Device for sintering by pulsating current and associated method

Abstract

The present invention relates to a device (1) for sintering by pulsating current, the device (1) comprising: —a sintering cell (4) comprising two walls (14a, 14b) facing each other and defining between them a cavity (C) for receiving material to be sintered, —a press (2) arranged for moving one of the walls (14a, 14b) towards the other wall, so as to compress the material, when the material is received in the cavity (C), —means (10a, 10b) of rotating one of the walls (14a, 14b) relative to the other wall, so as to apply a torsional force to the material, when the material is compressed in the cavity (C).

Claims

1. A pulsed-current sintering device (1), the device (1) comprising: a sintering cell (4) comprising two walls (14a, 14b) facing each other and defining a recess (C) there between to receive a material to be sintered, a press (2) configured to move one of the walls (14a, 14b) towards the other wall, so as to compress the material, when the material is received in the recess (C), means for rotating (10a, 10b) one of the walls (14a, 14b) relative to the other wall, so as to apply a torsional stress to the material, when the material is compressed in the recess (C), wherein: the two walls (14a, 14b) movable in relative rotation are upper and lower walls of the sintering cell (4), the sintering cell (4) further comprises two lateral walls (28) facing each other and defining the recess (C) therebetween; the press (2) is configured to move one of the lower (14a) and upper (14b) walls towards the other of the lower and upper walls, and configured to simultaneously move one of the lateral walls towards the other lateral wall, so as to compress the material along two different directions when the material is received in the recess (C).

2. The device according to the preceding claim, comprising a frame (6), the rotating means (10a, 10b) being also configured to rotate the sintering cell (4) relative to the frame (6).

3. The device according to claim 1, comprising a frame (6), the rotating means (10a, 10b) being configured to rotate the walls (14a, 14b) relative to the frame (6) in two opposite directions of rotation.

4. The device according to claim 1, wherein the press (2) is configured to move one of the walls (14a, 14b) in translation towards the other wall parallel to an axis of rotation (Z) of one of the walls (14a, 14b) relative to the other wall.

5. The device according to claim 1, wherein the two walls (14a, 14b) have a shape of revolution about an axis of rotation (Z) of one of the walls (14a, 14b) relative to the other wall.

6. The device according to claim 1, wherein the sintering cell (4) comprises a seal (28) arranged such that the recess (C) is sealingly closed by the seal (28) and the two walls (14a, 14b).

7. The device according to the preceding claim, wherein the seal (28) is made of baked pyrophyllite.

8. The device according to claim 1, wherein: the press (2) comprises two anvils (10a, 10b) between which the sintering cell (4) is arranged, at least one of the anvils (10a, 10b) being movable towards the other anvil so as to come into contact with the sintering cell (4) and move one of the walls (14a, 14b) towards the other wall so as to compress the material, and the rotating means comprises the two anvils (10a, 10b).

9. The device according to the preceding claim, wherein a movable anvil (10a, 10b) has a bore (12a, 12b) and the sintering cell (4) has a protrusion arranged to be received in the bore (12a, 12b) when the movable anvil (10a, 10b) is moved towards the other anvil, the bore (12a, 12b) and the protrusion being of complementary shapes.

10. The device according to claim 8, wherein at least one of the anvils (10a, 10b) is made of tungsten carbide.

11. The device according to claim 8, comprising two electrodes (26a, 26b) for applying the pulsed current to the material when the material is received in the recess (C), wherein at least one of the electrodes (26a, 26b) extends through one of the walls (14a, 14b), and wherein an anvil (10a, 10b) comprises an electrical conductor arranged to be electrically connected to one of the electrodes (10a, 10b).

