FILTER APPARATUS FOR ARC ION EVAPORATOR USED IN CATHODIC ARC PLASMA DEPOSITION SYSTEM

Abstract

A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to this invention is characterized by a set of multiple straight tubes placing in parallel to one another wherein the size and/or amount of large particles, which could contaminate the plasma beam, can be controlled. The filter apparatus further comprises a set of solenoid coils which coil around the filter to generate a magnetic field to drive plasma to the targeting object or material.

The filter apparatus of this present invention can reduce a number of large particles in the plasma beam and can further be designed into compacted shapes with high flexibility for adaptation in order to suit engineering demands. In addition, the filter apparatus according to this invention does not hinder the line of sight and is in consistent with the direction of plasma movement so that large number of plasma can be obtained, resulting in a reduced electrical consumption for driving the plasma and a faster deposition rate to enable quick, high volume production of quality products at a reasonable cost.

Claims

1. A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system characterizes by a parallel set of multiple straight tubes to filter the neutral particles including large particles out of the plasma beam from arc ion evaporator or cathodic arc source wherein the multiple straight tubes comprising: a straight innermost tube (105) transparent to a plasma stream in line of sight perpendicular to cathode plane; a set of adjacent straight tubes (106); a set of subsequent adjacent straight tube (107) placing in parallel manner to one another and containing inside the outermost straight tube (103) in a concentric ring manner; and a set of solenoid coils (104) chosen from metal or electric conducting wires placing around the outermost straight tube (103) in helical manner in order for the solenoid field or magnetic field to be generated to guide or move plasma out of the filter system.

2. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to claim 1 wherein the filter apparatus is equipped with an arc ion evaporator or a cathodic arc source.

3. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 1 or 2 wherein the filter apparatus is a built-in apparatus as a single unit or is welded to or fastened with the arc ion evaporator or the cathodic arc source.

4. A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system characterizes by a parallel set of multiple straight tubes to filter the neutral particles including large particles out of the plasma beam from arc ion evaporator or cathodic arc source wherein the multiple straight tubes comprising: a straight innermost tube (105) transparent to a plasma stream in line of sight perpendicular to cathode plane; a set of adjacent straight tubes (106); and a set of subsequent adjacent straight tube (107) placing in parallel manner to one another and containing inside the outermost straight tube (103) in a concentric ring manner.

5. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to claim 4 wherein the filter apparatus is equipped with the arc ion evaporator or the cathodic arc source.

6. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 4 or 5 wherein the filter apparatus is a built-in apparatus as a single unit or is welded to or fastened with the arc ion evaporator or the cathodic arc source.

7. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any claims of the previous claims wherein the arc ion evaporator or the cathodic arc source further comprising a consumable cathode that can be selected from cylindrical, rectangular plate or blunted cone.

8. A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to claim 4 wherein the filter apparatus uses kinetic energy of the plasma stream to force the plasma out of the filter system.

9. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 1 or 4 wherein filter apparatus further comprising a set of permanent magnets or an electromagnetic circuit for transporting plasma out of said filter system.

10. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 8 or 9 wherein the filter apparatus is equipped with the arc ion evaporator or the cathodic arc source.

11. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 9 or 10 wherein the filter apparatus is a built-in apparatus as a single unit or is welded to or fastened with the arc ion evaporator or the cathodic arc source.

12. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any of claim 10 or 11 wherein the arc ion evaporator or the cathodic arc source further comprising a consumable cathode that can be selected from cylindrical, rectangular plate or blunted cone.

13. The filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to any claims of the previous claims wherein the arc ion evaporator or the cathodic arc source that equipped with filter apparatus further comprising the purpose of surface coating, thin film deposition, synthesis of materials that have specific structure in micro metre range, synthesis of materials that have specific structure in nano metre range, synthesis of various nano-materials such as nano-ceramic powder or synthesis of Diamond-Like Carbon.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0050] FIG. 1 (Prior Art) is a schematic view of Venetian-blind Filter from Ref. 1

[0051] FIG. 2 (Prior Art) is a schematic view of Venetian-blind Filter from Ref. 2

[0052] FIG. 3 (Prior Art) shows plasma transportation along magnetic field line from Ref 3

[0053] FIG. 4 (Prior Art) shows mathematic formula used to determine the critical angle for the line of sight mode Venetian-blind filter from Ref 6

[0054] FIG. 5 (Prior Art) is a schematic view of Ryabchikov type Venetian-blind filter from Ref 3

[0055] FIG. 6 (Prior Art) is a schematic view of filter apparatus using solenoid field from Ref 5

[0056] FIG. 7 (Prior Art) is a schematic view of magnetic field generated by solenoid from Ref. 5

[0057] FIG. 8 (Present Invention) is a schematic side view of parallel multiple straight tube Filter

[0058] FIG. 9 (Present Invention) shows the principle of parallel multiple straight tube filter

[0059] FIG. 10 (Present Invention) is a schematic front view of parallel multiple straight tube Filter for circular face arc ion evaporator

[0060] FIG. 11 (Present Invention) is a schematic front view of parallel multiple straight tube filter for rectangular face arc ion evaporator

[0061] FIG. 12 (Present Invention) is a schematic view of an experimental parallel multiple straight tube placing inside the solenoid tube

[0062] FIG. 13 illustrates the result of Roughness test: Roughness average (Ra), Roughness root mean square (Rq) and Roughness Ten-point mean (Rz) of the unfiltered and filtered TiAlSiN coated samples, wherein done at cut-off length 0.8 and measuring length 5 mm.

[0063] FIG. 14 illustrates a comparative roughness value before and after TiAlSiN coating of the filtered and unfiltered samples

[0064] FIG. 15 illustrates the Scanning Electron Microscopy derived photographs of unfiltered TiAlSiN coating at 2,500×

[0065] FIG. 16 illustrates the Scanning Electron Microscopy derived photographs of filtered TiAlSiN coating at 2,500×

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0066] Parallel multiple straight tube filter system according to FIG. 8 of this present invention consists of arc ion evaporator 101 which has target 102 installed as its cathode to evaporate the wanted material in plasma form. The said plasma and neutral particles which are generated from the said arc ion evaporator will travel in the arrow direction into the parallel multiple straight tube system that will filter the neutral and large particles out of plasma beam. This said parallel multiple straight tubes consist of innermost straight tube 105, a set of adjacent straight tube 106, a set of subsequent adjacent straight tube 107 placing in parallel manner with one another and contained inside the outermost straight tube 103. Preferably, number or quantity of a set of adjacent straight tubes are from 2 tubes to multiple tubes depending on the designer demand. And for better plasma transportation, the electric solenoid coils 104 are installed surrounding the outermost tube, so the magnetic field (or solenoid field) generated will guide plasma out of the filter system more efficiently.