Wafer producing method

Abstract

A wafer producing method for producing a hexagonal single crystal wafer from a hexagonal single crystal ingot including a separation start point forming step of setting the focal point of a laser beam inside the ingot at a predetermined depth from the ingot's upper surface, which depth corresponds to the thickness of the wafer to be produced, and next applying the laser beam to the upper surface of the ingot while relatively moving the focal point and the ingot to thereby form: (i) a modified layer parallel to the ingot's upper surface, and (ii) cracks extending from the modified layer, thus forming a separation start point. Preferably, the laser beam includes a plurality of laser beams to be simultaneously applied to form a plurality of linear modified layers. The focal points of the laser beams are arranged with predetermined spacing in the direction of formation of an off angle.

Claims

1. A wafer producing method for producing a hexagonal single crystal wafer from a hexagonal single crystal ingot having a first surface, a second surface opposite to said first surface, a c-axis extending from said first surface to said second surface, and a c-plane perpendicular to said c-axis, said wafer producing method comprising: a separation start point forming step of setting a focal point of a laser beam having a transmission wavelength to said hexagonal single crystal ingot inside said hexagonal single crystal ingot at a predetermined depth from said first surface, which depth corresponds to the thickness of said wafer to be produced, and next applying said laser beam to said first surface as relatively moving said focal point and said hexagonal single crystal ingot to thereby form a modified layer parallel to said first surface and cracks extending from said modified layer along said c-plane, thus forming a separation start point; and a wafer separating step of separating plate-shaped member having a thickness corresponding to the thickness of said wafer from said hexagonal single crystal ingot at said separation start point after performing said separation start point forming step, thus producing said wafer from said hexagonal single crystal ingot; said separation start point forming step including a modified layer forming step of relatively moving the focal point of said laser beam in a first direction perpendicular to a second direction where said c-axis is inclined by an off angle with respect to a normal to said first surface and said off angle is formed between said first surface and said c-plane, thereby linearly forming said modified layer extending in said first direction, and an indexing step of relatively moving said focal point in said second direction to thereby index said focal point by a predetermined amount, wherein in said modified layer forming step, said laser beam includes a plurality of laser beams to be simultaneously applied to form a plurality of linear modified layers, the focal points of said laser beams being arranged in said second direction with a predetermined spacing.

2. The wafer producing method according to claim 1, wherein in said modified layer forming step, the predetermined spacing between any adjacent ones of said focal points is set so that the upper limit of said predetermined spacing becomes nearly equal to a spacing defined when the front ends of said cracks extending from said adjacent modified layers in said second direction overlap each other.

3. The wafer producing method according to claim 1, wherein in said indexing step, the index amount L is given as L=H×M, where H is said predetermined spacing and M is the number of said focal points.

4. The wafer producing method according to claim 1, wherein said hexagonal single crystal ingot is selected from an SiC single crystal ingot and a GaN single crystal ingot.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a perspective view of a laser processing apparatus suitable for use in performing the wafer producing method of the present invention;

(2) FIG. 2 is a block diagram of a laser beam generating unit;

(3) FIG. 3 is a schematic view of a blazed diffractive optical element (DOE);

(4) FIG. 4A is a perspective view of a hexagonal single crystal ingot;

(5) FIG. 4B is an elevational view of the ingot shown in FIG. 4A;

(6) FIG. 5 is a perspective view for illustrating a separation start point forming step;

(7) FIG. 6 is a plan view of the ingot shown in FIG. 4A;

(8) FIG. 7 is a schematic sectional view for illustrating a modified layer forming step;

(9) FIG. 8 is a schematic plan view for illustrating the modified layer forming step;

(10) FIG. 9 is a schematic plan view for illustrating an indexing step;

(11) FIGS. 10A and 10B are perspective views for illustrating a wafer separating step; and

(12) FIG. 11 is a perspective view of a hexagonal single crystal wafer produced from the ingot.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

(13) A preferred embodiment of the present invention will now be described in detail with reference to the drawings. Referring to FIG. 1, there is shown a perspective view of a laser processing apparatus 2 suitable for use in performing the wafer producing method of the present invention. The laser processing apparatus 2 includes a stationary base 4 and a first slide block 6 mounted on the stationary base 4 so as to be movable in the X direction. The first slide block 6 is moved in a feeding direction, or in the X direction along a pair of guide rails 14 by a feeding mechanism 12 including a ball screw 8 and a pulse motor 10.

