STRUCTURE OF LASER CLEANING MACHINE
20170276703 · 2017-09-28
Inventors
Cpc classification
B23K37/0235
PERFORMING OPERATIONS; TRANSPORTING
B23K26/0876
PERFORMING OPERATIONS; TRANSPORTING
G01R3/00
PHYSICS
G01R1/07342
PHYSICS
B23K26/0006
PERFORMING OPERATIONS; TRANSPORTING
International classification
G01R3/00
PHYSICS
Abstract
The structure of a laser cleaning machine contains a laser generation device for cleaning a to-be-cleaned object, a platform for supporting the to-be-cleaned object under a projection path of the laser generation device, an image capture device configured on the laser generation device, and a cleaning and control device inside the image capturing device for setting a traversal path of the laser generation device and for processing information obtained by the image capturing device. The image capturing device contains a first capturing element and a second capturing element to a side of the first capturing element. The cleaning and control device obtains the location distribution and the precise coordinate of each contactor element on the to-be-cleaned object, and then determines an optimized traversal path and instructs the laser generation device to conduct cleaning accordingly so as to achieves high-quality and highly efficient cleaning.
Claims
1. A structure of a laser cleaning machine comprising: a laser generation device for cleaning a to-be-cleaned object; a platform for supporting the to-be-cleaned object under a projection path of the laser generation device; an image capturing device configured on the laser generation device comprising a first capturing element and a second capturing element to a side of the first capturing element, wherein the first capturing element comprises a first lens having a first power for obtaining location distribution information of the contactor elements; and the second capturing element comprises a second lens having a second power for obtaining precise coordinate information of the contactor elements, the first power being lower than the second power; and a cleaning and control device inside the image capturing device that is operable for processing information obtained by the image capturing device in order to determine a traversal path for the laser generation device according to the processed information, wherein the laser generation device has an AC charging voltage between 650V and 1,000V; wherein a wave length produced by the laser generation device is between 532 nm and 1,064 nm; and wherein a pulse energy produced by the laser generation device is between 400 mJ and 1,200 mJ.
2. The structure of a laser cleaning machine according to claim 1, wherein there are a plurality of contactor elements configured at intervals on the to-be-cleaned object.
3-4. (canceled)
5. The structure of a laser cleaning machine according to claim 1, further comprising a control device on the platform for controlling the laser generation device and the image capture device.
6. The structure of a laser cleaning machine according to claim 1, wherein the laser generation device comprises a pair of linear sliding rails and a rack moveably configured on the sliding rails.
7-9. (canceled)
10. The structure of a laser cleaning machine according to claim 1, wherein the to-be-cleaned object is one of a cantilever probe card, a vertical probe card, a membrane probe card, a pogo probe card, a micro spring probe card, and a Micro Electro Mechanical System (MEMS) probe card.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0016]
[0017]
[0018]
[0019]
[0020]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0021] The following descriptions are exemplary embodiments only, and are not intended to limit the scope, applicability or configuration of the invention in any way. Rather, the following description provides a convenient illustration for implementing exemplary embodiments of the invention. Various changes to the described embodiments may be made in the function and arrangement of the elements described without departing from the scope of the invention as set forth in the appended claims.
[0022] As shown in
[0023] The laser cleaning machine contains a laser generation device 1. The laser generation device 1 contains a pair of linear sliding rails 11, and a rack 12 moveably configured on the sliding rails 11. The laser generation device 1 is charged by an AC voltage between 650V and 1,000V, has a radiation wave length between 532 nm (nano meter) and 1,064 nm, and a radiated pulse energy between 400 mJ (micro Joule) and 1,200 mJ.
[0024] The laser cleaning machine further contains a platform 2 for supporting the to-be-cleaned object 4 under a projection path of the laser generation device 1. There is a control device 21 for controlling the laser generation device 1 and an image capture device 3 described below.
[0025] The image capture device 3 is configured on the rack 12, and contains a first capturing element 31 and a second capturing element 32 to a side of the first capturing element 31. The first and second capturing elements 31 and 32 contain low- and high-power lenses, respectively. The first capturing element 31 obtains the location distribution information of the contactor elements 41 while the second capturing element 32 obtains the precise coordinate information of the contactor elements 41.
[0026] The image capturing device 3 further contains a cleaning and control device 33 inside for setting a traversal path of the laser generation device 1 and for processing the information obtained by the image capturing device 3.
[0027] As shown in
[0028] The structure of a laser cleaning machine is operated as follows. The to-be-cleaned object 4 is placed on the platform 2 first. The first capturing element 31 then obtains a rough location for each contactor element 41, and the second capturing element 32 obtains a precise coordinate for each contactor element 41. Subsequently, the first capturing element 31 scan the location distribution of the contactor elements 41 as shown in
[0029] Furthermore, conventional laser cleaning device usually cannot adjust the energy according to the to-be-cleaned object 4 (i.e., probe card) and therefore the strength may not be sufficient to achieve thorough cleaning. A conventional laser cleaning device may also repeatedly apply laser to the to-be-cleaned object 4 so as to dissolve the impurity on the to-be-cleaned object 4, thereby damaging the to-be-cleaned object 4. The present invention therefore calculates an appropriate range of pulse energy for various probe cards by applying AC charging voltage between 650V and 1,000V, and radiation wave length between 532 nm and 1,064 nm, thereby achieving a radiated pulse energy between 400 mJ and 1,200 mJ. For example, an appropriate energy for a membrane probe card is 800 mJ.
[0030] While certain novel features of this invention have been shown and described and are pointed out in the annexed claim, it is not intended to be limited to the details above, since it will be understood that various omissions, modifications, substitutions and changes in the forms and details of the device illustrated and in its operation can be made by those skilled in the art without departing in any way from the claims of the present invention.