuit board layer, and a graphite layer, in which the integrated circuit chip is connected to one surface of the printed circuit board layer directly or by means of a mounting element and the graphite layer is laminated on an opposite surface of the printed circuit board layer and a display device including the same.

Wafer Level Chip Scale Packaging Intermediate Structure Apparatus and Method
20230245923 · 2023-08-03 ·

Presented herein is a WLCSP intermediate structure and method forming the same, the method comprising forming a first redistribution layer (RDL) on a carrier, the first RDL having mounting pads disposed on the first RDL, and mounting interposer dies on a second side of the first RDL. A second RDL is formed over a second side of the interposer dies, the second RDL having a first side adjacent to the interposer dies, one or more lands disposed on the second RDL, at least one of the one or more lands in electrical contact with at least one of the interposer dies or at least one of the mounting pads. A molding compound is formed around the interposer dies and over a portion of the first RDL prior to the forming the second RDL and the second RDL is formed over at least a portion of the molding compound.

SOLID-STATE IMAGE-CAPTURING DEVICE, SEMICONDUCTOR APPARATUS, ELECTRONIC APPARATUS, AND MANUFACTURING METHOD
20230154962 · 2023-05-18 ·

The present disclosure relates to a solid-state image-capturing device, a semiconductor apparatus, an electronic apparatus, and a manufacturing method that enable improvement in reliability of through electrodes and increase in density of through electrodes. A common opening portion is formed including a through electrode formation region that is a region in which the plurality of through electrodes electrically connected respectively to a plurality of electrode pads provided on a joint surface side from a device formation surface of a semiconductor substrate is formed. Then, a plurality of through portions is formed so as to penetrate to the plurality of respective electrode pads in the common opening portion, and wiring is formed along the common opening portion and the through portions from the electrode pads to the device formation surface corresponding to the respective through electrodes. The present technology can be applied to a layer-type solid-state image-capturing device, for example.

Graphite-laminated chip-on-film-type semiconductor package allowing improved visibility and workability
11437556 · 2022-09-06 · ·

The present invention relates to a chip-on film type semiconductor package including an integrated circuit chip, a printed circuit board layer, an outer lead bonder pad, and a graphite layer, in which the integrated circuit chip is connected to one surface of the printed circuit board layer directly or by means of a mounting element, the outer lead bonder pad is located on one surface of the printed circuit board layer, and the graphite layer is laminated on an opposite surface of the printed circuit board layer and a display device including the same.

GRAPHITE-LAMINATED CHIP-ON-FILM-TYPE SEMICONDUCTOR PACKAGE HAVING IMPROVED HEAT DISSIPATION AND ELECTROMAGNETIC WAVE SHIELDING FUNCTIONS
20210074625 · 2021-03-11 ·

The present invention relates to a chip-on film type semiconductor package including an integrated circuit chip, a printed circuit board layer, and a graphite layer, in which the integrated circuit chip is connected to one surface of the printed circuit board layer directly or by means of a mounting element and the graphite layer is laminated on an opposite surface of the printed circuit board layer and a display device including the same.

SOLID-STATE IMAGE-CAPTURING DEVICE, SEMICONDUCTOR APPARATUS, ELECTRONIC APPARATUS, AND MANUFACTURING METHOD
20200395400 · 2020-12-17 ·

The present disclosure relates to a solid-state image-capturing device, a semiconductor apparatus, an electronic apparatus, and a manufacturing method that enable improvement in reliability of through electrodes and increase in density of through electrodes.

A common opening portion is formed including a through electrode formation region that is a region in which the plurality of through electrodes electrically connected respectively to a plurality of electrode pads provided on a joint surface side from a device formation surface of a semiconductor substrate is formed. Then, a plurality of through portions is formed so as to penetrate to the plurality of respective electrode pads in the common opening portion, and wiring is formed along the common opening portion and the through portions from the electrode pads to the device formation surface corresponding to the respective through electrodes. The present technology can be applied to a layer-type solid-state image-capturing device, for example.

GRAPHITE-LAMINATED CHIP-ON-FILM-TYPE SEMICONDUCTOR PACKAGE ALLOWING IMPROVED VISIBILITY AND WORKABILITY
20200355958 · 2020-11-12 ·

The present invention relates to a chip-on film type semiconductor package including an integrated circuit chip, a printed circuit board layer, an outer lead bonder pad, and a graphite layer, in which the integrated circuit chip is connected to one surface of the printed circuit board layer directly or by means of a mounting element, the outer lead bonder pad is located on one surface of the printed circuit board layer, and the graphite layer is laminated on an opposite surface of the printed circuit board layer and a display device including the same.