PROCESS AND DEVICE FOR LOW-TEMPERATURE PRESSURE SINTERING

Abstract

Process for producing an electronic subassembly by low-temperature pressure sintering, comprising the following steps: arranging an electronic component on a circuit carrier having a conductor track, connecting the electronic component to the circuit carrier by the low-temperature pressure sintering of a joining material which connects the electronic component to the circuit carrier, characterized in that, to avoid the oxidation of the electronic component or of the conductor track, the low-temperature pressure sintering is carried out in a low-oxygen atmosphere having a relative oxygen content of 0.005 to 0.3%.

Claims

1. A process for producing an electronic subassembly by low-temperature pressure sintering, comprising the following steps: arranging an electronic component on a circuit carrier having a conductor track, connecting the electronic component to the circuit carrier by the low-temperature pressure sintering of a joining material which connects the electronic component to the circuit carrier, where to avoid the oxidation of the electronic component or of the conductor track, the low-temperature pressure sintering is carried out in a closable sintering chamber comprising a low-oxygen atmosphere having a relative oxygen content of 0.005 to 0.3%.

2. The process according to claim 1, wherein the low-oxygen atmosphere has a relative oxygen content of 0.05 to 0.25%.

3. The process according to claim 1, wherein the low-oxygen atmosphere has a relative oxygen content of 0.05 to 0.15%.

4. The process according to claim 1, wherein the sintering chamber is closed in a gastight manner.

5. The process according to claim 1, wherein the low-oxygen atmosphere comprises nitrogen (N), carbon dioxide (CO.sub.2), a noble gas or a mixture of the aforementioned gases.

6. The process according to claim 1, wherein the electronic subassembly is sparged or evaporation-coated with a reducing agent after the low-temperature pressure sintering.

7. The process according to claim 6, wherein the reducing agent is methanoic acid (CH.sub.2O.sub.2).

8. The process according to claim 1, wherein the joining material is silver (Ag).

9. The process according to claim 1, wherein the sintering temperature lies between 230° C. and 300° C., preferably between 240° C. and 280° C., in particular is 250° C.

10. The process according to claim 1, wherein the sintering pressure is between 20 MPa and 40 MPa, preferably between 25 MPa and 35 MPa, in particular is 30 MPa.

11. The process according to claim 1, wherein after the sintering chamber is closed, and the low oxygen atmosphere is established, a period of time elapses before the sintering is carried out to allow for the equilibration of materials within the chamber with the low oxygen atmosphere.

12. A device for carrying out the process according to claim 1, comprising: a chamber having a heating device for heating the electronic subassembly up to as much as 300° C. and having an upper and a lower die, at least one of the two dies being heatable, for carrying out the low-temperature pressure sintering at a temperature of up to 300° C. and a pressure of up to 30MPa, the chamber being suitable for cooling down the sintered electronic subassembly to 80° C. in a controlled manner, and the chamber being gastight-closable and having means for generating the low-oxygen atmosphere.

13. The device for carrying out the process according to claim 1, comprising a first chamber having a heating device for heating the electronic subassembly up to as much as 100° C., a second chamber, connected to the first chamber, having an upper and a lower die, at least one of the two dies being heatable, for carrying out the low-temperature pressure sintering at a temperature of up to 300° C. and a pressure of up to 30 MPa, and a third chamber, connected to the second chamber, for cooling down the sintered electronic subassembly to 80° C., at least the second chamber being gastight-closable and having means for generating the low-oxygen atmosphere.

14. The device according to claim 12, wherein a fourth chamber, which connects the second chamber to the third chamber and has means for introducing a sparged or evaporation-coating reducing agent, or means provided in the chamber for introducing a gaseous or evaporation-coating reducing agent.

15. The device according to claim 12, further comprising a press device having an electrohydraulic drive of the lower die, the lower die having a die cylinder comprising a piston rod and a piston ring in a hydraulic sump, the piston rod having a diameter which is greater than or equal to the die diameter of the lower die and the piston rod being axially guided and held in the cylinder housing by the piston ring.