12. A pulsed-current sintering method, the method comprising steps of: inserting a material to be sintered into a recess (C) of a pulsed-current sintering device (1), the device (1) comprising: a sintering cell (4) comprising two walls (14a, 14b) facing each other and defining a recess (C) there between to receive a material to be sintered, a press (2) configured to move one of the walls (14a, 14b) towards the other wall, so as to compress the material, when the material is received in the recess (C), means for rotating (10a, 10b) one of the walls (14a, 14b) relative to the other wall, so as to apply a torsional stress to the material, when the material is compressed in the recess (C)— the two walls (14a, 14b) movable in relative rotation are upper and lower walls of the sintering cell (4), the sintering cell (4) further comprises two lateral walls (28) facing each other and defining the recess (C) therebetween, the press (2) is configured to move one of the lower (14a) and upper (14b) walls towards the other of the lower and upper walls, and configured to simultaneously move one of the lateral walls towards the other lateral wall, so as to compress the material along two different directions when the material is received in the recess (C), moving one of the walls (14a, 14b) towards the other wall, so as to compress the material received in the recess (C), rotating one of the walls (14a, 14b) relative to the other wall so as to apply a torsional stress to the material compressed in the recess (C).

13. A pulsed-current sintering method according to claim 12, wherein the device comprises a frame (6), the rotating means (10a, 10b) being also configured to rotate the sintering cell (4) relative to the frame (6).

14. A pulsed-current sintering method according to claim 12, wherein the device comprises a frame (6), the rotating means (10a, 10b) being configured to rotate the walls (14a, 14b) relative to the frame (6) in two opposite directions of rotation.

15. A pulsed-current sintering method according to claim 12, wherein the press (2) is configured to move one of the walls (14a, 14b) in translation towards the other wall parallel to an axis of rotation (Z) of one of the walls (14a, 14b) relative to the other wall.

16. A pulsed-current sintering method according to claim 12, wherein the two walls (14a, 14b) have a shape of revolution about an axis of rotation (Z) of one of the walls (14a, 14b) relative to the other wall.

17. A pulsed-current sintering method according to claim 12, wherein the sintering cell (4) comprises a seal (28) arranged such that the recess (C) is sealingly closed by the seal (28) and the two walls (14a, 14b).

18. A pulsed-current sintering method according to claim 12, wherein the seal (28) is made of baked pyrophyllite.

19. A pulsed-current sintering method according to claim 12, wherein the press (2) comprises two anvils (10a, 10b) between which the sintering cell (4) is arranged, at least one of the anvils (10a, 10b) being movable towards the other anvil so as to come into contact with the sintering cell (4) and move one of the walls (14a, 14b) towards the other wall so as to compress the material, and the rotating means may comprise the two anvils (10a, 10b).

20. A pulsed-current sintering method according to claim 12, wherein a movable anvil (10a, 10b) has a bore (12a, 12b) and the sintering cell (4) has a protrusion arranged to be received in the bore (12a, 12b) when the movable anvil (10a, 10b) is moved towards the other anvil, the bore (12a, 12b) and the protrusion being of complementary shapes.

21. A pulsed-current sintering method according to claim 12, wherein at least one of the anvils (10a, 10b) is made of tungsten carbide.

22. A pulsed-current sintering method according to claim 12, wherein the device comprises two electrodes (26a, 26b) for applying the pulsed current to the material when the material is received in the recess (C), wherein at least one of the electrodes (26a, 26b) extends through one of the walls (14a, 14b), and wherein an anvil (10a, 10b) comprises an electrical conductor arranged to be electrically connected to one of the electrodes (10a, 10b).

23. A pulsed-current sintering method according to claim 12, wherein: the two walls (14a, 14b) movable in relative rotation are upper and lower walls of the sintering cell (4), the sintering cell (4) further comprises two lateral walls (28) facing each other and defining the recess (C) there between; the press (2) is configured to move one of the lower (14a) and upper (14b) walls towards the other of the lower and upper walls, and configured to simultaneously move one of the lateral walls towards the other lateral wall, so as to compress the material along two different directions when the material is received in the recess (C).

Description

DESCRIPTION OF THE FIGURES

(1) Other features, objects and advantages of the invention will become apparent from the following description, which is purely illustrative and non-limiting and which should be read with reference to the appended drawings in which:

(2) FIG. 1 is a profile view of a pulsed-current sintering device according to one embodiment of the invention.

(3) FIG. 2 is a sectional view of a sintering cell forming part of the sintering device represented in FIG. 1.

(4) In all the figures, similar elements bear identical references.