(14) A second slide block 16 is mounted on the first slide block 6 so as to be movable in the Y direction. The second slide block 16 is moved in an indexing direction, or in the Y direction along a pair of guide rails 24 by an indexing mechanism 22 including a ball screw 18 and a pulse motor 20. A support table 26 is mounted on the second slide block 16. The support table 26 is movable in the X direction and the Y direction by the feeding mechanism 12 and the indexing mechanism 22 and also rotatable by a motor stored in the second slide block 16.

(15) A column 28 is provided on the stationary base 4 so as to project upward therefrom. A laser beam applying mechanism (laser beam applying means) 30 is mounted on the column 28. The laser beam applying mechanism 30 includes a casing 32, a laser beam generating unit 34 (see FIG. 2) stored in the casing 32, and focusing means (laser head) 36 mounted on the front end of the casing 32. An imaging unit 38 having a microscope and a camera is also mounted on the front end of the casing 32 so as to be aligned with the focusing means 36 in the X direction.

(16) As shown in FIG. 2, the laser beam generating unit 34 includes a laser oscillator 40 such as YAG laser and YVO4 laser for generating a pulsed laser beam, repetition frequency setting means 42 for setting the repetition frequency of the pulsed laser beam to be generated by the laser oscillator 40, pulse width adjusting means 44 for adjusting the pulse width of the pulsed laser beam to be generated by the laser oscillator 40, and power adjusting means 46 for adjusting the power of the pulsed laser beam generated by the laser oscillator 40. Although especially not shown, the laser oscillator 40 has a Brewster window, so that the laser beam generated from the laser oscillator 40 is a laser beam of linearly polarized light. After the power of the pulsed laser beam is adjusted to a predetermined power by the power adjusting means 46 of the laser beam generating unit 34, the pulsed laser beam is reflected by a mirror 48 included in the focusing means 36 and next branched into three laser beams by a diffractive optical element (DOE) 50 included in the focusing means 36. These three laser beams obtained by the DOE 50 are next focused by a focusing lens 51 included in the focusing means 36. The focusing lens 51 is positioned so that the pulsed laser beam is focused inside a hexagonal single crystal ingot 11 as a workpiece fixed to the support table 26.

(17) For example, the DOE 50 is provided by a blazed DOE as shown in FIG. 3. The blazed DOE 50 includes a transparent plate 62 and a sawtooth sectional structure 64 finely formed on one side (upper surface as viewed in FIG. 3) of the transparent plate 62. The size d1 of each sawtooth in the structure 64 is set to several tens to several hundreds of micrometers. The laser beam as incident light to the blazed DOE 50 is branched into zeroth-order light, first-order light, and second-order light. The zeroth-order light, the first-order light, and the second-order light are next emerged as three separate laser beams from the blazed DOE 50.

(18) Referring to FIG. 4A, there is shown a perspective view of the hexagonal single crystal ingot 11 as a workpiece to be processed. FIG. 4B is an elevational view of the hexagonal single crystal ingot 11 shown in FIG. 4A. The hexagonal single crystal ingot (which will be hereinafter referred to also simply as ingot) 11 is selected from an SiC single crystal ingot and a GaN single crystal ingot. The ingot 11 has a first surface (upper surface) 11a and a second surface (lower surface) 11b opposite to the first surface 11a. The first surface 11a of the ingot 11 is preliminarily polished to a mirror finish because the laser beam is applied to the first surface 11a.

(19) The ingot 11 has a first orientation flat 13 and a second orientation flat 15 perpendicular to the first orientation flat 13. The length of the first orientation flat 13 is set longer than the length of the second orientation flat 15. The ingot 11 has a c-axis 19 inclined by an off angle α toward the second orientation flat 15 with respect to a normal 17 to the upper surface 11a and also has a c-plane 21 perpendicular to the c-axis 19. The c-plane 21 is inclined by the off angle α with respect to the upper surface 11a. In general, in the hexagonal single crystal ingot 11, the direction perpendicular to the direction of extension of the shorter second orientation flat 15 is the direction of inclination of the c-axis. The c-plane 21 is set in the ingot 11 innumerably at the molecular level of the ingot 11. In this preferred embodiment, the off angle α is set to 4°. However, the off angle α is not limited to 4° in the present invention. For example, the off angle α may be freely set in the range of 1° to 6° in manufacturing the ingot 11.

