Coated article with IR reflecting layer and method of making same
09816316 · 2017-11-14
Assignee
- Guardian Glass, Llc (Auburn Hills, MI)
- Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) (Luxembourg, LU)
Inventors
- Jingyu Lao (Saline, MI, US)
- Philip J. Lingle (Temperance, MI)
- Brent Boyce (Novi, MI)
- Bernd Disteldorf (Mettlach, DE)
- Richard Blacker (Lino Lakes, MN, US)
Cpc classification
B32B2255/28
PERFORMING OPERATIONS; TRANSPORTING
E06B9/24
FIXED CONSTRUCTIONS
C23C14/086
CHEMISTRY; METALLURGY
E06B3/6715
FIXED CONSTRUCTIONS
C03C17/3652
CHEMISTRY; METALLURGY
E06B2009/2417
FIXED CONSTRUCTIONS
C03C17/3634
CHEMISTRY; METALLURGY
Y10T428/265
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
C03C17/3626
CHEMISTRY; METALLURGY
C03C17/3681
CHEMISTRY; METALLURGY
C03C17/3618
CHEMISTRY; METALLURGY
B32B17/06
PERFORMING OPERATIONS; TRANSPORTING
International classification
B32B15/04
PERFORMING OPERATIONS; TRANSPORTING
E06B9/24
FIXED CONSTRUCTIONS
E06B3/67
FIXED CONSTRUCTIONS
B32B17/06
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A low-E coating supported by a glass substrate, the coating from the glass substrate outwardly including at least the following layers: a dielectric layer of or including silicon nitride; a high index layer having a refractive index of at least 2.1; another dielectric layer of or including silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer, wherein the coating includes only one IR reflecting layer; and an overcoat including (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide. An IG unit including the coating may have a visible transmission of at least 70%.
Claims
1. An IG window unit including a coating supported by a glass substrate, the coating from the glass substrate outwardly comprising at least the following: a dielectric layer of Si.sub.3N.sub.4; a high index layer having a refractive index of at least 2.1; another dielectric layer comprising silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer comprising silver on the glass substrate, located over and directly contacting the layer comprising zinc oxide, wherein the coating includes only one IR reflecting layer; an overcoat comprising (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide; wherein the IG unit has an SHGC value of at least 0.65, a visible transmission of at least 70%, and an Energy Rating of at least 25; wherein the coating does not contain any titanium oxide based layer located over the IR reflecting layer; and wherein said glass substrate is an interior glass substrate, the IG unit further comprising an exterior glass substrate to be located adjacent an exterior of a building in which the IG unit is provided, wherein the coating is provided on a surface of the interior glass substrate facing a gap between the interior and exterior glass substrates, and wherein the IG is configured to have, as viewed from an exterior of the building, a reflective a* value of from about −4 to 0 and a reflective b* value of from about −1 to +2.5.
2. The IG unit of claim 1, wherein the IG unit has an SHGC value of at least 0.68, a visible transmission of at least 74.5%, and an Energy Rating of at least 29.
3. The IG unit of claim 1, wherein the coating further comprising a layer comprising Ni and Cr located over and directly contacting the IR reflecting layer comprising silver.
4. The IG unit of claim 1, wherein the high index layer has a refractive index of at least 2.3.
5. The IG unit of claim 1, wherein the high index layer has a refractive index of from 2.3 to 2.6.
6. The IG unit of claim 1, wherein the high index layer is located between and directly contacting said dielectric layer of Si.sub.3N.sub.4 and said another dielectric layer comprising silicon nitride.
7. The IG unit of claim 6, wherein said dielectric layer of Si.sub.3N.sub.4 is in direct contact with the glass substrate.
8. The IG unit of claim 6, wherein said layer comprising zinc oxide is in direct contact with said another dielectric layer comprising silicon nitride.
9. An IG window unit including a coating supported by a glass substrate, the coating from the glass substrate outwardly comprising at least the following: a dielectric layer of Si.sub.3N.sub.4; a high index layer having a refractive index of at least 2.1; another dielectric layer comprising silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer comprising silver on the glass substrate, located over and directly contacting the layer comprising zinc oxide, wherein the coating includes only one IR reflecting layer; an overcoat comprising (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide; wherein the IG unit has an SHGC value of at least 0.65, a visible transmission of at least 70%, and an Energy Rating of at least 25; wherein the coating does not contain any titanium oxide based layer located over the IR reflecting layer; and wherein the IG unit is configured to have, as viewed from an exterior of a building, a reflective a* value of from about −4 to 0 and a reflective b* value of from about −1 to +2.5.
