Method for Forming Solder Deposits

Abstract

A method for forming solder deposits on elevated contact metallizations of terminal faces of a substrate formed in particular as a semiconductor component includes bringing wetting surfaces of the contact metallizations into physical contact with a solder material layer. The solder material is arranged on a solder material carrier. At least for the duration of the physical contact, a heating of the substrate and a tempering of the solder material layer takes place. Subsequently a separation of the physical contact between the contact metallizations wetted with solder material and the solder material layer takes place.

Claims

1. Method for forming solder deposits on elevated contact metallizations of terminal faces of a substrate formed in particular as a semiconductor component, in which wetting surfaces of the contact metallizations are brought into physical contact with a solder material layer arranged on a solder material carrier, at least for the duration of the physical contact a heating of the substrate and a tempering of the solder material layer takes place, and subsequently a separation of the physical contact between the contact metallizations wetted with solder material and the solder material layer takes place.

2. Method according to claim 1, characterized in that during the formation of the physical contact with the solder material layer (15) at least the contact metallizations are disposed in a protective medium atmosphere.

3. Method according to claim 2, characterized in that the formation of the protective medium atmosphere is effected by the application of a flux layer onto the solder material layer.

4. Method according to claim 1, characterized in that the contacting of the contact metallizations with the solder material layer and the separation of the contact metallizations from the solder material layer is effected by an approach or retreat motion of the substrate.

5. Method according to claim 1, characterized in that for performing the approach or retreat motion the substrate is accommodated in a handling device which also serves the purpose of applying laser energy to the substrate.

6. Method according to claim 1, characterized in that the tempering of the solder material layer is performed by means of a temperable carrier platform accommodating the solder material carrier.

7. Method according to claim 1, characterized in that for forming the solder material layer the solder material carrier is provided with a layer of solder material molded bodies.

8. Method according to claim 7, characterized in that the solder material molded bodies have a diameter which is smaller than the distance between the contact metallizations of the substrate.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In the drawings

[0025] FIG. 1 shows a device for forming solder deposits in a feeding phase;

[0026] FIG. 2 shows a device for forming solder deposits in a wetting phase;

[0027] FIG. 3 shows the device for forming solder deposits in a solidifying phase.

DETAILED DESCRIPTION OF THE EXAMPLE EMBODIMENTS

[0028] FIG. 1 shows a device 10 for forming solder deposits with a handling device 11 and a carrier platform 12 arranged below the handling device 11, the carrier platform 12 serving the purpose of accommodating a solder material carrier 13 on whose surface 14 a solder material layer 15 is disposed which in the case of the embodiment shown in FIG. 1 is formed from a pasty solder material mass. The solder material layer 15 in the present case is covered by a flux coating 16 for protection against its environment.

[0029] The handling device 11 comprises a lower mouthpiece formed as an accommodating device 17 with an abutting surface 18 which is formed by a frame-like opening edge and serves the purpose of supporting a substrate 19 which is held at the mouthpiece 17 by applying negative pressure and which is here formed as a semiconductor component. For creating the negative pressure the handling device 11 is equipped with a negative pressure device not illustrated here, which applies a corresponding negative pressure force 32 to a rear side 20 of the semiconductor component, such that the rear side 20 rests fixed against an abutting surface 18.

[0030] In the embodiment shown in FIG. 1 the semiconductor component 19 is a chip which comprises on its contact side 21 opposite of its rear side 20 a terminal face array 22 on whose individual terminal faces 23 respectively one elevated contact metallization 24, in technical terms also called bump, is formed.

[0031] The configuration of the device 10 for forming solder deposits shown in FIG. 1 shows the handling device 11, arranged above the carrier platform 12, in a feeding phase in which the semiconductor component 19 is moved towards the carrier platform 12 by an approach motion 25 of a feeding device, such as the mouthpiece 17. Already during said approach motion as shown in FIG. 1 energy can be applied to the rear side of the semiconductor component 19, which leads to a heating of the semiconductor component 19. In the present case, the energy applied to the semiconductor component 19 is laser energy 33.

[0032] FIG. 2 shows the device 10 for forming solder deposits in a wetting phase following the feeding phase, in which wetting surfaces 26 of the contact metallizations 24 are in physical contact with the solder material layer 15 and therein are protected from their environment by the flux coating 16.

[0033] If the rear side of the semiconductor component 19 is not impinged with laser energy 33 already during the feeding phase as shown in FIG. 1, now at the latest in the wetting phase shown in FIG. 2 energy impingement from the rear takes place such that via heat conduction through the semiconductor component 19 a heating of the contact metallizations 24 takes place. Simultaneously with the heating of the contact metallizations 24 a cooling of the solder material layer 15 formed on the solder material carrier 13 takes places by means of a corresponding tempering of the carrier platform 12 via a tempering device 27 formed in this case in the carrier platform 12. For forming the tempering device 27 a coolant line not illustrated here can for example be formed in the carrier platform 12. Notwithstanding this, it is also possible to provide a tempering device 36 being separate from the carrier platform 12, which can for example be formed by a cooling plate which is brought into contact with the underside 28 of the carrier platform 12.

[0034] Irrespective of the way in which a cooling of the solder material layer 15 disposed on the solder material carrier 13 is implemented, the cooling of the solder material layer 15 taking place during the heating of the semiconductor component 19 has the effect that a melting of the solder material layer 15 only occurs in the contact areas between the wetting surfaces 26 and the solder material layer 15 and that in the areas of the solder material layer 15 that are disposed opposite of spaces between the contact metallizations 29 melting does not occur or at least a lower degree of liquefaction of the solder material layer 15 occurs in comparison to the areas opposite of the wetting surfaces 26.

[0035] FIG. 3 shows a solidifying phase following the wetting phase illustrated in FIG. 2. In said solidifying phase the contact metallizations 24 are brought out of contact with the solder material layer 15 by a retreat motion 32 of the mouthpiece 17 and on the wetting surfaces 26 of the contact metallizations 24 solder material menisci, which have formed as a result of the wetting, form solder deposits 34. Depending on whether or not a heating of the semiconductor component 19 continues to take place in the configuration of the device for forming solder deposits illustrated in FIG. 3, the liquid state of the solder deposits 34 can be maintained or the solder deposits can be brought into a solid state.