(5) The embodiments described hereinafter being in no way limiting, it will be possible in particular to consider variants of the invention comprising only one selection of described characteristics, isolated from the other characteristics described, even if this selection is isolated within a sentence comprising these other characteristics, if this selection of characteristics is sufficient to confer a technical advantage or to differentiate the invention from the state of the prior art. This selection comprises at least one characteristic, preferably one functional characteristic without structural details, or with only part of the structural details if this part alone is sufficient to confer a technical advantage or to differentiate the invention relative to the state of the prior art.

DETAILED DESCRIPTION OF THE INVENTION

(6) With reference to FIG. 1, a pulsed-current sintering device 1 comprises a press 2 and a sintering cell 4.

(7) The press 2 comprises a frame 6 and two jaws 8a, 8b arranged at distance from each other: an upper jaw 8a and a lower jaw 8b.

(8) The frame 6 comprises a plurality of columns 7 extending parallel to an axis Z.

(9) At least one of the jaws 8a, 8b is movable in translation parallel to the Z-axis towards the other jaw.

(10) The two jaws 8a, 8b are each movable in translation parallel to the same Z-axis. Each of the two jaws comprises a plurality of through holes, a column 7 being engaged in each through hole. In this way, each of the two jaws slides along the plurality of columns 7.

(11) As a variant, only one of the two jaws 8a, 8b is movable in translation relative to the frame 6 parallel to the Z-axis and the other jaw 8b is fixed relative to the frame 6.

(12) The press 2 comprises means for moving one of the jaws towards the other jaw (not illustrated). These means comprise for example at least one hydraulic cylinder comprising a movable piston in a cylinder, one of the piston and of the cylinder being fixed to the frame 6 and the other of the piston and of the cylinder being fixed to a jaw 8a or 8b.

(13) The press 2 further comprises two anvils 10a, 10b disposed between the two jaws 8a, 8b, the sintering cell 4 being arranged between the two anvils 10a, 10b.

(14) The two jaws 8a, 8b can be brought closer to each other by relative translation along the Z-axis until the two anvils enclose and compress the sintering cell 4, when the sintering cell 4 is disposed between the two anvils 10a, 10b.

(15) More specifically, the upper anvil 10a is mounted in rotation on the upper jaw 8a about the Z-axis. The other anvil 10b is mounted in rotation on the other jaw 10b about the Z-axis.

(16) The device furthermore comprises means for rotating one of the anvils 10a, 10b relative to the other anvil.

(17) The rotating means comprise, for example, a first motor (not shown) adapted to drive in rotation the upper anvil 10a relative to the jaw 8a and relative to the frame 6, and/or a second motor (not illustrated) adapted to drive in rotation the lower anvil 10b relative to the jaw 8b and relative to the frame 6. The two motors are for example respectively arranged in the two jaws 8a, 8b.

(18) Each anvil 8a, 8b is movable relative to the frame 6 in two opposite directions of rotation.

(19) Each anvil 10a, 10b is blocked in translation along the Z-axis relative to the jaw to which it is mounted in rotation. At least one of the two anvils 10a, 10b can be driven in translation by the jaw to which it is mounted, towards the other anvil parallel to the Z-axis.

(20) The rotating means are furthermore configured to rotate the sintering cell 4 relative to the frame 6. Such a rotation of the sintering cell 4 may for example be obtained when the two anvils 10a, 10b are rotated in the same direction of rotation and at the same rotational speed, once the two anvils 10a, 10b firmly enclose the sintering cell 4.

(21) The anvil 10a has a bore 12a. The bore 12a is oriented to face the sintering cell 4, when the sintering cell 4 is disposed between the two anvils 10a, 10b.

(22) Similarly, the anvil 10b has a bore 12b. The bore 12b is oriented to face the sintering cell 4, when the sintering cell 4 is disposed between the two anvils 10a, 10b.

(23) Each anvil 10a, 10b furthermore comprises an electrical conductor intended to be connected to a source generating a pulsed electric current 3. The electrical conductor of each anvil 10a, 10b opens into the corresponding bore 12a, 12b.

(24) The press 2 is configured to apply a pressure ranging from 100 MPa to 5 GPa to the sintering cell 4. The pressure is for example greater than 2 GPa.

(25) The sintering device 1 further comprises a pulsed electric current generator 3. The generator 3 is electrically connected to the electrical conductors of the anvils 10a, 10b.