10. The IG unit of claim 9, wherein the IG unit is configured to have an SHGC value of at least 0.68, a visible transmission of at least 74.5%, and an Energy Rating of at least 29.
11. The IG unit of claim 9, wherein the glass substrate is an interior glass substrate of the IG unit.
12. The IG unit of claim 9, wherein the coating further comprising a layer comprising Ni and Cr located over and directly contacting the IR reflecting layer comprising silver.
13. The IG unit of claim 9, wherein the high index layer has a refractive index of at least 2.3.
14. The IG unit of claim 9, wherein the high index layer has a refractive index of from 2.3 to 2.6.
15. The IG unit of claim 9, wherein the high index layer is located between and directly contacting said dielectric layer of Si.sub.3N.sub.4 and said another dielectric layer comprising silicon nitride.
16. The IG unit of claim 9, wherein said dielectric layer comprising silicon nitride is in direct contact with the glass substrate.
17. The IG unit of claim 9, wherein said layer comprising zinc oxide is in direct contact with said another dielectric layer comprising silicon nitride.
18. An IG window unit including a coating supported by a glass substrate, the coating from the glass substrate outwardly comprising at least the following: a dielectric layer of Si.sub.3N.sub.4; a high index layer having a refractive index of at least 2.1; another dielectric layer comprising silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer comprising silver on the glass substrate, located over and directly contacting the layer comprising zinc oxide, wherein the coating includes only one IR reflecting layer; an overcoat comprising (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide; wherein the IG unit has a visible transmission of at least 70%; wherein the coating does not contain any titanium oxide based layer located over the IR reflecting layer; and wherein the IG unit is configured to have, as viewed from an exterior of a building, a reflective a* value of from about −4 to 0 and a reflective b* value of from about −1 to +2.5.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS OF THE INVENTION
(6) Referring now to the drawings in which like reference numerals indicate like parts throughout the several views.
(7) Coated articles herein may be used in applications such as monolithic windows, IG window units such as residential windows, patio doors, vehicle windows, and/or any other suitable application that includes single or multiple substrates such as glass substrates. Certain example embodiments of this invention are particularly adapted for residential window and patio door applications where high heat gain and high visible light transmission is desired.
(8) Generally speaking, certain example embodiments of this invention relate to a coated article including a coating 25 having an infrared (IR) reflecting layer 9 of a material such as silver, gold, or the like. In certain example embodiments, a layer comprising zinc oxide 7 is provided under the IR reflecting layer 9 in order to improve qualities of the Ag based layer 9. In certain example embodiments, the coating is a single-silver type coating (only one Ag based IR reflecting layer 9 is provided in the coating), and includes an overcoat (13, 15) including an uppermost layer 15 of or including silicon nitride and a layer of or including tin oxide 13 immediately under and contacting the silicon nitride based layer 15. The thicknesses (e.g., physical thicknesses) of the silicon nitride based layer 15 of the overcoat and the tin oxide based layer 13 of the overcoat are balanced (e.g., substantially equal, or equal plus/minus about 15% or 10%). It has surprisingly been found that balancing the thicknesses of the silicon nitride based layer 15 and the immediately adjacent tin oxide based layer 13 results in a coating 25 that has significantly improved thermal cycling performance and improved mechanical durability. In certain example embodiments, the silicon nitride based uppermost layer 15 and the tin oxide based layer 13 each have a thickness of at least about 90 angstroms (Å), more preferably at least about 120 Å, and still more preferably at least about 150 Å. For example, the silicon nitride based uppermost layer 15 and the adjacent tin oxide based layer 13 may each be from about 160-180 Å thick in certain example embodiments, so as to improve thermal cycling performance and durability of the coating. In certain example embodiments, the coating also has surprisingly good substantially neutral film side reflective coloration, monolithically or more preferably in an insulating glass (IG) window unit.