16. The process according to claim 2, wherein the low-oxygen atmosphere has a relative oxygen content of 0.05 to 0.15%.

17. The process according to claim 2, wherein the sintering chamber is closed in a gastight manner.

18. The process according to claim 3, wherein the sintering chamber is closed in a gastight manner.

19. The process according to claim 2, wherein the low-oxygen atmosphere comprises nitrogen (N), carbon dioxide (CO.sub.2), a noble gas or a mixture of the aforementioned gases.

20. The process according to claim 3, wherein the low-oxygen atmosphere comprises nitrogen (N), carbon dioxide (CO.sub.2), a noble gas or a mixture of the aforementioned gases.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The invention will be explained in more detail on the basis of an exemplary embodiment shown in the accompanying drawings, in which:

[0030] FIG. 1 shows a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having a single sintering chamber;

[0031] FIG. 2 shows a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having two sintering chambers;

[0032] FIG. 3 shows a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having three sintering chambers;

[0033] FIG. 4 shows a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having four sintering chambers;

[0034] FIG. 5 shows a schematic structure of a press device for a sintering chamber according to the invention;

[0035] FIG. 6 shows a flow diagram of the method according to the invention; and

[0036] FIG. 7 shows a flow diagram of the method according to the invention in an embodiment utilising more than one chamber.

DETAILED DESCRIPTION

[0037] FIG. 1 shows a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having a single sintering chamber.

[0038] The single sintering chamber 10 has a charging opening 12 for a work carrier 13, which is set up to receive a subassembly to be processed. Within the sintering chamber 10 there is a press, consisting of the respectively heatable/coolable lower and upper die units 11a and 11b. To carry out the process according to the invention, the work carrier 13 passes the charging opening 12 and is placed between the lower and upper die units 11a and 11b, the subassembly (not shown) being sintered by moving the dies 11a, 11b together and by heating. It is furthermore conceivable that one of the two dies 11a, 11b is stationary and the respective other die 11a, 11b moves in relation to the stationary die 11a, 11b. After completion of the sintering, the work carrier 13 with the subassembly is removed again through the charging opening 12 by being moved out. A parallel relative orientation of the two dies 11a, 11b which is precise in an X/Y plane is desirable to generate a constant sintering pressure, and this can be achieved by way of a setting device (not shown) of a press device. The setting device can adjust the upper and/or the lower die 11a, 11b with respect to one another in an X/Y direction and bring about a parallel orientation of the die surfaces.

[0039] Optionally, a reduction of any oxide films present may be performed in the sintering chamber 10 after the sintering operation and opening of the dies 11a, 11b. The creation of a sintering atmosphere takes place through the filling and emptying nozzles 15a, 15b after charging the sintering chamber 10 with the work carrier 13.

[0040] FIG. 2 shows a preferred configuration of a device for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having two sintering chambers.

[0041] The structure of this device is largely identical to the structure shown in FIG. 1, but supplemented by a chamber 20 which is arranged upstream of the sintering chamber 10 and in which the substrate is preheated in an oxygen-free manner and is also cooled down in an oxygen-free manner after the sintering in the sintering chamber 10. An advantage of the 2-chamber solution over the 1-chamber solution shown in FIG. 1 is the faster cycle rate, since the heating system 14 in the sintering chamber 10 then does not have to heat the entire thermal mass to sintering temperature and cool it down again.

[0042] FIG. 3 shows a device of particularly preferable configuration for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having three sintering chambers, the 3-chamber solution making it possible to pass the work carrier 13 in series through the first chamber 20 (oxygen-free heating up), the second (sintering) chamber 10 (low-oxygen sintering) and the third chamber 30 (oxygen-free cooling down to room temperature).

[0043] FIG. 4 shows a device of extremely preferable configuration for carrying out the process for producing an electronic subassembly by means of low-temperature pressure sintering having four sintering chambers.