(20) Referring again to FIG. 1, a column 52 is fixed to the left side of the stationary base 4. The column 52 is formed with a vertically elongated opening 53, and a pressing mechanism 54 is vertically movably mounted to the column 52 so as to project from the opening 53.

(21) As shown in FIG. 5, the ingot 11 is fixed to the upper surface of the support table 26 by using a wax or adhesive in the condition where the second orientation flat 15 of the ingot 11 becomes parallel to the X direction. In other words, as shown in FIG. 6, the direction of formation of the off angle α is shown by an arrow Y1. That is, the direction of the arrow Y1 is the direction where the intersection 19a between the c-axis 19 and the upper surface 11a of the ingot 11 is present with respect to the normal 17 to the upper surface 11a. Further, the direction perpendicular to the direction of the arrow Y1 is shown by an arrow A. Then, the ingot 11 is fixed to the support table 26 in the condition where the direction of the arrow A becomes parallel to the X direction.

(22) Accordingly, the laser beam is scanned in the direction of the arrow A perpendicular to the direction of the arrow Y1, or the direction of formation of the off angle α. In other words, the direction of the arrow A perpendicular to the direction of the arrow Y1 where the off angle α is formed is defined as the feeding direction of the support table 26.

(23) In the wafer producing method of the present invention, it is important that the scanning direction of the laser beam to be applied from the focusing means 36 is set to the direction of the arrow A perpendicular to the direction of the arrow Y1 where the off angle α of the ingot 11 is formed. That is, it was found that by setting the scanning direction of the laser beam to the direction of the arrow A as mentioned above in the wafer producing method of the present invention, cracks propagating from a modified layer formed inside the ingot 11 by the laser beam extend very long along the c-plane 21.

(24) In performing the wafer producing method according to this preferred embodiment, a separation start point forming step is performed in such a manner that the focal point of the laser beam having a transmission wavelength (e.g., 1064 nm) to the hexagonal single crystal ingot 11 fixed to the support table 26 is set inside the ingot 11 at a predetermined depth from the first surface (upper surface) 11a, which depth corresponds to the thickness of a wafer to be produced, and the laser beam is next applied to the upper surface 11a as relatively moving the focal point and the ingot 11 to thereby form a modified layer 23 parallel to the upper surface 11a and cracks 25 propagating from the modified layer 23 along the c-plane 21, thus forming a separation start point.

(25) This separation start point forming step includes a modified layer forming step of relatively moving the focal point of the laser beam in the direction of the arrow A perpendicular to the direction of the arrow Y1 where the c-axis 19 is inclined by the off angle α with respect to the normal 17 to the upper surface 11a and the off angle α is formed between the c-plane 21 and the upper surface 11a, thereby forming the modified layer 23 inside the ingot 11 and the cracks 25 propagating from the modified layer 23 along the c-plane 21, and also includes an indexing step of relatively moving the focal point in the direction of formation of the off angle α, i.e., in the Y direction to thereby index the focal point by a predetermined amount as shown in FIGS. 8 and 9.

(26) As shown in FIGS. 7 and 8, the modified layer 23 is linearly formed so as to extend in the X direction, so that the cracks 25 propagate from the modified layer 23 in opposite directions along the c-plane 21. In the wafer producing method according to this preferred embodiment, the separation start point forming step further includes an index amount setting step of measuring the width of the cracks 25 formed on one side of the modified layer 23 along the c-plane 21 and then setting the index amount of the focal point according to the width mentioned above. More specifically, letting W1 denote the width of the cracks 25 formed on one side of the modified layer 23 so as to propagate from the modified layer 23 along the c-plane 21, the predetermined spacing H between any adjacent ones of the two or more focal points is set so that the upper limit of the spacing H becomes nearly equal to 2W1 defined when the front ends of the cracks 25 extending from the adjacent modified layers 23 in the Y direction overlap each other.