(9) In certain example embodiments, an IG window unit (e.g., see
(10) Additionally, in certain example embodiments, it has been found that the stress of the overcoat (13, 15) can be dramatically reduced by a combination of two or three of: (i) increasing argon (or other inert gas) flow rate, (ii) reducing nitrogen gas flow rate (N.sub.2 ml/kW), and (iii) reducing cathode power, during the sputter-deposition process of at least the silicon nitride inclusive layer 15 of the overcoat. It has been surprisingly found that low overcoat stress is a factor contributing to good thermal cycling results.
(11) An example thermal cycling test is pursuant to TP-603-3, the disclosure of which is incorporated herein by reference. For example, an Envirotronics Environmental Chamber, Model No. FLX900 may be used. Example settings for thermal cycling testing are as follows: thermal cycling, 11 hours at 23 degrees and 86% relative humidity, and 13 hours at −17 degrees C. and 0% relative humidity (one cycle per twenty four hours).
(12)
(13) In monolithic instances, the coated article includes only one substrate such as glass substrate 1 (see
(14) Still referring to
(15) Silicon nitride inclusive dielectric layers 2 and 5 are provided for antireflection purposes, and have been found to allow color shifts to be reduced. One or both of the silicon nitride layers 2 and/or 5 may be Si.sub.3N.sub.4. Alternatively, one or both of the silicon nitride layers 2 and/or 5 may be of the Si-rich type (not fully stoichiometric). Moreover, one or both of the silicon nitride layers 2 and/or 5 may further include a dopant such as aluminum or stainless steel, and/or small amounts of oxygen. These layers may be deposited via sputtering in certain example embodiments, or via any other suitable technique.
(16) Dielectric layer 3 may be of or include titanium oxide in certain example embodiments of this invention. The titanium oxide of layer 3 may in certain example instances be represented by TiO.sub.x, where x is from 1.5 to 2.5, most preferably about 2.0. The titanium oxide may be deposited via sputtering or the like in different embodiments. In certain example instances, dielectric layer 3 may have an index of refraction (n), at 550 nm, of at least 2.0, more preferably of at least 2.1, and possibly from about 2.3 to 2.6 when the layer is of or includes titanium oxide. In certain embodiments of this invention, the thickness of titanium oxide inclusive layer 3 is controlled so as to allow a* and/or b* color values (e.g., transmissive, film side reflective, and/or glass side reflective) to be fairly neutral (i.e., close to zero) and/or desirable. Other materials may be used in addition to or instead of titanium oxide in certain example instances. In certain alternative embodiments, the Ti in oxide layer 3 may be replaced with another metal so that layer 3 may be of or include another metal oxide or dielectric including but not limited to tin oxide, zinc oxide, zinc aluminum oxide or silicon nitride.
(17) Dielectric contact layer 7 is of or includes zinc oxide (e.g., ZnO). The zinc oxide of layer(s) 7 may contain other materials as well such as Al (e.g., to form ZnAlO.sub.x) in certain example embodiments. For example, in certain example embodiments of this invention, zinc oxide layer 7 may be doped with from about 1 to 10% Al (or B), more preferably from about 1 to 5% Al (or B), and most preferably about 2 to 4% Al (or B). The use of zinc oxide 7 under the silver in layer 9 allows for an excellent quality of silver to be achieved. In certain example embodiments (e.g., to be discussed below) the zinc oxide inclusive layer 7 may be formed via sputtering a ceramic ZnO or metal rotatable magnetron sputtering target. It has been found that the use of the ceramic target in certain example embodiments (e.g., of ZnO, which may or may not be doped with Al, F or the like) allows for a high quality of silver to be provided thereby resulting in a lower emissivity coating. While the Zn:O in the ceramic target may be stoichiometric in certain example embodiments, at least one substoichiometric ceramic target comprising ZnO.sub.x (e.g., where 0.25≤x≤0.99, more preferably 0.50≤x≤0.97, and even more preferably 0.70≤x≤0.96) may instead be used in sputter-depositing a zinc oxide inclusive layer 7 which may be substoichiometric in certain instances.
(18) Infrared (IR) reflecting layer 9 is preferably substantially or entirely metallic and/or conductive, and may comprise or consist essentially of silver (Ag), gold, or any other suitable IR reflecting material. IR reflecting layer 9 helps allow the coating to have low-E and/or good solar control characteristics such as low emittance, low sheet resistance, and so forth. The IR reflecting layer may, however, be slightly oxidized in certain embodiments of this invention.
