Patent classifications
H05H1/2441
Plasma source and surface treatment method
A plasma source has an outer surface, interrupted by an aperture for delivering an atmospheric plasma from the outer surface. A transport mechanism transports a substrate in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface the and the substrate. A first electrode of the plasma source has a first and second surface extending from an edge of the first electrode that runs along the aperture. The first surface defines the outer surface on a first side of the aperture. The distance between the first and second surface increasing with distance from the edge. A second electrode covered at least partly by a dielectric layer is provided with the dielectric layer facing the second surface of the first electrode, substantially in parallel with the second surface of the first electrode, leaving a plasma initiation space on said first side of the aperture, between the surface of the dielectric layer and the second surface of the first electrode. A gas inlet feeds into the plasma initiation space to provide gas flow from the gas inlet to the aperture through the plasma initiation space. Atmospheric plasma initiated in the plasma initiation space flows to the aperture, from which it leaves to react with the surface of the substrate.
ACTIVE GAS GENERATION APPARATUS
In the present disclosure, in a high-voltage side electrode component, the electrode main dielectric film is provided on the lower surface of the electrode conductive film, and the electrode additional dielectric film is disposed below the electrode main dielectric film at an upper main/additional inter-dielectric distance. The electrode main dielectric film includes the whole electrode conductive film in a plan view, and has a formation area larger than the electrode conductive film. The electrode additional dielectric film includes the electrode conductive film in a plan view and has a formation area slightly larger than the electrode conductive film and smaller than the electrode main dielectric film. The ground side electrode component has the same features as the above-mentioned features of the high-voltage side electrode component.
LOW-TEMPERATURE DIELECTRIC BARRIER DISCHARGE DEVICES
Disclosed are dielectric barrier discharge (DBD) devices and methods of use for sterilizing surfaces. The DBD devices generally include one or more first electrodes, one or more second electrodes or chemical reagent layers, and at least one dielectric layer between the one or more first electrodes and the one or more second electrodes or chemical reagent layers. In various configurations, the at least one dielectric layer is either (a) in contact with at least one of the first electrodes or (if present) at least one chemical reagent layer, or (b) is separated from the one or more first electrodes by a first gap and is also separated from the one or more second electrodes or chemical reagent layers by a second gap.
Jet engine with plasma-assisted combustion
An example system and corresponding method can include a combustion chamber of jet engine, a radio-frequency power source, and a resonator. The combustion chamber can include a liner defining a combustion zone, and include a fuel inlet configured to introduce fuel into the combustion zone. The resonator can have a resonant wavelength and include: a first conductor, a second conductor, a dielectric, and an electrode coupled to the first conductor. The resonator can be configured such that, when the resonator is excited by the radio-frequency power source with a signal having a wavelength proximate to an odd-integer multiple of one-quarter (¼) of the resonant wavelength, the resonator provides a plasma corona in the combustion zone. The controller can be configured to cause the radio-frequency power source to excite the resonator with the signal so as to provide the plasma corona.
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMPERATURE PLASMA
A plasma generator generates atmospheric pressure, low temperature plasma (cold plasma), and includes a first electrode; a second electrode opposing the first electrode such that a bottom surface of the first electrode faces a top surface of the second electrode, the second electrode arranged so as to define a predetermined gap between the planar bottom surface of the first electrode and the planar top surface of the second electrode; a dielectric layer that is disposed on at least a part of the bottom surface of the first electrode having a relative permittivity between 2 and 500, and a thickness of 3 mm or less; and a power supply configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on the predetermined gap between the first electrode and the second electrode, atmospheric pressure, low temperature plasma is generated.
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMPERATURE PLASMA
A plasma generator generates atmospheric pressure, low temperature plasma (cold plasma), and includes a first electrode, a second electrode arranged so as to define a predetermined gap between a planar bottom surface of the first electrode and a planar top surface of the second electrode; at least one supplemental electrode, a first dielectric layer, a second dielectric layer, at least one supplemental top dielectric layer having a relative permittivity between 2 and 500, and a thickness of 3 mm or less, at least one supplemental bottom dielectric layer having a relative permittivity between 2 and 500, and a thickness of 3 mm or less, and a power supply configured to supply electrical power to the first, second, and supplemental electrodes at a predetermined voltage and frequency, such that, based on the predetermined gaps between the first, second, and supplemental electrodes, atmospheric pressure, low temperature plasma is generated.
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMPERATURE PLASMA BACKGROUND
A plasma generator generates atmospheric pressure, low temperature plasma (cold plasma), and includes a first electrode; a second electrode opposing the first electrode so as to define a predetermined gap therebetween; at least one supplemental electrode opposing a planar top surface of the second electrode and a planar bottom surface of the first electrode; a first dielectric layer; at least one supplemental dielectric layer that is disposed on a additional planar bottom surface of the at least one supplemental electrode having a relative permittivity between 2 and 500, and a thickness of 3 mm or less; and a power supply configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on the predetermined gap between the first and second electrodes, atmospheric pressure, low-temperature plasma is generated.
PLASMA WATER TREATMENT
An apparatus is provided for treating a liquid with a plasma. The apparatus includes one or two dielectric barriers, and the dielectric barrier(s) and high voltage electrode define a discharge zone therebetween. A high voltage electrode may be electrically insulated from the discharge zone by the inner dielectric barrier. In this apparatus, the outer dielectric barrier is gas and the discharge zone is configured to accept a gas flow therethrough.
Device and method for purifying air purification device and method
An air purification device includes a reactor having a hollow shape and extending in one direction, a discharge plasma generator comprising a first electrode disposed on an outer wall of the reactor and a second electrode disposed inside the reactor, where the discharge plasma generator is configured to generate a discharge plasma in a discharge region, a plurality of dielectric particles disposed on a packed-bed of the reactor, a liquid supplier which supplies a liquid into the reactor, and a liquid recoverer which recovers the liquid discharged from the reactor.
MEMBER FOR PLASMA PROCESSING DEVICE
A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.