(27) The index amount L set in the case of simultaneously applying the plural laser beams is given as L=H×M, where M is the number of focal points. In this preferred embodiment, the number of focal points is three, so that L=3H. When H=400 μm, L=1200 μm.

(28) For example, the separation start point forming step is performed under the following laser processing conditions.

(29) Light source: Nd:YAG pulsed laser

(30) Wavelength: 1064 nm

(31) Repetition frequency: 80 kHz

(32) Average power: 3.2 W

(33) Pulse width: 4 ns

(34) Spot diameter: 3 μm

(35) Numerical aperture (NA) of the focusing lens: 0.43

(36) Index amount: (250 to 400 μm)×(the number of focal points)

(37) Work feed speed: 120 to 260 nm/second

(38) In the laser processing conditions mentioned above, the width W1 of the cracks 25 propagating from the modified layer 23 along the c-plane 21 on one side as viewed in FIG. 7 is set to approximately 250 μm, and the index amount L is set to 1200 μm. However, the average power of the laser beam is not limited to 3.2 W. When the average power of the laser beam was set to 2 W to 4.5 W, good results were obtained in the preferred embodiment. In the case that the average power was set to 2 W, the width W1 of the cracks 25 was approximately 100 μm. In the case that the average power was set to 4.5 W, the width W1 of the cracks 25 was approximately 350 μm.

(39) In the case that the average power is less than 2 W or greater than 4.5 W, the modified layer 23 cannot be well formed inside the ingot 11. Accordingly, the average power of the laser beam to be applied is preferably set in the range of 2 W to 4.5 W. For example, the average power of the laser beam to be applied to the ingot 11 was set to 3.2 W in this preferred embodiment. As shown in FIG. 7, the depth D1 of each focal point from the upper surface 11a in forming the modified layer 23 was set to 500 μm.

(40) Referring to FIG. 9, there is shown a schematic plan view for illustrating the scanning direction of the laser beams. The separation start point forming step is performed on a forward path X1 and a backward path X2 as shown in FIG. 9. That is, the modified layers 23 are formed in the hexagonal single crystal ingot 11 on the forward path X1. Thereafter, the focal points of the laser beams are indexed by the predetermined amount. Thereafter, the modified layers 23 are formed again in the ingot 11 on the backward path X2.

(41) In this manner, the focal points of the laser beams are sequentially indexed to form a plurality of modified layers 23 at the depth D1 in the whole area of the ingot 11 and the cracks 25 extending from each modified layer 23 along the c-plane 21. Thereafter, a wafer separating step is performed in such a manner that an external force is applied to the ingot 11 to thereby separate a plate-shaped member having a thickness corresponding to the thickness of the wafer to be produced, from the ingot 11 at the separation start point including the modified layers 23 and the cracks 25, thus producing a hexagonal single crystal wafer 27 shown in FIG. 11.

(42) This wafer separating step is performed by using the pressing mechanism 54 shown in FIG. 1. The configuration of the pressing mechanism 54 is shown in FIGS. 10A and 10B. The pressing mechanism 54 includes a head 56 vertically movable by a moving mechanism (not shown) incorporated in the column 52 shown in FIG. 1 and a pressing member 58 rotatable in the direction shown by an arrow R in FIG. 10B with respect to the head 56. As shown in FIG. 10A, the pressing mechanism 54 is relatively positioned above the ingot 11 fixed to the support table 26. Thereafter, as shown in FIG. 10B, the head 56 is lowered until the pressing member 58 comes into pressure contact with the upper surface 11a of the ingot 11.

(43) In the condition where the pressing member 58 is in pressure contact with the upper surface 11a of the ingot 11, the pressing member 58 is rotated in the direction of the arrow R to thereby generate a torsional stress in the ingot 11. As a result, the ingot 11 is broken at the separation start point where the modified layers 23 and the cracks 25 are formed. Accordingly, the hexagonal single crystal wafer 27 shown in FIG. 11 can be separated from the hexagonal single crystal ingot 11. After separating the wafer 27 from the ingot 11, the separation surface of the wafer 27 and the separation surface of the ingot 11 are preferably polished to a mirror finish.

(44) The present invention is not limited to the details of the above described preferred embodiment. The scope of the invention is defined by the appended claims and all changes and modifications as fall within the equivalence of the scope of the claims are therefore to be embraced by the invention.