(26) The pulsed electric current generator 3 comprises for example a plurality of capacitors mounted in parallel, whose discharges are managed by a metal-oxide silicon field effect transistor (known by the acronym MOSFET). The passage or blockage of a current through the MOSFET is controlled by an electronic board. An advantage of such a pulsed generator 3 is that it is connectable to any DC power source. The generator 3 thus makes the installation autonomous, economical and small-sized in terms of its pulsed power supply. For example, when the pulsed electric current generator 3 is itself supplied with electrical energy by a source delivering voltage comprised between 0 and 7 volts and a current comprised between 0 and 300 amps, a current density of about 1000 A/cm.sup.3 maximum can be delivered to the electrodes 26a, 26b via the conductors of the anvils 10a, 10b.

(27) The sintering device 1 may further comprise at least one micrometer displacement sensor along the Z-axis configured to acquire dilatometry data of a material contained in the sintering cell 2 during the sintering of this material. For example, at least one anvil 10a, 10b comprises such a micrometric displacement sensor.

(28) The sintering device 1 may further comprise at least one temperature sensor arranged to measure a temperature within the sintering cell 2. At least one temperature sensor is for example a thermocouple. For example, each anvil is pierced (1 mm) at its center to allow the introduction of a thermocouple into the sintering cell 2.

(29) The sintering device 1 may also comprise, or be coupled to a device for a non-destructive testing of the material received in the recess (for example during its sintering). This testing device comprises, for example, a source S adapted to generate X-rays in the direction of the sintering cell 4. Alternatively, the source S is configured to project neutrons onto the sintering cell 4.

(30) The testing device further comprises a sensor D arranged to acquire the rays emitted by the source S after the rays have passed through the material contained in the sintering cell 4.

(31) The testing device 1 is fixed relative to the frame so as not to weigh down the sintering cell 4 or the press 2.

(32) The sintering device 1 may also comprise a control unit T arranged to receive the data acquired by the sensor D.

(33) The control unit T is configured to adjust the parameters relating to the pulsed current generated by the source (number of pulses, pulse time, intensity, etc.) based on the data acquired by the sensor D. As indicated above, this pulsed current has the effect of heating a material to be sintered. Consequently, the control unit indirectly makes it possible to adjust the heating parameters used by the sintering device 1 (setpoint temperature, heating time, etc.) based on the data acquired by the sensor D and/or the temperature sensor(s) used.

(34) The control unit T is furthermore configured to adjust the pressure parameters used by the press 2 based on the data acquired by the sensor D.

(35) Sintering Cell

(36) Referring to FIG. 2, the sintering cell 4 comprises two walls (an upper wall 14a and a lower wall 14b) facing each other and between which a recess C is defined to receive a material to be sintered.

(37) The upper wall 14a is intended to be put into contact with the upper anvil 10a, so as to be driven in rotation by this anvil 10a.

(38) Furthermore, the lower wall 14b is intended to be put into contact with the lower anvil 10b so as to be driven in rotation by this anvil 10a.

(39) In other words, the device 1 comprises means for rotating one of the walls 14a, 14b relative to the other wall about a torsion axis; these means comprise the means for relatively rotating the two anvils 10a, 10b.

(40) The torsion axis is the Z-axis.

(41) Furthermore, the press 2 is configured to move one of the walls 14a, 14b towards the other wall, so as to compress a material received in the recess C along a direction of compression. The direction of compression is parallel to the Z-axis.

(42) The upper wall 14a has a shape of revolution about the Z-axis.

(43) The upper wall 14a comprises an outer portion 16a and a mold element 18a.

(44) The outer portion 16a has a free outer surface 17a facing the bore 12a formed in the upper anvil 10a, and has an inner surface opposite the free outer surface 17a.

(45) The outer portion 16a has a disk shape.

(46) The mold element 18b is fixed to the inner surface of the outer portion 16a, and opens into the recess C.

(47) The mold element 18b comprises for example three superimposed plates: an outer plate 20a, an intermediate plate 22a, and an inner plate 24a.

(48) The outer plate 20a is fixed to the inner surface of the outer portion 16a.

(49) The cavity of the mold element is formed in the inner plate 24a, which opens into the recess C.

(50) The intermediate plate 22a is arranged between the inner plate 24a and the outer plate 20a.