(19) The silver based layer 9 is not very thick in certain example embodiments of this invention. The rather thin nature of the silver based layer 9 leads to bad durability characteristics. This is compensated for according to certain example embodiments of this invention by balancing the two layers 13 and 15 of the overcoat as discussed herein. Thus, the silver based IR reflecting layer 9 may be thinned, without sacrificing durability of the coating.
(20) The upper contact layer 11 may be of or include an oxide of Ni and/or Cr. In certain example embodiments, upper contact layer 11 may be of or include nickel (Ni) oxide, chromium/chrome (Cr) oxide, or a nickel alloy oxide such as nickel chrome oxide (NiCrO.sub.x), or other suitable material(s). The use of, for example, NiCrO.sub.x in this layer(s) 11 allows durability to be improved. The NiCrO.sub.x layer(s) 11, 11 may be fully oxidized in certain embodiments of this invention (i.e., fully stoichiometric), or alternatively may only be partially oxidized—substoichiometric (before and/or after optional HT). In certain instances, the NiCrO.sub.x layer 11 may be at least about 50% oxidized. Contact layer 11 (e.g., of or including an oxide of Ni and/or Cr) may or may not be oxidation graded in different embodiments of this invention. Oxidation grading means that the degree of oxidation in the layer changes through the thickness of the layer so that for example a contact layer may be graded so as to be less oxidized at the contact interface with the immediately adjacent IR reflecting layer 9 than at a portion of the contact layer further or more/most distant from the immediately adjacent IR reflecting layer. Descriptions of various types of oxidation graded contact layers are set forth in U.S. Pat. No. 6,576,349, the disclosure of which is hereby incorporated herein by reference. Contact layer 11 (e.g., of or including an oxide of Ni and/or Cr) may or may not be continuous in different embodiments of this invention across the entire IR reflecting layer 9.
(21) It have been found that using a layer comprising an oxide of Ni and/or Cr 11 that is substoichiometric (metal rich) provides improved adhesion to the overlying tin oxide based layer 13 so as to improve durability of the overall coating. Thus, the use of a substoichiometric layer comprising an oxide of Ni and/or Cr for upper contact layer 11 is advantageous in this respect.
(22) The overcoat is of or includes dielectric layers 13 and 15 in certain example embodiments. Dielectric layer 13 may be of or include a metal oxide such as tin oxide in certain example embodiments of this invention. Metal oxide inclusive layer 13 is provided for antireflection purposes, and also improves the emissivity of the coated article and the stability and efficiency of the manufacturing process. The tin oxide layer 13 may be doped with other materials such as nitrogen and/or zinc in certain example embodiments of this invention. The tin oxide based layer 13 provides good durability and improves light transmission. Dielectric layer 15 may be of or include silicon nitride (e.g., Si.sub.3N.sub.4 or other suitable stoichiometry) or any other suitable material in certain example embodiments of this invention such as silicon oxynitride. Silicon nitride layer 15 may further include other material, such as aluminum as a dopant or small amounts of oxygen in certain example embodiments of this invention. Optionally, other layers may be provided above layer 15 in the overcoat in certain example instances. Layer 15 is provided for durability purposes, and to protect the underlying layers. In certain example embodiments, silicon nitride based layer 15 may have an index of refraction (n) of from about 1.9 to 2.2, more preferably from about 1.95 to 2.05. In certain example embodiments, Zr may be provided in the silicon nitride of layer 15 (or layer 2 or layer 5). Thus, one or more of layers 2, 5 and/or 15 may be of or include SiZrNx and/or zirconium oxide in certain example embodiments of this invention.