[0044] The 4-chamber solution largely corresponds in functionality to the 3-chamber solution, but is additionally equipped with a further (fourth) chamber 40 that allows the active reduction of residual oxides after sintering. The provision of a further chamber 40 between the second and third chambers 20, 30 as shown in FIG. 3 is particularly advantageous, since it has been found that the surfaces in vacuum furnaces are in practice covered with residues of the combustion products, where anchored clusters of oxygen form. These clusters are only dislodged after extended baking and evacuating phases. These baking phases are undesired while production is in progress, however.

[0045] It is therefore proposed to perform an active reduction of the oxygen clusters and oxide formations after the oxygen-free or low-oxygen sintering in the further chamber 40. This can preferably be performed by components of hydrogen or vaporous formic acid components (methanoic acid CH.sub.2O.sub.2). The oxygen-free cooling down for discharging is subsequently possible in the fourth chamber 40.

[0046] The work carriers are generally transported in synchronous steps, in series through all of the chambers, the slowest process step in one of the 4 chambers determining the cycle time.

[0047] The process 100 then proceeds as follows (see FIG. 6): [0048] supplying the subassembly to be sintered, or optionally subassemblies, on a work carrier through the gastight-closable opening into the pressure space between the upper die and the lower die 101; [0049] closing the opening 102 followed by heating 103, gas exchange of the ambient atmosphere for the (technical) low-oxygen atmosphere (e.g. nitrogen) 104, waiting for the materials within the chamber to equilibrate with the low-oxygen atmosphere 104a, closing the upper and lower dies 105, building up a sintering pressure while the sintering temperature is being reached 106; [0050] completion of the low-temperature pressure sintering and lowering of the die temperature to below 80° C. 107, opening the upper and lower dies 108, removal of the subassembly or the work carrier through the chamber opening 109; and [0051] providing the equipment for subsequent sintering.

[0052] In particular, the described chambers can have two gastight-closable openings, through which continuous, serial charging can take place through an inlet opening and the removal can take place through the second opening.

[0053] A continuous work flow and an increase in the throughput of the device are achieved by the following measures, which can also be applied individually, and are illustrated in FIG. 7:

[0054] In a first chamber 20 with an approximately gastight closure and an inlet opening, the work carrier is supplied 111 and the inlet opening is closed 112. The outlet opening of the first chamber 20 is also the inlet opening of the second chamber 10. This outlet opening is closed 110 when the inlet opening is open. When both gastight-closable openings are closed, the gas exchange 104 of the ambient atmosphere for the process gas atmosphere takes place in the first chamber 20.

[0055] After the gas exchange, heating of the work carrier takes place up to a limit below initial sintering (e.g. 100° C.) 113. Subsequently, the second opening is opened 114 and the work carrier is brought 115 by a transporting device from the first chamber 20 through the second opening into the second chamber 10.

[0056] In the second chamber 10, the process gas atmosphere permanently prevails. This second chamber 10 likewise has an inlet opening and an outlet opening. When the work carrier enters the second chamber 10, the outlet opening of the third chamber 40 is closed. In the second chamber 10, the work carrier is placed between the upper die and the lower die of the compaction device. The materials within the chamber are then allowed to equilibrate with the low-oxygen atmosphere for a period of time 104a. Then, the further heating of the work carrier and the compaction of the joining layer are brought about by moving the upper die and the lower die together 105. It has been found that the compaction also has a positive influence on the heat transfers, and therefore the heating is preferably performed with the dies moved together 106. After carrying out the sintering, the dies are moved apart and the third chamber 40 is flooded 117 with process gas. Subsequently, the third opening is opened 118 and the work carrier is brought 119 by a transporting device from the second chamber 10 through the third opening into the third chamber 40.