(51) The lower wall 14b of the sintering cell 4 comprises the same elements as the upper wall 14a, arranged symmetrically with respect to a plane perpendicular to the Z-axis (the numerical references of the elements of the lower wall 14b are conventionally the same as those of the elements of the upper wall, except that the suffix “a” is replaced by the suffix “b”).

(52) In particular, the free outer surface 17b of the lower wall 14b is facing the bore 12b formed in the lower anvil 10b.

(53) The sintering cell 4 furthermore comprises two electrodes 26a, 26b to apply a pulsed current to a material received in the recess C.

(54) One of the electrodes 26a extends through the upper wall 14a and opens into the free outer surface 17a facing the upper anvil 10a, so that when the upper anvil is put into contact with the sintering cell 4, the electrode 26a and the electrical conductor of the anvil 10a are electrically connected.

(55) Similarly, the other electrode 26b extends through the lower wall 14b and opens into the surface 17b of the lower wall 14b facing the lower anvil 10b, so that when the anvil 10b is put into contact with the sintering cell 4, the electrode 26b and the electrical conductor of the anvil 10b are electrically connected.

(56) The electrodes 26a, 26b may in this respect comprise the upper and lower mold elements 18a, 18b (in the sense that these mold elements are adapted to be traversed by a pulsed electric current so as to sinter a material in the recess C).

(57) The cell further comprises a seal 28.

(58) The seal 28 has an annular shape about the Z-axis.

(59) The seal 28 forms a closed lateral wall on itself and connected to each of the upper and lower walls 14a and 14b.

(60) The two walls 14a and 14b are each movable in rotation about the Z-axis relative to the seal 28.

(61) The two walls 14a and 14b are furthermore movable in translation parallel to the Z-axis relative to the seal 28.

(62) The seal 28 extends around the upper 14a and lower 14b walls, so that the recess C is sealingly closed by the upper 14a and lower 14b walls and the seal 28.

(63) For example, the seal 28 has a shape of revolution about the Z-axis. It comprises a lateral wall closed on itself having a radially inner surface 30 relative to the Z-axis, and a radially outer surface 31 relative to the Z-axis. The lateral wall closed on itself thus comprises two lateral wall portions mutually facing each other (to the left and to the right of the recess C in the cutting plane of FIG. 2).

(64) The radially inner surface 30 is cylindrical of revolution.

(65) The diameter of the radially inner surface 30 is substantially equal to the diameter of the outer portions 16a, 16b, so as to seal the recess C.

(66) At least one lateral mold element 32 is fixed to the radially inner surface.

(67) The mold elements 18a, 18b and 32 together form a mold whose function is to give the material to be sintered, received in the recess C, a predetermined shape.

(68) The seal 28 has a shape that tapers along a centripetal radial direction relative to a point of the Z-axis.

(69) In other words, the height of the radially outer surface of the seal 28, measured parallel to the Z-axis, is less than the height of the radially inner surface of the seal 28, measured parallel to the Z-axis.

(70) The seal 28 has two free surfaces 34a and 34b connecting the radially inner surface 30 to the radially outer surface 31: an upper inclined surface 34a and a lower inclined surface 34b.

(71) The two surfaces 34a and 34b are said to be “inclined” in the sense that their profile in a plane comprising the Z-axis (the plane of FIG. 2) is generally formed at an angle comprised between 0 and 90 degrees with the Z-axis, for example between 30 and 60 degrees.

(72) The upper inclined surface 34a surrounds and extends continuously the outer surface 17a of the upper wall 14a. The upper inclined surface 34a and the outer surface 17a of the upper wall 14a form thus together the surface of an upper protrusion likely to be received in the upper bore 12a.

(73) Similarly, the lower inclined surface 34b surrounds and extends continuously the outer surface 17b of the lower wall 14b. The lower inclined surface 34b and the outer surface 17b of the lower wall 14b form together the surface of a lower protrusion likely to be received in the lower bore 12b.

(74) The inclined surfaces are of revolution about the Z-axis.

(75) The inclined surfaces 34a, 34b are for example frustoconical. Their profile in the plane of FIG. 2 is then rectilinear, for example inclined at 45 degrees relative to the Z-axis.