(23) Other layer(s) below or above the illustrated coating 25 may also be provided. Thus, while the layer system or coating is “on” or “supported by” substrate 1 (directly or indirectly), other layer(s) may be provided therebetween. Thus, for example, the coating of
(24) While various thicknesses may be used in different embodiments of this invention, example thicknesses and materials for the respective layers on the glass substrate 1 in the
(25) TABLE-US-00001 TABLE 1 (Example Materials/Thicknesses; FIG. 1 Embodiment) More Layer Preferred Range ({acute over (Å)}) Preferred ({acute over (Å)}) Example (Å) Si.sub.xN.sub.y (layer 2) 20-300 Å 60-160 Å 135 Å TiO.sub.x (layer 3) 30-200 {acute over (Å)} 40-120 {acute over (Å)} 95 Å Si.sub.xN.sub.y (layer 5) 20-300 Å 40-140 Å 65 Å ZnAlO.sub.x (layer 7) 10-200 {acute over (Å)} 40-120 {acute over (Å)} 90 Å Ag (layer 9) 40-120 {acute over (Å)} 65-95 {acute over (Å)} 85 Å NiCrO.sub.x (layer 11) 10-70 {acute over (Å)} 20-50 {acute over (Å)} 30 Å SnO.sub.2 (layer 13) 80-210 Å 160-180 Å 170 Å Si.sub.xN.sub.y (layer 15) 100-250 {acute over (Å)} 160-180 {acute over (Å)} 170 Å
(26) In certain example embodiments of this invention, coated articles herein (e.g., see
(27) TABLE-US-00002 TABLE 2 Low-E/Solar Characteristics (Monolithic; non-HT) Characteristic General More Preferred Most Preferred R.sub.s (ohms/sq.): <=11.0 <=10 <=9 E.sub.n: <=0.2 <=0.15 <=0.11 T.sub.vis (%): >=70 >=80 >=85
(28) Moreover, IG window units having coated articles according to certain example embodiments of this invention have the following optical characteristics (e.g., where the coating 25 of
(29) TABLE-US-00003 TABLE 3 Example Optical Characteristics (IG Unit) Characteristic General More Preferred T.sub.vis (or TY)(Ill. C, 2 deg.): >=70% >=74.5% a*.sub.t (Ill. C, 2°): −3.0 to +1.0 −2.0 to 0.0 b*.sub.t (Ill. C, 2°): −1.0 to +4.0 0.0 to +2.0 R.sub.outsideY (Ill. C, 2 deg.): <=18% <=14% a*.sub.out (Ill. C, 2°): −5.0 to +1.0 −4 to 0.0 b*.sub.out (Ill. C, 2°): −2.0 to +4.0 −1.0 to +2.5 R.sub.insideY (Ill. C, 2 deg.): <=15% <=13% a*.sub.inside (Ill. C, 2°): −7.0 to +4.0 −5.5 to +2.0 b*.sub.inside (Ill. C, 2°): −5.0 to +5.0 −3.0 to +0.5 SHGC: >=.65 >=.68 Energy Rating (ER): >=25 >=29 U-value (Btu/h ft F): <=0.33 <=0.30 or 0.28
EXAMPLES
(30) The following example is provided for purposes of example only, and is not intended to be limiting. The following Example 1 was made via sputtering so as to have approximately the layer stack set forth below, from the clear glass substrate outwardly. The listed thicknesses are approximations:
(31) TABLE-US-00004 TABLE 4 Layer Stack for Example 1 Layer Thickness (angstroms) Glass Substrate 3 mm Si.sub.3N.sub.4 135 {acute over (Å)} TiO.sub.x 95 {acute over (Å)} Si.sub.3N.sub.4 65 {acute over (Å)} ZnAlO.sub.x 90 {acute over (Å)} Ag 85 {acute over (Å)} NiCrO.sub.x 30 {acute over (Å)} SnO.sub.2 170 Å Si.sub.3N.sub.4 170 {acute over (Å)}
(32) The two layers 13 and 15 of the overcoat were sputter-deposited to the same thickness. After being sputter deposited onto the glass substrate, the coated article of Example 1 (see also
(33) Example 2 was the same as Example 1, except that layer 5 was not present in Example 2, silicon nitride layer 2 was 140 angstroms thick, and layer 3 was made of tin oxide instead of titanium oxide and was about 170 angstroms thick. The characteristics of Example 2 are also shown in
(34) Example 3 was the same as Example 1, except that silicon nitride layer 2 was about 135 angstroms thick, titanium oxide layer 3 was about 45 angstroms thick, and layer 5 was made of tin oxide instead of silicon nitride and was about 100 angstroms thick. The characteristics of Example 3 are also shown in
(35) Referring to
(36)
(37) In a similar manner,
(38) It has also been found that increasing argon gas flow during sputtering of the silicon nitride based layer 15 and/or the tin oxide based layer 13 can be helpful in improving durability. For example, the silicon nitride based layer 15 is sputter-deposited using an argon gas flow of at least about 300 sccm, more preferably at least about 350 sccm, and most preferably at least about 375 sccm.
(39) While the invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not to be limited to the disclosed embodiment, but on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.