[0057] The third chamber 40 optionally has process gas enrichment with reducing constituents. These may be components of hydrogen or vaporous formic acid components (methanoic acid CH.sub.2O.sub.2). These substances reduce oxides occurring on the metals, copper oxides in particular. This helps to eliminate oxides in the event that the formation of oxides in the first and in the second chamber 20, 10 has not been prevented completely in the heating-up and sintering phases. During the dwell time in the third chamber 40, the work carrier is kept 120 at the sintering temperature. It has been found that the reduction of the oxides is then at an optimum, and at the same time the sintering continues.

[0058] The process gas enrichment can be permanently maintained in the third chamber 40. After completion of the reducing and sintering processes in the third chamber 40, the fourth chamber 30 is flooded with process gas (without reduction enrichment). Subsequently, the fourth opening is opened and the work carrier is brought 121 by a transporting device from the third chamber 40 through the fourth opening into the fourth chamber 30.

[0059] The fourth chamber 30 serves for cooling down 107 to room temperature under process gas, which is carried out until 80° C. is reached, the temperature at which continued oxidation become uncritical. The cooling is assisted by a dwelling plate for the work carrier set to 80° C. Through mechanical contact with the electronic component, the dwelling plate 31 can perform controlled cooling down by a predefinable temperature cooling ramp. The dwelling plate 31 can be in the form of a cooling or heating device through which fluid flows. When the temperature of 80° C. has been reached, the work carrier can be discharged 109 by opening 122 the fifth opening. This is followed by refilling the fourth chamber 30 with process gas for the next work carrier, which is fed in from the third chamber 40 for oxygen-free cooling down.

[0060] The functioning of the chambers and the activation of the transfer-gastight-closable openings are preferably synchronized by a common working cycle generator. The working cycle is determined by the slowest process step. This is the low-temperature pressure sintering in the second chamber 2, which takes about 10 minutes. Cycle rates of at least 3 minutes up to 21 minutes can likewise be set. It is of advantage for achieving the respective objectives of the processes in the chambers for the work carriers to dwell longer in chambers 20, 40 and 30, and this should therefore be tolerated without restriction. The individual objectives of the processes in the chambers are:

[0061] First chamber 20: oxygen-free heating up to as much as 100° C.

[0062] Second chamber 10: low-oxygen pressure sintering at a maximum of 300° C. and a maximum of 30 MPa

[0063] Third chamber 40: optional reduction of residual oxides

[0064] Fourth chamber 30: oxygen-free cooling down to 80° C.

[0065] FIG. 5 shows an exemplary embodiment of a press device 50 for use in a sintering chamber 10. The press device 50 has an electrohydraulic drive 52, with the aid of which the lower die 11b can move against the stationary upper die 11a to generate the sintering pressure. The drive 52 is designed to achieve a press pressure of 30 MPa. The upper die 11a comprises a heating device 14a and the lower die 11b comprises a heating device 14b. A pressure pad 64 made of silicone is arranged on the upper die for generating an quasi-hydrostatic sintering pressure on a sintering component mounted on a work carrier 13. A separating film 68 for separating the pressure pad 64 from the component to be sintered rests directly on the component to be sintered during the sintering process. The lower die 11b is arranged on a die cylinder 54, the diameter of which is greater than the diameter of the lower die 11b. The die cylinder 54 comprises a piston rod 56, which is guided and oriented by a piston ring 58 in a hydraulic sump 60 of a cylinder housing 62 such that the surface of the lower die 11b is oriented parallel to the surface of the upper die 11a. The lower die 11b can be oriented with respect to the upper die 11a in the X/Y surface plane of the lower die 11b by means of a setting device 66. The piston ring 58 bears and guides the piston rod 56 and defines a uniform and oriented movement of the lower die 11b in a vertical direction towards the upper die 11b.

[0066] While the present disclosure has been illustrated and described with respect to a particular embodiment thereof, it should be appreciated by those of ordinary skill in the art that various modifications to this disclosure may be made without departing from the spirit and scope of the present disclosure.