(76) Each protrusion is of a shape complementary to the bore in which the protrusion is intended to be received.

(77) In the case of inclined frustoconical surfaces, the bores are of trapezoidal profile.

(78) The seal 28 not only ensures a function of sealingly closing the recess C, but also a function of transmitting pressure towards the recess C along two different directions: on the one hand the axis Z, and on the other hand a direction perpendicular to the Z-axis.

(79) The sintering cell further comprises a ring 36 that surrounds the seal 28.

(80) The ring 36 is fixed to the radially outer surface 31 of the seal 28. The function of the ring 36 is to prevent excessive elongation of the seal in a plane perpendicular to the Z-axis, when the sintering cell 4 is pressed by the two anvils along the Z-axis. In this way, the ring 36 allows the seal to withstand high pressures generated by the press 2, so that the sealing of the recess is not compromised and that the structure of the sintering cell 4 is not degraded.

(81) Materials and Dimensions

(82) For example, at least one of the anvils 10a, 10b is made of tungsten carbide. This material serves as an electrical conductor and also has the advantage of being very solid.

(83) The different elements of the sintering cell 4 are adapted to be traversed by the rays emitted by the source S (X-rays or neutrons).

(84) The seal 28 is for example made of baked pyrophyllite.

(85) The outer plate 20a and/or 20b is for example made of tantalum.

(86) The intermediate plate 22a and/or 22b is for example made of graphite.

(87) The inner plate 24a and/or 24b is for example made of electrically conductive flexible graphite, for example Papyex®.

(88) The mold elements are for example also made of graphite.

(89) The ring is for example made of polyetheretherketone (PEEK).

(90) The electrodes 27a, 27b may be made of molybdenum.

(91) The outer portions 16a, 16b of the walls 14a, 14b are for example made of the material marketed under the trademark Macor®.

(92) The sintering device 1 has reduced dimensions to the point of being portable. For example, the frame can be 84 cm high along the Z-axis, 24 cm wide and 24 cm deep.

(93) The recess has a volume in the order of 100 mm.sup.3, and/or has a diameter ranging from 7 to 8 mm.

(94) Operation of the Sintering Device

(95) The sintering cell 4 is opened by removal of the upper wall 14a.

(96) A powder material is placed in the recess C of the sintering cell 4, via the thus formed opening.

(97) The upper wall 14a is replaced in the sintering cell 4 so as to sealingly close the recess C.

(98) The sintering cell 4 is deposited on the anvil 10b. More specifically, the lower protrusion of the sintering cell 4 is received in the bore 12b of the lower anvil 10b mounted in rotation on the lower jaw 10b. The lower electrode 26b is then electrically connected to the electrical conductor of the lower anvil 10b.

(99) The two jaws 8a, 8b are displaced in translation towards each other parallel to the Z-axis, causing the two anvils 10a, 10b to mutually move closer to each other.

(100) During this displacement in translation, the upper protrusion is received in the bore 12a of the upper anvil 10a. The upper electrode 26a is then also electrically connected to the electrical conductor of the upper anvil 10a.

(101) The two anvils 10a, 10b urge the two walls towards each other, having the effect of compressing the material received in the recess C along the Z-axis.

(102) Simultaneously, the two anvils 10a, 10b compress the seal 28 in the inclined surfaces 34a, 34b. This has the consequence of causing an elongation of the seal in a plane perpendicular to the Z-axis. As the ring 36 surrounds the seal 28, the latter can only deform in this plane perpendicular to the Z-axis inwards, therefore towards the recess C. Thus, the compression of the seal 28 by the anvils 10a, 10b causes the lateral wall portions of the seal 28 to mutually move closer to each other, and compresses the material received in the recess C along a horizontal direction, perpendicular to the Z-axis.

(103) The material received in the recess C is thus compressed by the press 2 simultaneously in at least two different directions: a direction parallel to the Z-axis and along at least one direction perpendicular to the Z-axis.

(104) Simultaneously, the pulsed current generator 3 is activated. A pulsed current generated by the generator 3 is thus propagated in the anvils 10a, 10b, in the electrodes 26a, 26b to which they are connected, and passes through the material received in the recess C substantially parallel to the Z-axis. One of the electrodes 26a, 26b emits electrons and the other electrode receives the electrons after passing through the recess C.

