Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more microelectronic devices are stacked on the substrate, each microelectronic device comprising an active surface having bond pads operably coupled to conductive traces extending over a dielectric material to via locations beyond at least one side of the stack, and vias extending through the dielectric materials at the via locations and comprising conductive material in contact with at least some of the conductive traces of each of the two or more electronic devices and extending to exposed conductors of the substrate. Methods of fabrication and related electronic systems are also disclosed.

Capacitive couplings in a direct-bonded interface for microelectronic devices are provided. In an implementation, a microelectronic device includes a first die and a second die direct-bonded together at a bonding interface, a conductive interconnect between the first die and the second die formed at the bonding interface by a metal-to-metal direct bond, and a capacitive interconnect between the first die and the second die formed at the bonding interface. A direct bonding process creates a direct bond between dielectric surfaces of two dies, a direct bond between respective conductive interconnects of the two dies, and a capacitive coupling between the two dies at the bonding interface. In an implementation, a capacitive coupling of each signal line at the bonding interface comprises a dielectric material forming a capacitor at the bonding interface for each signal line. The capacitive couplings result from the same direct bonding process that creates the conductive interconnects direct-bonded together at the same bonding interface.

Capacitive couplings in a direct-bonded interface for microelectronic devices are provided. In an implementation, a microelectronic device includes a first die and a second die direct-bonded together at a bonding interface, a conductive interconnect between the first die and the second die formed at the bonding interface by a metal-to-metal direct bond, and a capacitive interconnect between the first die and the second die formed at the bonding interface. A direct bonding process creates a direct bond between dielectric surfaces of two dies, a direct bond between respective conductive interconnects of the two dies, and a capacitive coupling between the two dies at the bonding interface. In an implementation, a capacitive coupling of each signal line at the bonding interface comprises a dielectric material forming a capacitor at the bonding interface for each signal line. The capacitive couplings result from the same direct bonding process that creates the conductive interconnects direct-bonded together at the same bonding interface.

An integrated circuit (IC) package includes a first die with a first surface overlaying a substrate. The first die includes a first metal pad at a second surface opposing the first surface. The IC package also includes a dielectric layer having a first surface contacting the second surface of the first die. The IC package further includes a second die with a surface that contacts a second surface of the dielectric layer. The second die includes a second metal pad aligned with the first metal pad of the first die. A plane perpendicular to the second surface of the first die intersects the first metal pad and the second metal pad.

A semiconductor device includes a substrate comprising a first interconnection configured to provide a first reference voltage, a second interconnection configured to provide a second reference voltage different from the first reference voltage, and at least one interconnection layer. The first interconnection comprises a plurality of first interconnection components that are provided in the interconnection layer. The second interconnection comprises a plurality of second interconnection components that are provided in the interconnection layer. The plurality of first interconnection components and the plurality of second interconnection components are alternately arranged in a first direction parallel to the interconnection layer.

A semiconductor device has laminated therein three or more chips. The plurality of chips are provided with substrates, transmission coils, and reception coils that are disposed in regions where the transmission coils and the reception coils do not overlap with each other in an in-plane direction of the substrates. The transmission coils are disposed in regions that are in a lamination direction and that are adjacent to and overlap with reception coils of other chips. The reception coils are configured to allow data transmission with respect to the transmission coils that are disposed on the same substrates.

An electronic chip, chip assembly, device, system, and method enabling tracked data communications. The electronic chip comprises a plurality of processing cores and at least one hardware interface coupled to at least one of the one or more processing cores. At least one processing core implements a game and/or simulation engine, at least one processing core implements a position engine, and at least one processing core implements a gyroscope and, optionally, an IMU. The at least one position engine obtains pose data from an external positioning system comprising GNSS augmented by millimeter-wave cellular networks and/or Wi-Fi; and internal pose data from the gyroscope, optional IMU, and game and/or simulation engine, the data comprising inertial, 3D structure, and simulation data, thereby computing a 6 DOF pose of the client device, driving processing of 3D applications by the one or more game and/or simulation engine.

A semiconductor device includes an element region including a semiconductor substrate and a plurality of elements formed on the semiconductor substrate and a wiring region disposed on the element region and including an interlayer insulating layer, a plurality of wiring patterns in the interlayer insulating layer, and a via structure extending in a first direction, perpendicular to an upper surface of the semiconductor substrate in the interlayer insulating layer, wherein the plurality of elements include a first input/output circuit transmitting and receiving a first signal and a second I/O circuit transmitting and receiving a second signal, different from the first signal, the plurality of wiring patterns is a coil pattern includes an inductor circuit, the coil pattern is connected to the first I/O circuit, and the via structure passes through a center of the coil pattern and is connected to the second I/O circuit.

A cryogenic electronic package includes at least two superconducting and/or conventional metal semiconductor structures. Each of the semiconductor structures includes a substrate and a superconducting trace. Additionally, each of the semiconductor structures includes a passivation layer and one or more under bump metal (UBM) structures. The cryogenic electronic package also includes one or more superconducting and/or conventional metal interconnect structures disposed between selected ones of the at least two superconducting semiconductor structures. The interconnect structures are electrically coupled to respective ones of the UBM structures of the semiconductor structures to form one or more electrical connections between the semiconductor structures. A method of fabricating a cryogenic electronic package is also provided.

An artificial intelligence (AI) chip includes: a plurality of memory dies each for storing data; a plurality of computing dies each of which performs a computation included in an AI process; and a system chip that controls the plurality of memory dies and the plurality of computing dies. Each of the plurality of memory dies has a first layout pattern. Each of the plurality of computing dies has a second layout pattern. A second memory die which is one of the plurality of memory dies is stacked above the first layout pattern of a first memory die which is one of the plurality of memory dies. A second computing die which is one of the plurality of computing dies is stacked above the second layout pattern of a first computing die which is one of the plurality of computing dies.