(105) The pulsed current delivered is adapted to raise the temperature in the recess C to at least 1500 degrees Celsius.

(106) The fact of arranging the two electrodes in the movable walls 14a, 14b makes it possible to ensure that the pulsed current cannot be delivered into the recess C provided that the two jaws 8a, 8b of the press 2 are sufficiently close to each other (so that the conductors of the anvils 10a, 10b can transmit the pulsed current delivered by the generator 3 to the electrodes 26a, 26b). Thus, as long as the jaws 8a, 8b are spaced from each other, no pulsed current can be delivered into the recess C.

(107) Simultaneously, the means for heating the sintering device 1 are activated to heat the material received in the recess C. The heating means are for example configured to raise the temperature in the recess C to at least 1500 degrees Celsius.

(108) Simultaneously, one of the anvils 10a, 10b is rotated relative to the other anvil.

(109) In a first mode of operation, the two anvils 10a, 10b are rotated along two opposite directions about the Z-axis.

(110) The upper anvil 10a pressed against the upper wall 14a adheres thereto and drives in rotation the upper plate 14a along a reference direction about the Z-axis.

(111) Similarly, the lower anvil 10b pressed against the lower wall 14b adheres thereto and drives in rotation the lower plate 14b along a direction opposite the reference direction about the Z-axis.

(112) This relative rotation, combined with the compression exerted by the press 2, has the effect of applying to the material compressed in the recess C a torsional stress. Thanks to this torsional stress, the grains of the material move away from each other in a plane perpendicular to the Z-axis.

(113) In this way, even if the compression exerted by the press 2 on the material received in the recess C is very high, the grains of the material are spaced apart sufficiently for electrical discharges to occur between these grains. These electrical discharges heat the grains by Joule effect, then allowing to weld the gains of the material together and thus to obtain a one-piece product from this material.

(114) It is also possible to rotate one of the two anvils 10a, 10b relative to the frame 6. However, the fact of rotating the two anvils 10a and 10b in opposite directions has the advantage of increasing the torsional stress while using relatively low rotational speeds of the anvils relative to the frame 6.

(115) For example, the two anvils are rotated at identical rotational speeds (but of opposite directions) relative to the frame 6. It is however possible to rotate the anvils 10a, 10b at angular speeds of different absolute values.

(116) Ultimately, the relative rotating of the walls 14a, 14b implemented improves the sintering conditions, especially when the material to be sintered is a composite and/or extremely hard material (for example borides).

(117) Very high pressures can be implemented by the press 2 without compromising the occurrence of electrical discharges, and therefore the success of pulsed-current sintering. These high pressures thus make it possible to reduce the sintering heating temperature used by the device 1.

(118) The use of pulsed current allows reducing the sintering time compared to other sintering techniques. In addition, the use of very high pressures, now allowed by the sintering device 1 because of the means for rotating the walls 14a and 14b, allows further reducing the sintering time, and therefore the energy cost of manufacture of the resulting sintered product.

(119) In a second mode of operation of the sintering device 1, the two anvils 10a, 10b are rotated in the same direction of rotation about the Z-axis relative to the frame 6, at the same rotational speed. This has the effect of driving the complete sintering cell 4 in rotation relative to the frame 6, and therefore also driving the material received in the recess C relative to the frame 6. However, as the two walls 14a, 14b are immobile relative to each other, the material does not undergo torsional stress.

(120) This second mode of operation is particularly advantageous for carrying out an inspection of the material being sintered, for example by means of the non-destructive testing device. The source S projects towards the cell X-ray or neutrons. Since the testing device is stationary relative to the frame 6, the rotation of the sintering cell 4 enables the sensor D to acquire complete information covering the entire volume of the material received in the recess C and traversed by rays emitted by the source S. This complete information is for example used by the control unit T to implement a tomographic analysis. The tomography allows locating defects in real time (it is for example possible to know the change of the volume of porosities, air bubbles, cracks and have a better understanding of the sintering of composite materials, etc.). Furthermore, based on the information acquired, the control unit T can adjust the heating and/or pressure parameters implemented by the device 1 during sintering, so as to obtain a sintered part without defects.